摘要:
There is provided a method of monitoring a firing condition in a cement kiln, by measuring an intensity of spectrum of a radiation which radiation is emitted from a clinker being fired in a cement kiln, and processing the intensity of the spectrum to produce a parameter for monitoring the condition in the kiln, by correcting the intensity profile of the spectrum by interpolating a profile (range) which is deformed by the absorption with alkali atom(s) in an atmosphere of the kiln. Further, the absorption intensity of the spectrum at a sodium absorption wavelength and potassium absorption wavelength should be continuously measured and corrected by interpolating so as to produce a parameter for monitoring. An apparatus for monitoring a cement kiln, comprises an optical head collector equiped at a kiln hood of the kiln, to collect a radiation from a clinker being fired in the kiln, an optical fiber for transmitting the collected radiation, a spectrophotometer for analysing the collected radiation, which is connected to said optical fiber, and, a processor for processing said intensity of the spectrum measured by said spectrophotometer, outputing the processed data, and controlling the operation of the spectrophotometer. Further, the apparatus has said optical collector and said optical fiber mounted respectively on each of a plurality of the cement kilns, and a transfer switch(s) for selecting an optical head and an optical fiber connecting the kiln to be monitored, and then, a plurality of the cement kilns can be monitored.
摘要:
Laser light from the laser light source (14) is conveyed by means of the laser light conveying device (40) to the collimator. After being collimated the laser light is transmitted to the first focusing device (64) whereby the laser light is focused and is then made to pass across the sample path (74). The laser light is scattered by the particles that are present in the sample path (74). Both scattered and collimated light is collected by the second focusing device (78) and then focused thereby on to the detector device (82) such that the intensity distribution of the laser light is gathered by the detector device (82). Particle size distribution is inferred from the light distribution received by the detector device (82).
摘要:
A sensor employs a laser (12) to obtain a collimated light beam for transmission across the gas effluent of a catalytic cracking process. Particulate matter entrained in the gas flow forward scatters light energy to a collecting aperture (18) which, in turn focuses the scattered light on a first photodetector (22). A second photodetector (30) receives directly transmitted light energy. A ratio (64) between the output signals of the two photodetectors is derived and presented to a threshold level detector (70). If the magnitude of the scatter exceeds a predetermined level it is concluded that a catalyst load dump has occurred. The optical system is carefully selected to ensure that only light energy scattered from a sample volume (16) within the entrained gas flow reaches the first photodetector (22). This is important because it prevents particulate matter on the surfaces of the transparent windows (36 and 50) from affecting the operation of the sensor.
摘要:
An efficient absorption spectroscopy system is provided. The spectroscopy system may be configured to measure solid, liquid or gaseous samples. Vacuum ultra-violet wavelengths may be utilized. Some of the disclosed techniques can be used for detecting the presence of trace concentrations of gaseous species. A preferable gas flow cell is disclosed. Some of the disclosed techniques may be used with a gas chromatography system so as to detect and identify species eluted from the column. Some of the disclosed techniques may be used in conjunction with an electrospray interface and a liquid chromatography system so as to detect and identify gas phase ions of macromolecules produced from solution. Some of the disclosed techniques may be used to characterize chemical reactions. Some of the disclosed techniques may be used in conjunction with an ultra short-path length sample cell to measure liquids.
摘要:
A computer-implemented method for determining an optimized purge gas flow in a semi-conductor inspection metrology or lithography apparatus, comprising receiving a permissible contaminant mole fraction, a contaminant outgassing flow rate associated with a contaminant, a contaminant mass diffusivity, an outgassing surface length, a pressure, a temperature, a channel height, and a molecular weight of a purge gas, calculating a flow factor based on the permissible contaminant mole fraction, the contaminant outgassing flow rate, the channel height, and the outgassing surface length, comparing the flow factor to a predefined maximum flow factor value, calculating a minimum purge gas velocity and a purge gas mass flow rate from the flow factor, the contaminant mass diffusivity, the pressure, the temperature, and the molecular weight of the purge gas, and introducing the purge gas into the semi-conductor inspection metrology or lithography apparatus with the minimum purge gas velocity and the purge gas flow rate.
摘要:
Provided is a laser-type gas analyzing apparatus including a radiating section (106) that radiates laser light from outside a side wall (12) of a flue (10), through an opening portion (14) provided in the side wall (12), and onto an inner surface of the side wall (12) opposite the opening portion (14); a light receiving section (116) that receives the laser light reflected by the inner surface; and a calculating section (104) that calculates a concentration of a target gas passing through the flue (10), based on an intensity of the laser light output by the radiating section (106) and an intensity of the laser light received by the light receiving section (116).
摘要:
A computer-implemented method for determining an optimized purge gas flow in a semi-conductor inspection metrology or lithography apparatus, comprising receiving a permissible contaminant mole fraction, a contaminant outgassing flow rate associated with a contaminant, a contaminant mass diffusivity, an outgassing surface length, a pressure, a temperature, a channel height, and a molecular weight of a purge gas, calculating a flow factor based on the permissible contaminant mole fraction, the contaminant outgassing flow rate, the channel height, and the outgassing surface length, comparing the flow factor to a predefined maximum flow factor value, calculating a minimum purge gas velocity and a purge gas mass flow rate from the flow factor, the contaminant mass diffusivity, the pressure, the temperature, and the molecular weight of the purge gas, and introducing the purge gas into the semi-conductor inspection metrology or lithography apparatus with the minimum purge gas velocity and the purge gas flow rate.
摘要:
A flow analyzer includes a flow body having a single-piece construction. The flow body includes a flow path extending through the flow body along a flow direction between opposing inlet and outlet ports and an enclosed wiring conduit extending substantially transverse to the flow direction between a first side of the flow body and a second side of the flow body. The enclosed wiring conduit is isolated from the flow path. An illumination unit is disposed on the first side of the flow body and configured to illuminate fluid within the flow path. An observation unit is disposed on the second side of the flow body and configured to visually observe the fluid within the flow path.
摘要:
Die vorliegende Erfindung betrifft einen Messstutzen zum optischen Untersuchen eines durch eine Gasleitung (12) geleiteten Gases durch Analysieren einer durch das Gas geführten Messstrahlung (22), wobei der Messstutzen (16, 16') an der das zu untersuchende Gas führenden Gasleitung (12) fixierbar ist, und wobei der Messstutzen (16, 16') einen Messkanal (26) zum Durchleiten der Messstrahlung (22) aufweist, wobei der Messstutzen (16, 16') zusätzlich zu dem Messkanal (26) einen von dem Messkanal (16, 16') zumindest teilweise getrennten Dampfkanal (28) aufweist, wobei der Dampfkanal (28) den Messkanal (26) zumindest teilweise umrahmt. Ein vorbeschriebener Messstutzen (16, , 16') erlaubt eine verlängerte Messphase und eine verkürzte Regenerierungsphase bei einem ressourcenschonenden Regeneieren des Messstutzens (16, 16').