摘要:
A pulsed plasma deposition device, comprising an apparatus for generating a beam of electrons (3), a target (4) and a substrate (6), the apparatus (3) being suitable for generating a pulsed beam of electrons directed towards said target (4) to determine the ablation of the material of said target (4) in the form of a plasma plume (19) directed towards said substrate (6); the device comprises a transportation and focussing group (13) of the beam of electrons towards said target (4), arranged between said apparatus (3) and said target (4) and comprising a transportation cone (14), the transportation and focussing group (13) also comprising a focussing electrode (15) directly connected to the transportation cone (14) and shaped substantially like a loop; the axis of symmetry (16) of the focussing electrode (15) is perpendicular, or substantially perpendicular, to the surface of the target (4).
摘要:
Device (1) for generating plasma and for directing an flow of electrons towards a specific target (3); the device (1) comprises a hollow cathode (5); a main electrode (7) at least partially placed inside the cathode (5); a resistor (12), electrically earthing the main electrode (7); a substantially dielectric tubular element (21) extending through a wall (22) of the cathode; a ring-shaped anode (25) placed around the tubular element (21) and earthed; and an activation group (11) which is electrically connected to the cathode (5) and is able to reduce the electric potential of the cathode (5) of at least 8 kV in about 10 ns.