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1.发明公开A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING TWO TYPES OF CORROSION INHIBITORS 有权成分用于化学机械抛光（CMP）带双缓蚀剂的类型
公开(公告)号：EP2688966A4
公开(公告)日：2014-11-12
申请号：EP12760432
申请日：2012-03-19
Applicant: BASF SE
Inventor： NOLLER BASTIAN , LAUTER MICHAEL , SUGIHARTO ALBERT BUDIMAN , LI YUZHUO , RUSHING KENNETH , FRANZ DIANA , BÖHN ROLAND , GAO NING
IPC: C09G1/02 , H01L21/321
CPC classification number: H01L21/3212 , C09G1/02 , C09G1/04 , C09K3/1463 , H01L21/30625
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2.发明公开A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A NON-IONIC SURFACTANT AND AN AROMATIC COMPOUND COMPRISING AT LEAST ONE ACID GROUP 审中-公开WITH A非离子表面活性化学 - 机械抛光组合物和具有至少一个酸基的芳香族化合物
公开(公告)号：EP2870599A4
公开(公告)日：2016-03-30
申请号：EP13812480
申请日：2013-06-27
Applicant: BASF SE
Inventor： REICHARDT ROBERT , LI YUZHUO , LAUTER MICHAEL
IPC: C09G1/02 , H01L21/321
CPC classification number: C09G1/02 , H01L21/3212
Abstract: A chemical mechanical polishing (CMP) composition (Q) comprising (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) a non-ionic surfactant, (C) an aromatic compound comprising at least one acid group (Y), or a salt thereof, and (M) an aqueous medium.
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3.发明公开A CHEMICAL MECHANICAL POLISHING COMPOSITION COMPRISING A NON-IONIC SURFACTANT AND A CARBONATE SALT 审中-公开用非离子表面活性剂和碳酸酯化学机械抛光组合
公开(公告)号：EP2870212A4
公开(公告)日：2016-03-30
申请号：EP13812726
申请日：2013-06-21
Applicant: BASF SE
Inventor： REICHARDT ROBERT , LAUTER MICHAEL , CHIU WEI LAN WILLIAM , LI YUZHUO
IPC: C09G1/02 , H01L21/321
CPC classification number: C09G1/02 , H01L21/3212
Abstract: A chemical mechanical polishing (CMP) composition (Q) comprising (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) a non-ionic surfactant, (C) a carbonate or hydrogen carbonate salt, (D) an alcohol, and (M) an aqueous medium.
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Patent Agency Ranking4.发明公开A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A POLY(AMINOACID) 审中-公开CHEMISCH-MECHANISCHE POLIERZUSAMMENSETZUNG MIT EINER POLY（AMINOSÄURE）
公开(公告)号：EP3099756A4
公开(公告)日：2017-08-02
申请号：EP15743237
申请日：2015-01-21
Applicant: BASF SE
Inventor： LAUTER MICHAEL , LANGE ROLAND , NOLLER BASTIAN MARTEN , SIEBERT MAX
IPC: C09G1/18 , C09G1/02 , C09K3/14 , H01L21/304 , H01L21/3105 , H01L21/321
CPC classification number: C09G1/02 , C09G1/18 , C09K3/1409 , C09K3/1463 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/76224
Abstract: A chemical mechanical polishing (CMP) composition comprising (A) Colloidal or fumed inorganic particles or a mixture thereof, (B) a poly (amino acid) and or a salt thereof, and (M) an aqueous medium.
Abstract translation: 一种化学机械抛光（CMP）组合物，其包含（A）胶态或气相无机颗粒或其混合物，（B）聚氨基酸和/或其盐和（M）水性介质。
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5.发明公开CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING BENZOTRIAZOLE DERIVATIVES AS CORROSION INHIBITORS 有权ZUSAMMENSETZUNGFÜRCHEMISCH-MECHANISCHES POLIEREN MIT BENZOTRIAZOLDERIVATEN ALS KORROSIONSINHIBITOREN
公开(公告)号：EP3019569A4
公开(公告)日：2017-05-03
申请号：EP14823844
申请日：2014-07-01
Applicant: BASF SE
Inventor： REICHARDT ROBERT , KALLER MARTIN , LAUTER MICHAEL , LI YUZHUO , KLIPP ANDREAS
IPC: C09G1/02 , C09G1/00 , C09G1/04 , H01L21/02 , H01L21/321
CPC classification number: C09K3/1463 , C09G1/02 , H01L21/3212
Abstract: A chemical-mechanical polishing (CMP) composition is provided comprising (A) one or more compounds selected from the group of benzotriazole derivatives which act as corrosion inhibitors and (B) inorganic particles, organic particles, or a composite or mixture thereof. The invention also relates to the use of certain compounds selected from the group of benzotriazole derivatives as corrosion inhibitors, especially for increasing the selectivity of a chemical mechanical polishing (CMP) composition for the removal of tantalum or tantalum nitride from a substrate for the manufacture of a semiconductor device in the presence of copper on said substrate.
Abstract translation: 提供化学机械抛光（CMP）组合物，其包含（A）一种或多种选自苯并三唑衍生物（用作腐蚀抑制剂）和（B）无机颗粒，有机颗粒或其复合物或混合物的化合物。 本发明还涉及选自苯并三唑衍生物的某些化合物作为腐蚀抑制剂的用途，尤其是用于提高化学机械抛光（CMP）组合物用于从基底去除钽或氮化钽的选择性，用于制造 在所述衬底上存在铜的情况下的半导体器件。
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6.发明公开CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A PROTEIN 有权CHEMISCH-MECHANISCHE POLIERZUSAMMENSETZUNG MIT EINEM蛋白
公开(公告)号：EP2812911A4
公开(公告)日：2015-08-12
申请号：EP13746024
申请日：2013-01-25
Applicant: BASF SE , BASF SCHWEIZ AG
Inventor： LI YUZHUO , NOLLER BASTIAN MARTEN , LAUTER MICHAEL , LANGE ROLAND
IPC: H01L21/304 , C09G1/00 , H01L21/302 , H01L21/461 , H01L21/463
CPC classification number: C09G1/02 , C09G1/18 , C09K3/1463 , H01L21/30625 , H01L21/31053
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7.发明公开
公开(公告)号：EP2499210A4
公开(公告)日：2015-04-29
申请号：EP10829604
申请日：2010-11-10
Applicant: BASF SE
Inventor： LAUTER MICHAEL , RAMAN VIJAY IMMANUEL , LI YUZHUO , VENKATARAMAN SHYAM SUNDAR , SHEN DANIEL KWO-HUNG
CPC classification number: C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/31053
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公开(公告)号：EP2753670A4
公开(公告)日：2015-02-25
申请号：EP12830462
申请日：2012-09-04
Applicant: BASF SE
Inventor： LI YUZHUO , LAUTER MICHAEL , LANGE ROLAND , GAO NING
IPC: C09G1/02
CPC classification number: C09G1/02 , C09G1/00 , C09K13/00 , C23F1/00 , H01L21/30625 , H01L21/31053
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