Abstract:
The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.
Abstract:
The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.
Abstract:
Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.
Abstract:
The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.
Abstract:
The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.
Abstract:
The invention relates to a method for controlling the surface energy of a substrate, so as to obtain a specific orientation of the nanodomains of a block copolymer film deposited subsequently on the surface, said method being characterised in that it comprises the following steps of: preparing a mixture of polymers, each polymer comprising at least one functional group allowing same to be grafted or crosslinked to the surface of the substrate; depositing the mixture thus prepared on the surface of the substrate; performing a treatment resulting in the grafting or crosslinking of each of the polymers of the mixture to the surface of the substrate.
Abstract:
The invention relates to a method allowing the creation of nanometric structures by self-assembly of block copolymers, of which at least one of the blocks can be crystallised or has at least one liquid crystal phase.
Abstract:
The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.
Abstract:
The present application relates to monomers, methods for preparing block copolymers, block copolymers and their applications. The monomers may form a block copolymer which has an excellent self assembling property and phase separation and to which various required functions can be freely applied as necessary.