PULSED PLASMA DEPOSITION DEVICE
    1.
    发明公开
    PULSED PLASMA DEPOSITION DEVICE 有权
    DEVICE对于脉冲等离子涂层

    公开(公告)号:EP2936538A1

    公开(公告)日:2015-10-28

    申请号:EP13826886.7

    申请日:2013-12-20

    IPC分类号: H01J37/077 H01J37/305

    摘要: A pulsed plasma deposition device, comprising an apparatus for generating a beam of electrons (3), a target (4) and a substrate (6), the apparatus (3) being suitable for generating a pulsed beam of electrons directed towards said target (4) to determine the ablation of the material of said target (4) in the form of a plasma plume (19) directed towards said substrate (6); the device comprises a transportation and focussing group (13) of the beam of electrons towards said target (4), arranged between said apparatus (3) and said target (4) and comprising a transportation cone (14), the transportation and focussing group (13) also comprising a focussing electrode (15) directly connected to the transportation cone (14) and shaped substantially like a loop; the axis of symmetry (16) of the focussing electrode (15) is perpendicular, or substantially perpendicular, to the surface of the target (4).

    DEVICE FOR GENERATING PLASMA AND FOR DIRECTING AN FLOW OF ELECTRONS TOWARDS A TARGET
    3.
    发明公开
    DEVICE FOR GENERATING PLASMA AND FOR DIRECTING AN FLOW OF ELECTRONS TOWARDS A TARGET 有权
    DEVICE等离子生产和电子流动转向到目标

    公开(公告)号:EP2411996A2

    公开(公告)日:2012-02-01

    申请号:EP10732416.2

    申请日:2010-03-23

    IPC分类号: H01J3/02 H01J37/077

    CPC分类号: H01J3/025

    摘要: Device (1) for generating plasma and for directing an flow of electrons towards a specific target (3); the device (1) comprises a hollow cathode (5); a main electrode (7) at least partially placed inside the cathode (5); a resistor (12), electrically earthing the main electrode (7); a substantially dielectric tubular element (21) extending through a wall (22) of the cathode; a ring-shaped anode (25) placed around the tubular element (21) and earthed; and an activation group (11) which is electrically connected to the cathode (5) and is able to reduce the electric potential of the cathode (5) of at least 8 kV in about 10 ns.