摘要:
There is provided a scanning transmission electron microscope capable of producing plural types of STEM (scanning transmission electron microscopy) images using a single detector. The electron microscope (100) has an electron source (10) emitting an electron beam, a scanning deflector (13) for scanning the beam over a sample (S), an objective lens (14) for focusing the beam, an imager (22) placed at a back focal plane of the objective lens (14) or at a plane conjugate with the back focal plane, and a scanned image generator (40) for generating scanned images on the basis of images captured by the imager. The scanned image generator (40) operates to form electron diffraction patterns from the electron beam passing through positions on the sample by the scanning of the electron beam, to capture the electron diffraction patterns by the imager so that plural images are produced, to integrate the intensity of each pixel over an integration region that is set based on the size of an image of a transmitted wave in a respective one of the produced images for each of the produced images such that the signal intensity at each position on the sample is found, and to generate the scanned images on the basis of the signal intensities at the positions on the sample.
摘要:
Quantitative Secondary Electron Detection (QSED) using the array of solid state devices (SSD) based electron-counters enable critical dimension metrology measurements in materials such as semiconductors, nanomaterials, and biological samples (FIG. 3). Methods and devices effect a quantitative detection of secondary electrons with the array of solid state detectors comprising a number of solid state detectors. An array senses the number of secondary electrons with a plurality of solid state detectors, counting the number of secondary electrons with a time to digital converter circuit in counter mode.
摘要:
Further, a mechanism to allow dynamically switchable or simultaneous linear and counted signal processing from each pixel of the image so that high-illumination areas can be acquired linearly without the severe dose rate limitation of counting and low-illumination regions can be acquired with counting, the switchover point determined by the dose rate at which signal quality breaks even between linear and counting modes.
摘要:
The invention relates to a multi-beam apparatus for inspecting a sample (232) with a multitude of focused beams, the apparatus equipped to scan a multitude of N beams (240-n) over the sample, the apparatus equipped with a multitude of M detectors (234-m) for detecting secondary radiation emitted by the sample when said sample is irradiated by the multitude of beams, each of the detectors capable of outputting a detector signal representing the intensity of the secondary radiation detected by the detector, characterized in that, in working, each detector signal comprises information caused by multiple beams, the information caused by one beam thus spread over multiple detectors, the apparatus equipped with a programmable controller (236) for processing the multitude of detector signals to a multitude of output signals, the controller processing the multitude of detector signals so that each output signal represents information caused by a single beam.
摘要:
A scanning charged particle microscope is offered which can selectively detect and image electrons. The scanning charged particle microscope (100) has: a source (1) of a charged particle beam (E1); an objective lens (6) for bringing the charged particle beam (E1) emitted from the source (1) into focus at a sample (S); a scanning deflector (4) for scanning the focused charged particle beam (E1) over the sample (S); a sorting portion (10) for sorting out electrons emitted at given emission angles from electrons released from the sample (S) in response to irradiation of the sample (S) by the charged particle beam (E1); an electron deflector (20) for producing a deflecting field to deflect the electrons (E2) sorted out according to their energy; a detection portion (30) for detecting the electrons (E2) deflected by the electron deflector (20); and an image creating portion (44) for creating an image, based on the results of the detection performed by the detection portion (30).
摘要:
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 2·1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25·11.