VERFAHREN UND VORRICHTUNG ZUR DURCHFÜHRUNG DER EMISSIONSSPEKTROMETRIE
    111.
    发明授权
    VERFAHREN UND VORRICHTUNG ZUR DURCHFÜHRUNG DER EMISSIONSSPEKTROMETRIE 有权
    方法和设备实现发射光谱法

    公开(公告)号:EP1520165B1

    公开(公告)日:2008-03-19

    申请号:EP03761506.9

    申请日:2003-06-25

    CPC classification number: G01J3/443 G01N21/718

    Abstract: The invention relates to a method and a device for carrying out emission spectroscopy, in particular laser emission spectroscopy. According to said method, a pulsed laser beam is automatically focussed on a workpiece to generate a laser-induced plasma, the radiation emitted from the plasma is detected and an elemental analysis is performed using the captured radiation spectrum. The invention is characterised in that a laser beam impingement is carried out with a variable pulse interval DELTA T, that prior to the plasma generation, additional geometric parameters P 1, P 2 .. PN of a potential measurement location on the workpiece surface, in addition to the distance d of the autofocus lens from said workpiece surface are determined and in that an elemental analysis is only performed for the potential measurement locations, at which at least one of the additional geometric parameters lies within a predefined tolerance range [T1..T2].

    Spectroscopic analysis apparatus
    113.
    发明公开
    Spectroscopic analysis apparatus 有权
    分光分析装置

    公开(公告)号:EP1167932A3

    公开(公告)日:2004-10-13

    申请号:EP01112798.2

    申请日:2001-05-28

    Applicant: HORIBA, LTD.

    Inventor: Uemura, Takeshi

    CPC classification number: G01J3/20 G01J3/2803 G01J3/443

    Abstract: This invention presents a spectroscopic analyzing apparatus, which can increase the SN ratio, by executing an optimal spectroscopic analysis of light from a light source, which gives different light spectrum inherent to the component to be measured and has a different strength distribution according to the light emitting position therein, for example, light emitted from ICP. This invention comprises a light source (2), which emits different light spectra, each light spectrum being inherent to a component to be measured and having a different strength distribution according to the respective light emitting position; a spectroscope (6) for dispersing the light from the light source (2) according to its wavelength; at least one CTD photo sensor (8a - 8c) for sensing light being dispersed by the spectroscope (6) and lying within a specific wavelength range; and an optical system(9) for analyzing the light sensed by said at least one CTD photo sensor (8a - 8c), thereby making an image of the light source (2).

    METHOD AND APPARATUS FOR MONITORING PLASMA PROCESSING OPERATIONS
    115.
    发明公开
    METHOD AND APPARATUS FOR MONITORING PLASMA PROCESSING OPERATIONS 审中-公开
    用于监控等离子体加工操作通的方法和设备

    公开(公告)号:EP1105703A1

    公开(公告)日:2001-06-13

    申请号:EP99918803.0

    申请日:1999-04-23

    CPC classification number: G01J3/443 G01J3/28 G01J2003/2866

    Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in some manner to calibrating or initializing a plasma monitoring assembly (174). This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window (124) through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber (74).

    Spectroscopes
    117.
    发明公开
    Spectroscopes 失效
    Spektroskope。

    公开(公告)号:EP0343018A2

    公开(公告)日:1989-11-23

    申请号:EP89305168.0

    申请日:1989-05-22

    Abstract: A compact spectroscope, particularly a sprectrofluoroscope or a microspectroscope, applicable for spectrophotometry of very slight light emission having a high visibility, overcoming the defects of the conventional spectroscope through the use of a transmission-type diffraction grating (G,55) and the combination of a two-dimensional photon counter (D,5Y) as an apparatus for obtaining the image of a very slight light emitting object.
    Light from a light emitting body is converted into a point or line source (S) and is specially detected by passing through a lens (L₁,54) having a small numerical aperture and a focus coincident with the source, a transmission type diffraction grating (G,55) and a collecting lens (L₂,56) to a detector (D,57).

    Abstract translation: 一种紧凑型分光镜,特别是荧光显微镜或微型显微镜,适用于具有高可见度的非常轻微的发光分光光度法,通过使用透射型衍射光栅(G,55)克服常规光谱仪的缺陷, 作为用于获得非常轻微的发光物体的图像的装置的二维光子计数器(D,5Y)。 来自发光体的光被转换为点或线源(S),并且通过穿过具有小数值孔径和与源重合的焦点的透镜(L1,54)来特别检测透射型衍射光栅( G,55)和收集透镜(L2,56)连接到检测器(D,57)。

    Optical system for a multidetector array spectrograph
    118.
    发明公开
    Optical system for a multidetector array spectrograph 失效
    用于与多个检测器的配置的分光装置的光学系统。

    公开(公告)号:EP0340915A2

    公开(公告)日:1989-11-08

    申请号:EP89303411.6

    申请日:1989-04-06

    Abstract: An optical system for a multidetector array spectrophotometer includes multiple light sources (10,12) for emitting light of selected wavelength ranges and means for selectively transmitting the selected wavelength ranges of light to respective slits (40,42) of a multi-slit spectrograph for multiple wavelength range detection. The spectrograph has two or more slits (40,42) which direct the selected wavelength ranges of the light spectra to fall upon a dispersive and focusing system which collects light from each slit, disperses the light by wavelength and refocuses the light at the positions of a single set of detectors (46).

    Abstract translation: 用于多检测器阵列分光光度计的光学系统包括用于选择性地透射光的所选择的波长范围到respectivement多缝光谱仪的狭缝(40,42),用于发射所选择波长范围和手段的光的多个光源(10,12) 多波长范围检测。 摄谱仪具有两个或更多的狭缝(40,42),其指导的光的光谱的选定波长范围到落在色散和聚焦系统,其从每个狭缝收集光,通过波长分散的光,并在的位置重新聚焦的光 一组检测器(46)。

    AN OPTICAL SPECTROMETER ASSEMBLY
    119.
    发明公开

    公开(公告)号:EP4414671A1

    公开(公告)日:2024-08-14

    申请号:EP23155344.7

    申请日:2023-02-07

    CPC classification number: G01J3/443 G01J3/18 G01J3/36

    Abstract: According to an example embodiment, an optical spectrometer assembly (110) for an optical emission spectroscopy, OES, instrument is provided, the optical spectrometer assembly (110) comprising: an entrance aperture (112) arranged for entry of an input beam to the optical spectrometer assembly (110); and an optical system comprising a beam splitter (114) arranged to receive the input beam and split the input beam into a first beam portion that conveys at least wavelengths within a first wavelength sub-range and a second beam portion that conveys at least wavelengths within a second wavelength sub-range, where the first and second wavelength sub-ranges are substantially non-overlapping, a first optical sub-assembly (116) comprising a first grating assembly (116a) arranged to diffract the first beam portion and a first detector assembly (116c) arranged to detect one or more spectral lines of interest within the first wavelength sub-range based on the diffracted first beam portion, and a second optical sub-assembly (118) comprising a second grating assembly (118a) arranged to diffract the second beam portion and a second detector assembly (118c) arranged to detect one or more spectral lines of interest within the second wavelength sub-range based on the second beam portion, wherein the first optical sub-assembly (116) is spatially isolated from other parts of the optical assembly so as to enable providing the first and second optical sub-assemblies (116, 118) in different atmospheres.

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