公开(公告)号：EP0289742A3

公开(公告)日：1990-03-07

申请号：EP88103810.3

申请日：1988-03-10

申请人： SIEMENS AKTIENGESELLSCHAFT

发明人： Harm, Bruno, Dr.

IPC分类号： G01N23/207

CPC分类号： G01N23/20008 ,  G01N2223/056 ,  G01N2223/1016 ,  G01N2223/316 ,  G01N2223/32

摘要： Vor dem mit dem äußeren Goniometerkreis (4) präzise verstell­baren Detektor (5) wird eine Diagonalschlitzblende (10) ange­ordnet und durch horizontales Verstellen des äußeren Gonio­meterkreises das Maximum des Detektorausgangssignals aufge­sucht. Aus der Winkelabweichung läßt sich trigonometrisch die Höhenabweichung des Strahles zur Sollhöhe (h) bestimmen und die Lochblende (9) entsprechend verstellen. Die Erfindung wird angewandt zur Einstellung der Lochblenden bei Diffraktometern.

公开(公告)号：EP3364175A1

公开(公告)日：2018-08-22

申请号：EP18154343.0

申请日：2018-01-31

申请人： Kobelco Research Institute, Inc.

发明人： INOUE, Kenichi ,  YAMASAKI, Hiroyasu ,  INABA, Masayuki

IPC分类号： G01N23/20008

CPC分类号： G01N23/2076 ,  G01N23/20008 ,  G01N2223/056 ,  G01N2223/316 ,  G21K1/02 ,  G21K1/06

摘要： An inspection apparatus 20 is for an inspection of a target region 13 including a part of a subsurface portion 12 of a sample 10 having an approximately circular cross section. The inspection apparatus 20 includes an X-ray source 40 that emits X-rays, a crystal plate 70 being a single crystal, and a detector 80. The crystal plate 70 is disposed to reflect and diffract X-rays (refractive X-rays X5) having been emitted by the X-ray source 40 and refracted in the target region 13. The crystal plate 70 is disposed to allow X-rays (rectilinear X-rays X3) having been emitted by the X-ray source 40 and entering the crystal plate 70 without having been incident on the sample 10 to transmit through the crystal plate 70. The detector 80 detects an intensity of the X-rays (reflected and diffracted X-rays X7) reflected and diffracted by the crystal plate 70.

公开(公告)号：EP3124961A1

公开(公告)日：2017-02-01

申请号：EP15767729.5

申请日：2015-02-02

申请人： Rigaku Corporation

发明人： OMOTE Kazuhiko ,  ITO Kazuki

IPC分类号： G01N23/201 ,  G21K1/06

CPC分类号： G01N23/201 ,  G01N2223/054 ,  G01N2223/056 ,  G01N2223/315 ,  G21K1/06 ,  G21K1/10

摘要： A micro beam generation unit capable of simultaneously capturing anisotropic images in a high signal-to-background ratio with a compact configuration and an X-ray small-angle scattering apparatus are provided. A micro beam generation unit 110 generates X-rays having a micro spot size, with which a sample is irradiated, in order to detect diffracted X-rays by a one-dimensional detector or a two-dimensional detector. The micro beam generation unit 110 includes a slit 115 that is provided on an X-ray optical path and reshapes X-rays into parallel beams, and two channel-cut monochromator crystals 117 and 118 that are arranged in arrangement of (+, -, -, +) and remove parasitic scattering of parallel beams reshaped by the slit. Accordingly, it is possible to simultaneously obtain anisotropic images in a high signal-to-background ratio with a compact configuration.

摘要翻译： 提供了能够以紧凑型配置和X射线小角度散射装置同时捕获高信号到背景比的各向异性图像的微光束产生单元。 为了通过一维检测器或二维检测器检测衍射X射线，微光束产生单元110产生具有照射样本的微点尺寸的X射线。 微光束产生单元110包括设置在X射线光路上并将X射线成为平行光束的狭缝115，以及排列成（+， - ， - ）的两个通道切割单色仪晶体117和118， - ，+），并消除由狭缝重新形成的平行光束的寄生散射。 因此，可以以紧凑的结构同时获得高信号到背景比的各向异性图像。

公开(公告)号：EP2778666A3

公开(公告)日：2014-12-03

申请号：EP14160214.4

申请日：2014-03-17

申请人： Proto Manufacturing Ltd.

发明人： Brass, E. Michael

IPC分类号： G01N23/207

CPC分类号： G21K1/06 ,  G01N23/20008 ,  G01N23/207 ,  G01N2223/056

摘要： An x-ray diffraction apparatus is provided having an x-ray diffraction head, a frame for supporting the x-ray diffraction head, and a pair of drive mechanisms of the frame configured to generate pivotal movement of the x-ray diffraction head about first and second orthogonal axes. The frame is configured such that operation of one of the drive mechanisms to rotate the x-ray diffraction head about the first axis generates rotation of both of the drive mechanisms about the first axis.

公开(公告)号：EP2584347B1

公开(公告)日：2014-04-02

申请号：EP11185746.2

申请日：2011-10-19

申请人： Deutsches Elektronen-Synchrotron DESY

发明人： Chapman, Henry N.

IPC分类号： G01N23/20

CPC分类号： G01N23/20008 ,  G01N2223/053 ,  G01N2223/056 ,  G01N2223/30

公开(公告)号：EP2694953A1

公开(公告)日：2014-02-12

申请号：EP12717425.8

申请日：2012-04-02

申请人： Universite de Rouen

发明人： COQUEREL, Gérard ,  SANSELME, Morgane ,  LAFONTAINE, Anaïs

IPC分类号： G01N23/20 ,  G01N23/207

CPC分类号： G01N23/203 ,  G01N23/20 ,  G01N23/20033 ,  G01N23/207 ,  G01N2223/056 ,  G01N2223/1016 ,  G01N2223/602 ,  G01N2223/639

摘要： Method of measuring scattering of X-rays, characterized in that a compound to be analyzed is installed in a receptacle (1) comprising a flat bottom permeable to X-rays, in that an analysis by scattering of the X-rays is carried out by sending a stream of X-rays upwards in the direction of said bottom permeable to the X-rays and by measuring the stream of scattered X-rays that is reflected downwards, and in that a thermostatically controlled fluid at the same temperature as that of the compound to be analyzed in the receptacle is projected towards the flat bottom (3) permeable to X-rays, from outside the receptacle (1), and device for measuring scattering of X-rays characterized in that it comprises a receptacle (1) comprising a bottom shut off by a membrane (3) transparent to X-rays, as well as a diffractometer whose goniometer (4, 5) is installed so as to direct a beam of X-rays from below towards the membrane (3) transparent to X-rays and the detector (5) being installed for the measurement of the X-rays scattered therebelow.

摘要翻译： 本发明涉及一种用于测量X射线散射的方法和装置，其中待分析的化合物被安装在包括X射线透过的平底的容器中，其中X射线衍射分析是通过发送 X射线向上朝向所述X射线透射底部并通过测量向下反射的散射X射线流，并且其中恒定地控制到与在容器中分析的化合物相同的温度的流体被投射向 X射线透过的平底，从容器外面。

公开(公告)号：EP1668356B1

公开(公告)日：2009-06-17

申请号：EP04765420.7

申请日：2004-09-20

申请人： Proteros Biostructures GmbH

发明人： NEUEFEIND, Torsten ,  BRANDSTETTER, Hans

IPC分类号： G01N33/483 ,  C30B31/04 ,  C30B29/58

CPC分类号： C30B29/58 ,  C30B7/00 ,  G01N2223/056 ,  G01N2223/612

摘要： The invention relates to a method for controlling the treatment of a crystal (2) by means of a liquid, wherein an image signal is captured by an image capturing system (200), said image signal representing a momentary image of a crystal having drops poured thereon by an electrically controllable microdosing system (11, 300), said image signal having a liquid environment whereby the image signal is treated and the momentary surface of the crystal and the liquid environment thereof is determined in the entire image by the image signal; the momentary surface is compared to a predefined desired value and a corrector drop control signal is determined and sent to the microdosing system if the surface is different from the desired value and the corrector drop signal is formed in such a manner that it represents a corrected frequency and/or variable and/or form of the drops which are to be applied to the crystal and the liquid environment thereof, which are selected such that the difference with respect to the desired value is minimised.

公开(公告)号：EP1668356A1

公开(公告)日：2006-06-14

申请号：EP04765420.7

申请日：2004-09-20

申请人： Proteros Biostructures GmbH

发明人： NEUEFEIND, Torsten ,  BRANDSTETTER, Hans

IPC分类号： G01N33/483 ,  C30B31/04 ,  C30B29/58

CPC分类号： C30B29/58 ,  C30B7/00 ,  G01N2223/056 ,  G01N2223/612

摘要： The invention relates to a method for controlling the treatment of a crystal (2) by means of a liquid, wherein an image signal is captured by an image capturing system (200), said image signal representing a momentary image of a crystal having drops poured thereon by an electrically controllable microdosing system (11, 300), said image signal having a liquid environment whereby the image signal is treated and the momentary surface of the crystal and the liquid environment thereof is determined in the entire image by the image signal; the momentary surface is compared to a predefined desired value and a corrector drop control signal is determined and sent to the microdosing system if the surface is different from the desired value and the corrector drop signal is formed in such a manner that it represents a corrected frequency and/or variable and/or form of the drops which are to be applied to the crystal and the liquid environment thereof, which are selected such that the difference with respect to the desired value is minimised.

公开(公告)号：EP0512620A2

公开(公告)日：1992-11-11

申请号：EP92201211.7

申请日：1992-05-04

申请人： Philips Electronics N.V.

发明人： Timmers, Jacob ,  Delhez, Robbert ,  Tuinstra, Fokke

IPC分类号： G01N23/207 ,  G01J3/02 ,  G21K1/04

CPC分类号： G01N23/20008 ,  G01J3/02 ,  G01J3/0237 ,  G01J3/0289 ,  G01N23/207 ,  G01N2223/056 ,  G01N2223/1016 ,  G01N2223/102 ,  G01N2223/305 ,  G01N2223/306 ,  G01N2223/316

摘要： An X-ray analysis apparatus comprises a central control device which includes means for recording simulated beam paths in the apparatus, thus enabling correction for the effects of radiation-optical deviations as well as of other deviations in the apparatus or a specimen on detection signals. Such a correction facility allows for construction of an apparatus having a large number of freedoms and hence a universal application.

摘要翻译： X射线分析装置包括中央控制装置，其包括用于在装置中记录模拟光束路径的装置，从而能够校正放射 - 光学偏差的影响以及装置或样本中检测信号上的其它偏差。 这种校正装置允许构造具有大量自由度的装置，因此可以通用。

公开(公告)号：EP0289742A2

公开(公告)日：1988-11-09

申请号：EP88103810.3

申请日：1988-03-10

申请人： SIEMENS AKTIENGESELLSCHAFT

发明人： Harm, Bruno, Dr.

IPC分类号： G01N23/207

CPC分类号： G01N23/20008 ,  G01N2223/056 ,  G01N2223/1016 ,  G01N2223/316 ,  G01N2223/32

摘要： Vor dem mit dem äußeren Goniometerkreis (4) präzise verstell­baren Detektor (5) wird eine Diagonalschlitzblende (10) ange­ordnet und durch horizontales Verstellen des äußeren Gonio­meterkreises das Maximum des Detektorausgangssignals aufge­sucht. Aus der Winkelabweichung läßt sich trigonometrisch die Höhenabweichung des Strahles zur Sollhöhe (h) bestimmen und die Lochblende (9) entsprechend verstellen.
Die Erfindung wird angewandt zur Einstellung der Lochblenden bei Diffraktometern.

摘要翻译： 在检测器（5）的前面布置有斜槽隔膜（10），其可以用外测角器圆（4）精确调节，并且通过水平调节外测角器圈来定位检测器输出信号的最大值。 光线高度与指定高度（h）的偏差可以从角度偏差中进行三角测量，可以相应调整光圈（9）。 本发明用于调节衍射仪中的孔径。