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公开(公告)号:EP2560185A2
公开(公告)日:2013-02-20
申请号:EP12006748.3
申请日:2004-01-29
发明人: Tanba, Yuusuke , Sato, Mitsugu , Takahashi, Kaname , Watanabe, Shunya , Nakagawa, Mine , Muto, Atsushi , Morikawa, Akinari
IPC分类号: H01J37/28 , H01J37/244
CPC分类号: H01J37/244 , H01J37/28 , H01J2237/24455 , H01J2237/2446 , H01J2237/2802
摘要: The charged particle beam device of this invention has a source of charged particles, and a charged particle optical system for focusing primary charged particle beams (3) emitted from said source and scanning the primary charged beams (3) on a sample (14). The device comprises a transmitted signal conversion member (15) for emitting secondary charged particles (12a, 12b) by collisions of dark field charged particles (18b) transmitted through the sample (14). An opening is formed in said transmitted signal conversion member (15) which opening has a size through which the transmitted charged particles (18b) can pass. The device further comprises a power supply capable of applying a positive voltage (Vc) to said opening. By controlling the positive voltage, the lower limit of the scattering angle of the dark field signal detected by a detector (13) can be controlled.
摘要翻译: 本发明的带电粒子束装置具有带电粒子源和带电粒子光学系统,所述带电粒子光学系统用于将从所述源发射的初级带电粒子束(3)聚焦并且将初级带电束(3)扫描在样本(14)上。 该装置包括透射信号转换构件(15),用于通过透过样本(14)的暗场带电粒子(18b)的碰撞来发射次级带电粒子(12a,12b)。 在所述透射信号转换部件(15)中形成开口,该开口具有所传送的带电粒子(18b)能够通过的尺寸。 该装置还包括能够向所述开口施加正电压(Vc)的电源。 通过控制正电压,可以控制由检测器(13)检测到的暗场信号的散射角度的下限。
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公开(公告)号:EP2023373B1
公开(公告)日:2014-04-02
申请号:EP08017746.2
申请日:2003-09-10
发明人: Sato, Mitsugu , Todokoro, Hideo , Ose, Yoichi , Ezumi, Makoto , Arai, Noriaki , Doi, Takashi
IPC分类号: H01J37/153
CPC分类号: H01J37/153 , H01J2237/1506 , H01J2237/1534 , H01J2237/28
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公开(公告)号:EP2023373A3
公开(公告)日:2012-01-25
申请号:EP08017746.2
申请日:2003-09-10
发明人: Sato, Mitsugu , Todokoro, Hideo , Ose, Yoichi , Ezumi, Makoto , Arai, Noriaki , Doi, Takashi
IPC分类号: H01J37/153
CPC分类号: H01J37/153 , H01J2237/1506 , H01J2237/1534 , H01J2237/28
摘要: A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam (4) is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses (5 and 7) off the axes thereof. A means is provided to control the off-axis trajectory of the beam such that an aberration produced by the objective lens (7) when the beam is inclined can be cancelled by an aberration produced by the other lens (5).
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