Invention Grant
- Patent Title: Chemical vapor deposition tool and process for fabrication of photovoltaic structures
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Application No.: US14985143Application Date: 2015-12-30
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Publication No.: US09972740B2Publication Date: 2018-05-15
- Inventor: Yongkee Chae , Jianming Fu
- Applicant: SolarCity Corporation
- Applicant Address: US CA Palo Alto
- Assignee: TESLA, INC.
- Current Assignee: TESLA, INC.
- Current Assignee Address: US CA Palo Alto
- Agency: Park, Vaughan, Fleming & Dowler LLP
- Agent Shun Yao
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L31/18 ; C23C16/455 ; H01L31/0216 ; H01L31/0224 ; H01L31/028 ; H01L31/0352 ; H01L31/0376 ; H01L31/074 ; H01L31/20 ; H01L21/67

Abstract:
One embodiment of the present invention can provide a system for fabricating a photovoltaic structure. During fabrication, the system can deposit a first passivation layer on a first side of a Si base layer of the photovoltaic structure using a static chemical vapor deposition process. The static chemical vapor deposition process can be performed inside a first reaction chamber. The system can then transfer the photovoltaic structure from the first reaction chamber to a second reaction chamber without the photovoltaic structure leaving a common vacuum space comprising both reaction chambers, and deposit a second passivation layer on the first passivation layer using an inline chemical vapor deposition process. The inline chemical vapor deposition process can be performed inside the second reaction chamber.
Public/Granted literature
- US20160359071A1 SYSTEM, METHOD AND APPARATUS FOR CHEMICAL VAPOR DEPOSITION Public/Granted day:2016-12-08
Information query
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