公开(公告)号：EP1897869A4

公开(公告)日：2010-05-05

申请号：EP06746255

申请日：2006-05-11

Applicant: JSR CORP

Inventor： NAGAI TOMOKI ,  SHIMOKAWA TSUTOMU ,  SUGIURA MAKOTO ,  KAWAKAMI TAKANORI ,  EBATA TAKUMA ,  YONEDA EIJI ,  SHIMIZU MAKOTO

IPC: C07C309/10 ,  C07C309/12 ,  C07C309/19 ,  C07C309/20 ,  C07C381/12 ,  C07D209/76 ,  C08F20/38 ,  C08F28/02 ,  C08F220/12 ,  C08L33/04 ,  C08L41/00 ,  G03F7/039 ,  H01L21/027

CPC classification number: C09D133/14 ,  C07C309/10 ,  C07C309/12 ,  C07C309/19 ,  C07C309/20 ,  C07C381/12 ,  C07D209/76 ,  C08F20/38 ,  C08F28/00 ,  C08F28/02 ,  C08F214/18 ,  C08F220/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  C08F228/02 ,  C09D141/00 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397

公开(公告)号：EP1679314A4

公开(公告)日：2008-12-24

申请号：EP04792382

申请日：2004-10-14

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  YAMAHARA NOBORU ,  TANAKA MASATO ,  SHIMOKAWA TSUTOMU

IPC: C07F7/18 ,  C07F7/08 ,  C08G77/14 ,  C08G77/24 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027

CPC classification number: G03F7/0757 ,  C07F7/0852 ,  C07F7/1836 ,  C08G77/14 ,  C08G77/24 ,  G03F7/0045

Abstract: Disclosed is a novel polysiloxane which is suitable for a resin component in a chemically amplified resist that is particularly excellent in I-D bias, depth of focus (DOF) and the like. Also disclosed are a novel silane compound useful as a raw material for synthesizing such a polysiloxane, and a radiation-sensitive resin composition containing such a polysiloxane. The silane compound is represented by the following formula (I). (I) The polysiloxane has a constitutional unit represented by the following formula (1). (1) (R represents an alkyl group; R and R respectively represent a fluorine atom, a lower alkyl group or a lower fluorinated alkyl group; n is 0 or 1; k is 1 or 2; and i is an integer of 0-10.) The radiation-sensitive resin composition contains such a polysiloxane and a radiation-sensitive acid generator.