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199 条记录 (耗时 0.016 秒)

    ELECTROLYTIC DISSOLUTION OF CHROMIUM FROM CHROMIUM ELECTRODES
    98.
    发明公开
    ELECTROLYTIC DISSOLUTION OF CHROMIUM FROM CHROMIUM ELECTRODES 审中-公开
    ELEKTROLYTISCHEAUFLÖSUNGVON CHROM AUS CHROMELEKTRODEN

    公开(公告)号：EP2640873A4

    公开(公告)日：2017-03-29

    申请号：EP11841641

    申请日：2011-10-04

    申请人： MACDERMID ACUMEN INC

    发明人： PEARSON TREVOR

    IPC分类号： C25D5/18 ,  C25D3/06

    CPC分类号： C25B1/00 ,  C25D3/06 ,  C25D21/18

    摘要： An electrolytic cell for replenishing chromium content of a trivalent chromium electrolyte and a method of replenishing trivalent chromium content using the electrolytic cell is provided. The method comprising the steps of immersing a chromium electrode and a second electrode in a trivalent chromium electrolyte and applying an alternating pulse current across the chromium electrode and the second electrode. In this manner, trivalent chromium is electrolytically dissolved from the chromium electrode and the trivalent chromium content of the electrolyte in which the chromium electrode is immersed is enriched.

    摘要翻译： 提供了一种用于补充三价铬电解质的铬含量的电解槽和使用该电解槽补充三价铬含量的方法。 该方法包括以下步骤：将铬电极和第二电极浸入三价铬电解质中，并在铬电极和第二电极上施加交变脉冲电流。 以这种方式，从铬电极电解溶解三价铬，并且富集铬电极的电解质的三价铬含量。

    METHOD FOR PLATING METALLIC WIRE OR TAPE AND PRODUCT OBTAINED WITH SAID METHOD
    99.
    发明公开
    METHOD FOR PLATING METALLIC WIRE OR TAPE AND PRODUCT OBTAINED WITH SAID METHOD 审中-公开
    法电镀金属丝或磁带和生产的产品由该方法

    公开(公告)号：EP3112502A1

    公开(公告)日：2017-01-04

    申请号：EP16176105.1

    申请日：2016-06-24

    申请人： Vazzoler, Evio

    发明人： VAZZOLER, Evio ,  CIVATI, Luca

    IPC分类号： C25D5/14 ,  C25D7/06 ,  C25D3/06 ,  C25D3/12

    CPC分类号： C25D7/0607 ,  C25D3/06 ,  C25D5/14 ,  C25D7/0614

    摘要： The present invention refers to a method for plating a metallic product (10) having a prevailing dimension, like wire or tape, comprising a cycle of treatments of electrolytic type in continuous cycle so as to progressively obtain a metallic product (30) with multilayer plating with low release of nickel; the method comprising the following phases:
    - Preparatory phase (A, B, C, D);
    - Phase of electrolytic nickel-plating (E);
    The plating method also comprises a phase of chromium electroplating (G) following the electrolytic nickel-plating phase (E). The metallic product (10) goes through all the phases in a continuous manner and at a substantially constant speed.
    The invention also refers to a metallic product obtained through said plating method.

    摘要翻译： 本发明涉及一种用于镀覆的金属产品（10），其具有普遍的尺寸，像导线或带，在连续循环包括电解类型的治疗周期，以便逐步获得的金属产品（30）与多层电镀 有镍的低释放; 该方法包括以下阶段： - 准备阶段（A，B，C，D）; - 电解镀镍（E）的相; 镀覆方法包括这样铬电镀的继电解镀镍相（E）的相（G）。 金属产品（10）穿过以连续的方式的所有阶段和在基本上恒定的速度。 因此，本发明涉及通过所述电镀方法获得的金属产品。

    ELECTROPLATING BATH AND METHOD FOR PRODUCING DARK CHROMIUM LAYERS
    100.
    发明授权
    ELECTROPLATING BATH AND METHOD FOR PRODUCING DARK CHROMIUM LAYERS 有权
    VERFAHREN ZER HERSTELLUNG VON DUNKLEN CHROMSCHICHTEN的GALVANISIERUNGSBAD

    公开(公告)号：EP2705176B1

    公开(公告)日：2016-04-13

    申请号：EP12717725.1

    申请日：2012-04-27

    申请人： Atotech Deutschland GmbH

    发明人： SCHULZ, Klaus-Dieter ,  WACHTER, Philipp ,  HARTMANN, Philip

    IPC分类号： C25D3/06 ,  C25D3/08 ,  C25D3/10

    CPC分类号： C25D3/10 ,  C25D3/06 ,  C25D3/08

    摘要： The invention relates to methods and plating baths for electrodepositing a dark chromium layer on a workpiece. The trivalent chromium electroplating baths comprise sulphur compounds and the methods for electrodepositing a dark chromium layer employ these trivalent chromium electroplating baths. The dark chromium deposits and workpieces carrying dark chromium deposits are suited for application for decorative purposes.

    摘要翻译： 本发明涉及用于在工件上电沉积暗铬层的方法和电镀液。 三价铬电镀浴包含硫化合物，电沉积黑铬层的方法采用这些三价铬电镀浴。 暗铬沉积物和携带暗铬沉积物的工件适用于装饰目的。