摘要:
The invention relates to a method allowing the creation of nanometric structures by self-assembly of block copolymers, of which at least one of the blocks comes from the polymerisation of monomers comprising at least one cyclic entity satisfying formula I where X= Si(R 1 ,R 2 ), Ge(R 1 ,R 2 ); Z= Si(R 3 ,R 4) , Ge(R 3 ,R 4 ), 0, S, C(R 3 ,R 4 ); Y= 0, S, C(R 5 ,R 6) ; and T= 0, S, C(R7,R 8) ; where R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 are selected from hydrogen, the linear, branched, cyclic alkyl groups with or without heteroatoms, and the aromatic groups with or without heteroatoms.
摘要:
The invention relates to a method allowing the creation of nanometric structures by self-assembly of block copolymers, of which at least one of the blocks can be crystallised or has at least one liquid crystal phase.
摘要:
The invention relates to a process for creating nanometric structures by self-assembly of diblock copolymers, one of the blocks of which is obtained by (co)-polymerization of at least one cyclic entity corresponding to formula (I) and the other block of which is obtained by (co)-polymerization of at least one vinylaromatic monomer. (I) = where X=Si(R1,R2); Ge(R1,R2) Z=Si(R3,R4); Ge(R3,R4); O; S; C(R3,R4) Y=O; S; C(R5,R6) T=O; S; C(R7,R8) R1,R2,R3,R4,R5,R6,R7 and R8 are chosen from hydrogen, linear, branched or cyclic alkyl groups, with or without heteroatom, and aromatic groups with or without heteroatom.
摘要:
The invention concerns a method for reducing the defectivity of a block copolymer film (BPC1), the bottom surface of which is in contact with a previously neutralised surface (N) of a substrate (S) and the top surface of which is covered by a top surface neutralisation layer (TC), so as to obtain an orientation of the nano-domains of said block copolymer (BPC1) perpendicular to the two bottom and top interfaces, said method being characterised in that said top surface neutralisation layer (TC) implemented in order to cover the top surface of the block copolymer film (BCP1) is constituted by a second block copolymer (BPC2).
摘要:
The invention concerns a method for controlling the surface energy at the top interface of a block copolymer (BPC1), the bottom interface of which is in contact with a previously neutralised surface of a substrate, so as to obtain an orientation of the nano-domains of said block copolymer (BPC1) perpendicular to the two bottom and top interfaces, said method consisting of covering the top surface of said block copolymer (BPC1) with a top surface neutralisation layer (TC), and being characterised in that said top surface neutralisation layer (TC) is constituted by a second block copolymer (BPC2).
摘要:
The invention concerns a method for producing a self-assembled block copolymer film on a substrate, said method consisting of simultaneously depositing block copolymer and statistical copolymer by means of a solution containing a mixture of block copolymer and statistical copolymer having different chemical natures and being immiscible, then of carrying out an annealing treatment so as to promote the segregation of phases inherent to the self-assembling of the block copolymers.
摘要:
The present invention relates to a composition of an active film of an organic photovoltaic cell, comprising: an electron-donor material consisting of a conjugated polymer; and an electron-acceptor material consisting of a polymer, characterized in that the active film comprises a copolymer with a linear structure comprising: two to five blocks, at least two blocks of which have different chemical natures; two consecutive blocks having different chemical natures; each block having a molar mass of between 500 g/mol and 50,000 g/mol. The invention also relates to an organic-cell-based photovoltaic module incorporating such a composition and the use of this composition for the same purposes.
摘要:
The present invention relates to a process for reducing the structuring time of ordered films of a composition of block copolymers on a surface without increasing the level of defects, this being whatever the orientation (perpendicular to the substrate, parallel to the substrate, etc.); this composition having a product χ effective*N (with χ effective = chi effective Flory-Huggins parameter, and N the total degree of polymerization) of between 10.5 and 40.
摘要:
The present invention relates to a process for improving the critical dimension uniformity of ordered films of a composition comprising a block copolymer deposited on a surface without degradation of the other critical structuring parameters (kinetics, structuring defects, period, thickness), this being whatever the orientation (perpendicular to the substrate, parallel to the substrate, etc.); this composition having a product χ effective*N (with X effective = Flory-Huggins parameter between two blocks under consideration, and N the total degree of polymerization of these two blocks) of between 10.5 and 40.