Electron beam irradiation apparatus and method
    1.
    发明公开
    Electron beam irradiation apparatus and method 审中-公开
    Vorrichtung und Verfahren zur Bestrahlung mittels Elektronen

    公开(公告)号:EP1339084A2

    公开(公告)日:2003-08-27

    申请号:EP03250922.6

    申请日:2003-02-14

    IPC分类号: H01J37/301 H01J37/20

    摘要: An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18. When the static pressure floating pad 18 is separated from the subject 1, the vacuum seal valve 30 is structured to be activated to close the electron beam path 19 so as to prevent the air from flowing into the vacuum chamber 14. In this structure, the vacuum seal valve 30 is formed with a round shaped cross section and in a tapered shape with a narrow tip so as to accomplish high vacuum seal without a gap, so that the degree of vacuum in the vacuum chamber and the electron beam column can surely be maintained.

    摘要翻译: 部分真空法中的电子束照射装置由连接到包含电子束柱15的真空室14的静压浮动垫18构成,并且在将静压浮动垫18附着到被检体1的状态下 照射没有接触的电子束,以及照射被摄体1以通过静压浮动垫18的电子束路径19照射的电子束,由此即使在真空室和电子束柱中也可以将真空室和电子束柱保持在所需的真空度 条件是静压浮动垫18与待照射的被检体1分离。 在静压浮动垫18内设置包括打开和关闭电子束通道19的活塞的真空密封阀30.当静压浮动垫18与被检体1分离时,真空密封阀30构成为 激活以闭合电子束路径19,以防止空气流入真空室14.在该结构中,真空密封阀30形成为圆形截面并具有窄尖端的锥形形状,以便 以实现高真空密封而没有间隙,从而可以可靠地保持真空室和电子束柱中的真空度。

    Electron beam irradiation apparatus and method
    2.
    发明公开
    Electron beam irradiation apparatus and method 审中-公开
    装置和方法通过照射电子的手段

    公开(公告)号:EP1339084A3

    公开(公告)日:2010-05-05

    申请号:EP03250922.6

    申请日:2003-02-14

    IPC分类号: H01J37/301 H01J37/20

    摘要: An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18. When the static pressure floating pad 18 is separated from the subject 1, the vacuum seal valve 30 is structured to be activated to close the electron beam path 19 so as to prevent the air from flowing into the vacuum chamber 14. In this structure, the vacuum seal valve 30 is formed with a round shaped cross section and in a tapered shape with a narrow tip so as to accomplish high vacuum seal without a gap, so that the degree of vacuum in the vacuum chamber and the electron beam column can surely be maintained.

    System and method for wafer mounting and evacuation in an electron beam irradiation device
    3.
    发明公开
    System and method for wafer mounting and evacuation in an electron beam irradiation device 审中-公开
    系统和Verfahren zur Wafer-Halterung和Evakuierung在einer Elektronenbestrahlungsanlage

    公开(公告)号:EP1308985A1

    公开(公告)日:2003-05-07

    申请号:EP02257088.1

    申请日:2002-10-11

    IPC分类号: H01J37/18 H01J37/20

    摘要: An electron beam irradiation system is offered which is fitted with a rotary stage and capable of preventing vacuum deterioration when a target is mounted and removed without using a large stage as the rotary stage. The system has a pumping block at an end of a microscope column of electron optics. A method used for this purpose is also offered. The system has the rotary stage, the microscope column for shooting an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. In the mounting position, the target is spaced from the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.

    摘要翻译: 提供一种电子束照射系统,其配备有旋转台,并且能够在不使用大台作为旋转台的情况下安装和拆卸靶时防止真空劣化。 该系统在电子光学显微镜柱的末端具有泵送块。 还提供了一种用于此目的的方法。 该系统具有旋转台,用于在旋转台上的目标处拍摄电子束的显微镜柱,用于在柱和靶之间的间隙中排空空气的泵送块,用于在工作之间滑动旋转台的移动机构 位置和安装位置,以及盖构件。 在工作状态下,目标与柱相反。 在安装位置,目标物与柱体间隔开。 当旋转台从工作位置移动到安装位置时,盖构件与旋转台或目标物紧密接触,以防止真空变质。