Invention Application
- Patent Title: FORMATION OF FINE PITCH TRACES USING ULTRA-THIN PAA MODIFIED FULLY ADDITIVE PROCESS
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Application No.: PCT/CN2020/000184Application Date: 2020-08-19
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Publication No.: WO2021031507A1Publication Date: 2021-02-25
- Inventor: KELVIN, Po Leung Pun , CHEE, Wah Cheung
- Applicant: COMPASS TECHNOLOGY COMPANY LIMITED
- Applicant Address: Suite 10, 5/F, Chiapua Centre 12 Sui Lek Yuen Road, Shatin, New Territories
- Assignee: COMPASS TECHNOLOGY COMPANY LIMITED
- Current Assignee: COMPASS TECHNOLOGY COMPANY LIMITED
- Current Assignee Address: Suite 10, 5/F, Chiapua Centre 12 Sui Lek Yuen Road, Shatin, New Territories
- Agency: KELONG INTERNATIONAL INTELLECTUAL PROPERTY AGENCY LTD.
- Priority: US16/548,373 2019-08-22
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L23/14 ; H01L21/48 ; C23C18/50 ; C25D3/38 ; C25D5/02 ; B23K26/382
Abstract:
A method to produce a substrate suitable for diffusion bonding is described. A flexible dielectric substrate is provided. An alkaline modification is applied to the dielectric substrrate to form a polyamic acid (PAA) anchoring layer on a surface of the dielectric substrate. A Ni-P seed layer is elecrolessly plated on the PAA layer. Copper traces are plated within a photoresist pattern on the Ni-P seed layer. A surface finishing layer is electrolytically plated on the copper traces. The photoresist pattern and Ni-P seed layer not covered by the copper traces are removed to complete the substrate suitable for diffusion bonding.
Information query
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