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1.发明公开A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING TWO TYPES OF CORROSION INHIBITORS 有权成分用于化学机械抛光（CMP）带双缓蚀剂的类型
公开(公告)号：EP2688966A4
公开(公告)日：2014-11-12
申请号：EP12760432
申请日：2012-03-19
Applicant: BASF SE
Inventor： NOLLER BASTIAN , LAUTER MICHAEL , SUGIHARTO ALBERT BUDIMAN , LI YUZHUO , RUSHING KENNETH , FRANZ DIANA , BÖHN ROLAND , GAO NING
IPC: C09G1/02 , H01L21/321
CPC classification number: H01L21/3212 , C09G1/02 , C09G1/04 , C09K3/1463 , H01L21/30625
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