PULSED PLASMA DEPOSITION DEVICE
    1.
    发明公开
    PULSED PLASMA DEPOSITION DEVICE 有权
    DEVICE对于脉冲等离子涂层

    公开(公告)号:EP2936538A1

    公开(公告)日:2015-10-28

    申请号:EP13826886.7

    申请日:2013-12-20

    Abstract: A pulsed plasma deposition device, comprising an apparatus for generating a beam of electrons (3), a target (4) and a substrate (6), the apparatus (3) being suitable for generating a pulsed beam of electrons directed towards said target (4) to determine the ablation of the material of said target (4) in the form of a plasma plume (19) directed towards said substrate (6); the device comprises a transportation and focussing group (13) of the beam of electrons towards said target (4), arranged between said apparatus (3) and said target (4) and comprising a transportation cone (14), the transportation and focussing group (13) also comprising a focussing electrode (15) directly connected to the transportation cone (14) and shaped substantially like a loop; the axis of symmetry (16) of the focussing electrode (15) is perpendicular, or substantially perpendicular, to the surface of the target (4).

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