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11 条记录 (耗时 0.011 秒)

    System and method for wafer mounting and evacuation in an electron beam irradiation device
    2.
    发明公开
    System and method for wafer mounting and evacuation in an electron beam irradiation device 审中-公开
    系统和Verfahren zur Wafer-Halterung和Evakuierung在einer Elektronenbestrahlungsanlage

    公开(公告)号：EP1308985A1

    公开(公告)日：2003-05-07

    申请号：EP02257088.1

    申请日：2002-10-11

    申请人： JEOL Ltd. ,  Sony Corporation

    发明人： Yamamoto, Masanobu ,  Kawase, Hiroshi ,  Sasaki, Jun ,  Takeda, Minoru ,  Komatsubara, Gakuo ,  Koizumi, Mitsuru ,  Norioka, Setsuo ,  Date, Naoki

    IPC分类号： H01J37/18 ,  H01J37/20

    CPC分类号： H01J37/18 ,  G11B7/261 ,  H01J37/20 ,  H01J2237/188 ,  H01J2237/3175

    摘要： An electron beam irradiation system is offered which is fitted with a rotary stage and capable of preventing vacuum deterioration when a target is mounted and removed without using a large stage as the rotary stage. The system has a pumping block at an end of a microscope column of electron optics. A method used for this purpose is also offered. The system has the rotary stage, the microscope column for shooting an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. In the mounting position, the target is spaced from the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.

    摘要翻译： 提供一种电子束照射系统，其配备有旋转台，并且能够在不使用大台作为旋转台的情况下安装和拆卸靶时防止真空劣化。 该系统在电子光学显微镜柱的末端具有泵送块。 还提供了一种用于此目的的方法。 该系统具有旋转台，用于在旋转台上的目标处拍摄电子束的显微镜柱，用于在柱和靶之间的间隙中排空空气的泵送块，用于在工作之间滑动旋转台的移动机构 位置和安装位置，以及盖构件。 在工作状态下，目标与柱相反。 在安装位置，目标物与柱体间隔开。 当旋转台从工作位置移动到安装位置时，盖构件与旋转台或目标物紧密接触，以防止真空变质。

    Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium
    3.
    发明公开
    Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium 审中-公开
    电子束照射装置及方法，原版模具和记录介质

    公开(公告)号：EP1152417A3

    公开(公告)日：2001-11-28

    申请号：EP01104999.6

    申请日：2001-03-01

    申请人： SONY CORPORATION

    发明人： Aki, Yuichi ,  Kondo, Takao ,  Takeda, Minoru ,  Yamamoto, Masanobu ,  Masuhara, Shin ,  Kashiwagi, Toshiyuki

    IPC分类号： G11B23/00 ,  G11B7/26 ,  H01J37/30 ,  H01J37/301 ,  H01J37/18 ,  H01J37/317

    CPC分类号： G11B7/261 ,  G11B23/0057 ,  H01J37/301 ,  H01J2237/188

    摘要： There is provided an electron beam irradiation apparatus, an electron beam irradiation method, an original disc, a stamper, and a recording medium, capable of effectively avoiding scattering of an electron beam and avoiding provision of a large scale vacuum chamber. An electron beam irradiation apparatus includes a support section (4) for supporting an electron beam irradiation subject (3) to be irradiated with an electron beam (2), and an electron beam irradiation head (6) opposed to the electron beam irradiation subject via a minute space, the electron beam irradiation head (6) having an electron beam emission hole (5) for irradiating the electron beam irradiation subject (3) with the electron beam (2). In the electron beam irradiation head (6), an electron beam path (20) communicating with the electron beam emission hole (5) is provided, and in addition one or more ring shaped gas suction grooves (61) and (62) opened from a surface of the electron beam irradiation head facing the electron beam irradiation subject is formed around the electron beam emission hole (5). Vacuum pumps are coupled to the electron beam path (20) and the ring shaped gas suction grooves (61) and (62), and the electron beam path is held in a high vacuum state.

    Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium
    10.
    发明公开
    Electron beam irradiation apparatus, electron beam irradiation method, original disk, stamper, and recording medium 审中-公开
    电子束照射装置，电子束照射方法，原盘，压模和记录介质

    公开(公告)号：EP1152417A2

    公开(公告)日：2001-11-07

    申请号：EP01104999.6

    申请日：2001-03-01

    申请人： SONY CORPORATION

    发明人： Aki, Yuichi ,  Kondo, Takao ,  Takeda, Minoru ,  Yamamoto, Masanobu ,  Masuhara, Shin ,  Kashiwagi, Toshiyuki

    IPC分类号： G11B23/00 ,  G11B7/26 ,  H01J37/30 ,  H01J37/301 ,  H01J37/18 ,  H01J37/317

    CPC分类号： G11B7/261 ,  G11B23/0057 ,  H01J37/301 ,  H01J2237/188

    摘要： There is provided an electron beam irradiation apparatus, an electron beam irradiation method, an original disc, a stamper, and a recording medium, capable of effectively avoiding scattering of an electron beam and avoiding provision of a large scale vacuum chamber. An electron beam irradiation apparatus includes a support section (4) for supporting an electron beam irradiation subject (3) to be irradiated with an electron beam (2), and an electron beam irradiation head (6) opposed to the electron beam irradiation subject via a minute space, the electron beam irradiation head (6) having an electron beam emission hole (5) for irradiating the electron beam irradiation subject (3) with the electron beam (2). In the electron beam irradiation head (6), an electron beam path (20) communicating with the electron beam emission hole (5) is provided, and in addition one or more ring shaped gas suction grooves (61) and (62) opened from a surface of the electron beam irradiation head facing the electron beam irradiation subject is formed around the electron beam emission hole (5). Vacuum pumps are coupled to the electron beam path (20) and the ring shaped gas suction grooves (61) and (62), and the electron beam path is held in a high vacuum state.

    摘要翻译： 提供能够有效地避免电子束散射并且避免提供大规模真空室的电子束照射设备，电子束照射方法，原始盘，压模和记录介质。 一种电子束照射设备包括：用于支撑要用电子束（2）照射的电子束照射对象（3）的支撑部分（4）;以及与电子束照射对象相对的电子束照射头（6） 电子束照射头（6）具有用于向电子束照射对象（3）照射电子束（2）的电子束发射孔（5）。 在电子束照射头（6）中，设置有与电子束发射孔（5）连通的电子束路径（20），并且另外还有一个或多个环形气体抽吸槽（61）和（62）从 在电子束发射孔（5）周围形成电子束照射头面向电子束照射对象的表面。 真空泵与电子束路径（20）和环形吸气槽（61）和（62）耦合，并且电子束路径保持在高真空状态。