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11.发明公开
公开(公告)号：EP1706790A1
公开(公告)日：2006-10-04
申请号：EP05701043.1
申请日：2005-01-19
CPC分类号： G03F7/027 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41N1/083 , Y10S430/122 , Y10S430/145
摘要： Lithographic printing plate precursor comprising: a) an untreated or pretreated substrate and b) a radiation-sensitive coating comprising: (i) at least one polymeric binder soluble or swellable in aqueous alkaline developers; (ii) at least one free-radical polymerizable monomer and/or oligomer comprising at least one non-aromatic C-C double bond and at least one SH group in the molecule; and (iii) a radiation-sensitive initiator or initiator system for free-radical polymerization, wherein component (ii) has the formula (I) wherein each R1a, R1b and R1c is independently selected from H, C1-C6 alkyl, C2-C8 alkenyl, aryl, halogen, CN and COOR1d, wherein Rid is H, C1-C18 alkyl, C2-C8 alkenyl, C2-C8 alkynyl or aryl; and Z is an aliphatic, heterocyclic or heteroaromatic spacer or a combination of two or more thereof, wherein Z can optionally comprise one or more additional SH groups and/or one or more additional non-aromatic C-C double bonds; and each Z1 is independently selected from a single bond, formulae (Ia), (Ib), (Ic), (Id), (Ie), (If), (Ig), (Ih), (Ij), (Ik), (Im), (In), (Io), (Ip), (Iq), (Ir), (Is), (It), (Iu), (Iv), wherein R2a, R2b and R2c are independently selected from H, C1-C6 alkyl and aryl, Z2 is selected from a single bond, O, S and NR2c, Z3 is a single bond which is connected to Z, b is an integer from 1 to 10 and c is an integer from 1 to 3.
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公开(公告)号：EP1444552B1
公开(公告)日：2006-04-19
申请号：EP02789645.5
申请日：2002-11-13
IPC分类号： G03F7/30
CPC分类号： G03F7/3092
摘要： A method for the refreshment and reuse of loaded developers used in lithographic printing is disclosed. A polyoxyalkylene derivative is added to a silicate-containing loaded developer. Insoluble material is separated and the alkalinity level of the resulting essentially colorless liquid adjusted to produce a refreshed developer. The refreshed developer may be used to develop additional exposed imageable elements.
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公开(公告)号：EP1567597A1
公开(公告)日：2005-08-31
申请号：EP03785742.2
申请日：2003-12-04
IPC分类号： C09B23/00
CPC分类号： C09B23/0066 , C09B23/0016 , C09B23/0033 , C09B23/0041 , C09B23/086
摘要： A single-step process for the production of meso-substituted cyanine dyes is provided comprising the reaction of a dye (III), with (a) a methylene compound (IV) or (V) or a quaternary salt (VI) or (VII) and (b) a compound selected from functionalized (hetero)aromatic compounds Ar-B, saturated cyclic amines (IV) and heteroaromatic compounds (V).
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14.发明公开
公开(公告)号：EP1543046A1
公开(公告)日：2005-06-22
申请号：EP03790933.0
申请日：2003-08-28
CPC分类号： C08F8/14 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , C08F8/28 , C08F8/46 , C08L59/00 , C08L61/00 , C08F16/06 , C08F216/38 , C08L2666/16
摘要： Heat-sensitive element comprising (a) an optionally pre-treated substrate (b) a positive working heat-sensitive coating comprising (i) at least one novolak resin, (ii) at least one component which reduces the aqueous alkaline developer solubility of novolak, wherein said reduction in solubility is reversed upon the application of heat, and (iii) at least one acidic polyvinyl acetal comprising the structural units (A), (B), (C) (A) (B) (C) and (D) wherein (D) is at least one unit selected from (D-1), (D-2), and (D-3): (D-1) (D-2) (D-3) wherein R1 is a hydrogen atom or a C1-C4 alkyl group, R2 is a hydrogen atom or a C1-C18 alkyl group, R3 is a hydrogen atom or a C1-C4 alkyl group, R4 is a hydrogen atom or a C1-C4 alkyl group, R5 is -COOH, -(CH2)a-COOH, -O-(CH2)a-COOH, -SO3H, -PO3H2 or -PO4H2, a is an integer from 1 to 8, and X is selected from -(CR6R7)n- and -CR8=CR9- wherein n is an integer of 1 to 6, each R6 and R7 is independently selected from a hydrogen atom and C1-C6 alkyl group, and R8 and R9 are independently selected from a hydrogen atom and a C1- C6 alkyl group or R8 and R9 together with the two carbon atoms to which they are bonded, form an optionally substituted aryl or heteroaryl group, wherein components (i) and (ii) do not have to be present as separate substances but may be used in the form of an appropriately functionalized novolak.
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15.发明授权Overcoat for light-sensitive materials comprising a (1-vinylimidazole) polymer or copolymer 失效为感光材料1-乙烯基咪唑聚合物或共聚物含有罩面
公开(公告)号：EP1000387B1
公开(公告)日：2003-11-05
申请号：EP98939645.2
申请日：1998-07-30
发明人： PAPPAS, Socrates, Peter , BAUMANN, Harald , DWARS, Udo , SAVARIAR-HAUCK, Celin, M. , TIMPE, Hans-Joachim
IPC分类号： G03F7/09
CPC分类号： G03F7/092 , Y10T428/31 , Y10T428/31721 , Y10T428/31855 , Y10T428/31935
摘要： The invention relates to water-soluble layers which in addition to polyvinyl alcohol comprise poly(1-vinylimidazole) or a copolymer of 1-vinylimidazole and at least one further monomer as a further component. These layers can be used as an overcoat on the light-sensitive layer of printing plates.
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公开(公告)号：EP0917544B1
公开(公告)日：2002-12-18
申请号：EP97910760.4
申请日：1997-09-29
发明人： BAUMANN, Harald , DWARS, Udo , SAVARIAR-HAUCK, Celin, M. , PAPPAS, Socrates, Peter , TIMPE, Hans-Joachim
IPC分类号： C08F8/12 , C09D129/04 , C09D131/02 , G03F7/09
CPC分类号： C09D129/14 , C09D129/04 , G03F7/11 , H05K3/287
摘要： Water soluble oxygen-impermeable coatings possessing high photosensitivity, good resolution, good ink receptivity after development, long shelf live and good adhesion. The amine- and hydroxy-functional vinyl coatings are to be used in the production of lithographic printing plates.
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公开(公告)号：EP0938413A1
公开(公告)日：1999-09-01
申请号：EP97946526.0
申请日：1997-11-06
发明人： NGUYEN, My, T. , SARAIYA, Shashikant , SHAH, Ajay , SHIMAZU, Ken-Ichi , PAPPAS, S., Peter , HALLMAN, Robert , SAVARIAR-HAUCK, Celin, M. , TIMPE, Hans-Joachim
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/0045 , G03F7/038 , Y10S430/127
摘要： Radiation-sensitive compositions, printing plates containing such compositions, imageable by infrared and ultraviolet/visible radiation and imaging method using same. The compositions comprise a thermal-activated acid generator; a cross-linking resin; a binder resin comprising a polymer containing reactive pendant groups selected from hydroxy, carboxylic acid, sulfonamide, and alkoxymethylamides; an infrared absorber; and optionally a UV/visible radiation-activated acid generator for UV/visible sensitization.
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18.发明授权
公开(公告)号：EP1543046B1
公开(公告)日：2006-05-10
申请号：EP03790933.0
申请日：2003-08-28
CPC分类号： C08F8/14 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , C08F8/28 , C08F8/46 , C08L59/00 , C08L61/00 , C08F16/06 , C08F216/38 , C08L2666/16
摘要： Heat-sensitive element comprising (a) an optionally pre-treated substrate (b) a positive working heat-sensitive coating comprising (i) at least one novolak resin, (ii) at least one component which reduces the aqueous alkaline developer solubility of novolak, wherein said reduction in solubility is reversed upon the application of heat, and (iii) at least one acidic polyvinyl acetal comprising the structural units (A), (B), (C) (A) (B) (C) and (D) wherein (D) is at least one unit selected from (D-1), (D-2), and (D-3): (D-1) (D-2) (D-3) wherein R1 is a hydrogen atom or a C1-C4 alkyl group, R2 is a hydrogen atom or a C1-C18 alkyl group, R3 is a hydrogen atom or a C1-C4 alkyl group, R4 is a hydrogen atom or a C1-C4 alkyl group, R5 is -COOH, -(CH2)a-COOH, -O-(CH2)a-COOH, -SO3H, -PO3H2 or -PO4H2, a is an integer from 1 to 8, and X is selected from -(CR6R7)n- and -CR8=CR9- wherein n is an integer of 1 to 6, each R6 and R7 is independently selected from a hydrogen atom and C1-C6 alkyl group, and R8 and R9 are independently selected from a hydrogen atom and a C1- C6 alkyl group or R8 and R9 together with the two carbon atoms to which they are bonded, form an optionally substituted aryl or heteroaryl group, wherein components (i) and (ii) do not have to be present as separate substances but may be used in the form of an appropriately functionalized novolak.
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公开(公告)号：EP1011970B1
公开(公告)日：2006-02-08
申请号：EP99928429.2
申请日：1999-06-08
发明人： SHIMAZU, Ken-Ichi , PATEL, Jayanti , SARAIYA, Shashikant , MERCHANT, Nishith , SAVARIAR-HAUCK, Celin , TIMPE, Hans-Joachim , McCULLOUGH, Christopher, D.
IPC分类号： B41C1/10
CPC分类号： B41M5/42 , B41C1/1016 , B41C2201/04 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/24 , B41C2210/26 , B41C2210/262 , B41C2210/264 , B41C2210/266 , B41M5/368 , B41M5/44 , B41M5/465
摘要： A thermal lithographic printing plate, which can be imaged by thermal energy typically by imagewise exposure with an infrared emitting laser, a thermal printing head, etc., is made up of a hydrophilic substrate, and a composite layer structure composed of two layer coatings. Preferably, the first layer of the composite is composed of an aqueous developable polymer mixture containing a photothermal conversion material which is contiguous to the hydrophilic substrate. The second layer of the composite is composed of one or more non-aqueous soluble polymers which are soluble or dispersible in a solvent which does not dissolve the first layer. The plate is exposed with an infrared laser or a thermal print head, and upon aqueous development of the imaged plate, the exposed portions are removed exposing hydrophilic substrate surfaces receptive to conventional aqueous fountain solutions. The unexposed portions contain the ink-receptive image areas. The second layer may also contain a photothermal conversion material. Alternatively, the composite layer may be free of photothermal conversion material when thermal imaging is carried out using a thermal printing head.
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20.发明公开HETERO-SUBSTITUTED ARYL ACETIC ACID CO-INITIATORS FOR IR-SENSITIVE COMPOSITIONS 有权异质取代arylacetic CO引发的红外敏感组合
公开(公告)号：EP1556227A1
公开(公告)日：2005-07-27
申请号：EP03779238.9
申请日：2003-10-23
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24
摘要： An IR-sensitive composition comprising, in addition to a polymeric binder, a free radical polymerizable system consisting of at least one member selected from unsaturated free radical polymerizable monomers, oligomers which are free radical polymerizable, and polymers containing C=C bonds in the back bone and/or in the side chain groups and an initiator system, wherein the initiator system comprises the following components: (a) at leat one material capable of absorbing IR radiation, (b) at least one compound capable of producing radicals and (c) at least one hereto-substituted arylacetic acid co-initiator compound indicated by the following general structures: where X is either nitrogen, oxygen or sulfur, Ar is any substituted or unsubstituted aryl ring and R is any substituent.
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