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189 条记录 (耗时 0.018 秒)

    HIGH-SPEED PARTICLE GENERATOR
    95.
    发明授权
    HIGH-SPEED PARTICLE GENERATOR 有权
    发电机快粒子

    公开(公告)号：EP1617440B1

    公开(公告)日：2009-06-10

    申请号：EP04728960.8

    申请日：2004-04-22

    申请人： Japan Science and Technology Agency

    发明人： TAKAHASHI, Hironori ,  FUJIMOTO, Masatoshi ,  AOSHIMA, Shin-ichiro

    IPC分类号： G21K1/00 ,  G21K5/08 ,  H01J27/24

    CPC分类号： G21K1/06

    摘要： A target (30) placed in a vacuum chamber (60) is irradiated with laser beam (L1) that is outputted from a laser beam source (10) while being condensed through a condensation optical system (20). Consequently, high-speed particles (P), e.g. protons, are generated and emitted from the target (30). Plasma emission (L2) from the target (30) incident to condensed irradiation with the laser beam (L1) is measured by means of a light measuring instrument (40) and a measurement signal therefrom is analyzed by means of an analyzer (50), thus evaluating the generating condition of high-speed particles (P). Based on the results of analysis, the condensation optical system (20) and the target (30) are controlled through an optical system moving mechanism (25) and a target moving mechanism (35), thus feedback controlling the generating condition of high-speed particles (P) at the target (30). A high-speed particle generator capable of generating high-speed particles efficiently by monitoring in real time the generating condition thereof is thereby realized.

    PLASMA FOCUS LIGHT SOURCE WITH ACTIVE AND BUFFER GAS CONTROL
    96.
    发明公开
    PLASMA FOCUS LIGHT SOURCE WITH ACTIVE AND BUFFER GAS CONTROL 审中-公开
    与ACTIVE和缓冲气体控制等离子体聚焦光源

    公开(公告)号：EP1305813A4

    公开(公告)日：2007-10-31

    申请号：EP01946210

    申请日：2001-06-07

    申请人： CYMER INC

    发明人： BIRX DANIEL L DI ,  MELNYCHUK STEPHAN T ,  PARTLO WILLIAM N ,  FOMENKOV IGOR V ,  NESS RICHARD M ,  SANDSTROM RICHARD L ,  RAUCH JOHN E

    IPC分类号： G21K1/00 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  G21K5/08 ,  H01L21/027 ,  H05G2/00 ,  H05H1/06 ,  H05H1/24 ,  H01J35/20

    CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916 ,  H05G2/005 ,  H05H1/06

    摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 pi steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater. Gas flows in the vacuum chamber are controlled to assure desired concentration of active gas in the discharge region and to minimize active gas concentration in the beam path downstream of the pinch region. In a preferred embodiment, active gas is injected downstream of the pinch region and exhausted axially through the center of the anode. In another preferred embodiment a laser beam generates metal vapor at a location close to but downstream of the pinch region and the vapor is exhausted axially through the anode.

    TARGET CONTAINER FOR NEUTRON SCATTERING APPARATUS
    98.
    发明公开
    TARGET CONTAINER FOR NEUTRON SCATTERING APPARATUS 审中-公开
    目标容器中子散射装置

    公开(公告)号：EP1284482A1

    公开(公告)日：2003-02-19

    申请号：EP01932270.0

    申请日：2001-05-25

    申请人： Mitsubishi Heavy Industries, Ltd.

    发明人： HINO, Ryutaro ,  KAMINAGA, Masanori ,  ISHIKURA, Syuichi, c/o KOBE Shipyard & Mach. Works ,  UZAWA, Masayuki, c/o KOBE Shipyard & Mach. Works ,  IITSUKA, Toru, c/o KOBE Shipyard & Mach. Works ,  YANAGISAWA, Ichiro, c/o KOBE Shipyard & Mach.Works

    IPC分类号： G21K5/08 ,  H05H6/00

    CPC分类号： H05H6/00

    摘要： Target cell of a neutron scattering device, containing liquid metal target material, has its beam window, through which proton beam enters, formed in a structure that is thin and yet can stand both pressure wave stress and thermal stress. In the target cell comprising an outer casing and an inner casing, both having a front face formed with the beam window, and being formed in a double structure of the outer casing and the inner casing with a predetermined distance maintained therebetween so that cooling medium is supplied there and target material is supplied into the inner casing, the beam window of the inner casing is made in a flat plate structure. By this flat plate structure, its rigidity is lowered and cell stress of a secondary stress character caused in the target cell by the pressure wave is reduced. Or, the beam window of the inner casing is formed to have a linear front face in the vertical section and a continuously curved front face in the horizontal section. Thereby, in the beam window of the inner casing, the pressure wave stress and the thermal stress are coped with by the linear front face and the continuously curved front face, respectively.