公开(公告)号：EP2686386A4

公开(公告)日：2015-01-21

申请号：EP12757392

申请日：2012-03-15

Applicant: BASF CORP

Inventor： SIOSS JAMES ,  CHIRAYIL THOMAS ,  AUCAR BETTY

IPC: C09C1/00 ,  A61K8/02 ,  A61K8/19 ,  A61Q1/08 ,  A61Q1/10 ,  A61Q3/02 ,  A61Q5/02 ,  A61Q17/04 ,  A61Q19/00 ,  A61Q19/04 ,  C03C17/34 ,  C09C1/24 ,  C09D5/03 ,  C09D5/36 ,  C09D7/12 ,  C09D11/037

CPC classification number: C03C17/3417 ,  A61K8/0241 ,  A61K8/19 ,  A61K2800/10 ,  A61K2800/63 ,  A61Q1/08 ,  A61Q1/10 ,  A61Q3/02 ,  A61Q5/02 ,  A61Q17/04 ,  A61Q19/00 ,  A61Q19/04 ,  C01P2004/03 ,  C01P2004/51 ,  C01P2004/61 ,  C01P2004/62 ,  C09C1/0024 ,  C09C2200/1033 ,  C09C2200/1087 ,  C09D5/032 ,  C09D5/035 ,  C09D5/36 ,  C09D7/62 ,  C09D11/037

Abstract: This disclosure is directed to a black effect pigment and a method of forming said pigment. The pigment comprises a platy substrate coated with SnO2 and/or SnO2 hydrates and Fe3O4 with an optional coating of metal oxides such as SiO2, TiO2, ZrO2 and ZnO2. The deposition of the SnO2 and/or SnO2 hydrates onto the substrate improves the adhesion and prepares the substrate surface for deposition of the iron oxides onto the platy surface, especially mica surfaces. While the pigment may be used in such applications as coating, powder coating, printing ink, plastic, ceramic material, glass, cosmetic formulation, laser marking pigment, pigment composition or dry preparation, the pigment is especially suitable for cosmetic applications.

公开(公告)号：EP2817433A1

公开(公告)日：2014-12-31

申请号：EP13705247.8

申请日：2013-02-18

Applicant: Pilkington Group Limited

Inventor： NELSON, Douglas Martin ,  RADTKE, Michael Martin ,  PHILLIPS, Steven Edward

IPC: C23C16/40

CPC classification number: C23C16/455 ,  C03C17/001 ,  C03C17/245 ,  C03C17/3417 ,  C03C2217/213 ,  C03C2217/241 ,  C03C2218/1525 ,  C23C16/401 ,  C23C16/42

Abstract: A CVD process for depositing a silica coating is provided. The process includes providing a glass substrate. The process also includes forming a gaseous mixture including a silane compound, oxygen, a fluorine - containing compound, and a radical scavenger such as ethylene or propylene. The gaseous mixture is directed toward and along the glass substrate and is reacted over the glass substrate to form the silica coating thereon.

Abstract translation: 提供了沉积二氧化硅涂层的CVD工艺。 该方法包括提供玻璃基底。 该方法还包括形成包含硅烷化合物，氧，含氟化合物和自由基清除剂如乙烯或丙烯的气体混合物。 气体混合物被引向玻璃基底并沿着玻璃基底并且在玻璃基底上反应以在其上形成二氧化硅涂层。

公开(公告)号：EP2814078A1

公开(公告)日：2014-12-17

申请号：EP13172085.6

申请日：2013-06-14

Applicant: Saint-Gobain Glass France

Inventor： Lecamp, Guillaume ,  Sauvinet, Vincent ,  Lee, Youngseong

IPC: H01L51/52

CPC classification number: H01L51/0096 ,  C03C3/066 ,  C03C8/16 ,  C03C17/007 ,  C03C17/3417 ,  C03C2205/00 ,  C03C2217/452 ,  C03C2217/475 ,  H01L51/5268 ,  H01L51/56 ,  H01L2251/305 ,  H01L2251/558 ,  Y02E10/549

Abstract: The invention is drawn to a transparent diffusive OLED substrate comprising the following successive elements or layers:
(a) a transparent flat substrate (1) made of mineral glass having a refractive index n 1 of between 1.48 and 1.58,
(b) a monolayer of mineral particles (3) attached to one side of the substrate (1) by means of a low index mineral binder (2) having a refractive index n 2 of between 1.45 and 1.61, and
(c) a high index layer (4) made of an enamel having a refractive index n 4 comprised between 1.82 and 2.10 covering the monolayer of mineral particles (3),

the mineral particles (3) having a refractive index n 3 comprised between n 2 +0.08 and n 4 -0.08 and protruding from the low index mineral binder (2) so as to be directly in contact with the high index layer (4), thereby forming a first diffusive interface (Di 1 ) between the mineral particles (3) and the low index binder (2), and a second diffusive interface (Di 2 ) between the mineral particles (3) and the high index layer (4).

Abstract translation: 本发明涉及包含以下连续元素或层的透明扩散OLED基底：（a）由折射率n1为1.48-1.58的无机玻璃制成的透明平坦基底（1），（b）单层矿物 通过折射率n2在1.45和1.61之间的低折射率矿物粘合剂（2）附着在基底（1）的一侧上的颗粒（3），和（c）高折射率层（4） 具有覆盖单层矿物颗粒（3）的折射率n4为1.82-2.10的釉质，矿物颗粒（3）的折射率n3介于n2 + 0.08和n4-0.08之间，并从低折射率矿物粘合剂 2）以与所述高折射率层（4）直接接触，从而在所述矿物颗粒（3）和所述低折射率粘合剂（2）之间形成第一扩散界面（Di1），并且第二扩散界面（Di2 ）在矿物颗粒（3）和高折射率层（4）之间。

公开(公告)号：EP2809821A1

公开(公告)日：2014-12-10

申请号：EP13705309.6

申请日：2013-01-31

Applicant: Tru Vue, Inc.

Inventor： DECOUX, James ,  GAVE, Roger

IPC: C23C14/00 ,  C23C14/54 ,  C23C14/08 ,  C23C14/58 ,  C03C17/00 ,  C03C17/34 ,  G02B1/10

CPC classification number: C23C14/34 ,  C03C17/3417 ,  C03C2217/94 ,  C03C2217/944 ,  C03C2217/948 ,  C23C14/0036 ,  C23C14/086 ,  C23C14/54 ,  C23C14/58 ,  G02B1/105 ,  G02B1/14 ,  Y10T428/26

Abstract: An antistatic article (102, 106) including a substrate (112) having a first surface, a sputtered conductive layer (114) arranged on the first surface (120) and having a thickness ranging from approximately 0.5 nanometers to approximately 10 nanometers, and an outer layer (116) or a series of layers (117) arranged atop the sputtered conductive layer, wherein, the antistatic article exhibits a surface resistivity of less than approximately 10
12 ohms/square. A method of making an antistatic article includes pretreating a surface of the substrate, sputtering the conductive layer onto the surface to a thickness ranging from approximately 0.5 nanometers to approximately 10 nanometers, and sputtering the outer layer and one or more additional layers atop the conductive layer, wherein, the antistatic article exhibits a surface resistivity of less than approximately 10
12 ohms/square.

Abstract translation: 一种防静电制品，包括具有第一表面的基底，布置在第一表面上的具有约0.5纳米至约10纳米厚度的溅射导电层，以及布置在溅射导电层顶部的外层或一系列层， 其中抗静电制品表现出小于约1012欧姆/平方的表面电阻率。 制造抗静电制品的方法包括预处理基材的表面，将导电层溅射到表面上至约0.5纳米至约10纳米的厚度，并且溅射外层和在导电层顶上的一个或多个附加层 ，其中抗静电制品表现出小于约1012欧姆/平方的表面电阻率。

公开(公告)号：EP2693839A4

公开(公告)日：2014-11-26

申请号：EP12763529

申请日：2012-03-30

Applicant: ASAHI GLASS CO LTD ,  AGC GLASS EUROPE

Inventor： TANIDA MASAMICHI ,  NAKAMURA NOBUHIRO ,  WADA NAOYA ,  AOKI YUMIKO ,  DOMERCQ BENOIT

IPC: H05B33/02 ,  H01L51/52 ,  H05B33/10

CPC classification number: H01L51/5268 ,  C03C3/074 ,  C03C8/04 ,  C03C8/16 ,  C03C17/008 ,  C03C17/3417 ,  C03C17/42 ,  C03C2217/452 ,  C03C2217/475 ,  C03C2217/477 ,  G02B5/0242 ,  G02B5/0278 ,  H01L51/0096

公开(公告)号：EP2804026A1

公开(公告)日：2014-11-19

申请号：EP13747312.0

申请日：2013-01-30

Applicant: Tokai Optical Co., Ltd.

Inventor： HIRASAWA Shinya ,  TAKAHASHI Yoshinori ,  KOZAKI Tetsuo ,  KATO Yuji

IPC: G02B1/11 ,  B32B9/00 ,  G02B1/10

CPC classification number: G02B1/116 ,  B32B9/00 ,  C03C17/3417 ,  C03C17/3452 ,  C03C17/42 ,  C03C2217/22 ,  C03C2217/231 ,  C03C2217/734 ,  C03C2217/948 ,  C23C16/30 ,  C23C16/402 ,  C23C16/405 ,  C23C16/407 ,  C23C16/513 ,  G02B1/105 ,  G02B1/115 ,  G02B1/16 ,  G02B1/18 ,  Y10T428/24942 ,  Y10T428/24975 ,  Y10T428/265

Abstract: [Summary]
[Object] It is an object to provide a low-cost optical product having an antistatic function, easy to be designed, and having very good optical performance, and to provide a method for manufacturing the same.
[Solution] An optical product according to the present invention includes a transparent base material, and a multilayer film including a dielectric film and an ITO film. The multilayer film is formed on one face or two faces of the transparent base material. The physical thickness of the ITO film is not less than 3 nanometers and not greater than 7 nanometers. The ITO film can be formed by vapor deposition with plasma treatment.

Abstract translation: 发明内容本发明的目的是提供具有抗静电功能，易于设计和具有非常好的光学性能的低成本光学产品，并提供其制造方法。 [解决方案]根据本发明的光学产品包括透明基材和包括电介质膜和ITO膜的多层膜。 多层膜形成在透明基材的一面或两面上。 ITO膜的物理厚度不小于3纳米，不大于7纳米。 ITO膜可以通过等离子体处理的气相沉积形成。

公开(公告)号：EP1514852B1

公开(公告)日：2014-11-19

申请号：EP04021169.0

申请日：2004-09-07

Applicant: Schott AG

Inventor： Dzick, Jürgen Dr.

IPC: C03C17/34

CPC classification number: C03C17/3435 ,  C03C17/3417 ,  Y10T428/24942

公开(公告)号：EP2791072A2

公开(公告)日：2014-10-22

申请号：EP12812438.5

申请日：2012-12-07

Applicant: Dow Global Technologies LLC

Inventor： MALEK, Andrzej M. ,  BRYDEN, Todd R. ,  LEBARON, Peter C.

IPC: C03C17/245 ,  C03C17/34

CPC classification number: H01L31/02167 ,  C03C17/245 ,  C03C17/2453 ,  C03C17/3417 ,  C03C2217/216 ,  C03C2217/231 ,  C03C2217/243 ,  C03C2217/76 ,  C03C2217/944 ,  C03C2217/948 ,  C03C2218/156 ,  C03C2218/32 ,  Y02E10/50

Abstract: The present invention is a method comprising depositing a metal oxide layer as part of the production of an optoelectrically active device and exposing the metal oxide layer to a reactive agent to form a relatively hydrophobic surface. The invention also includes device so made, preferably a photovoltaic device, which shows improved stability as compared to devices not subject to the treatment.

公开(公告)号：EP2758350A1

公开(公告)日：2014-07-30

申请号：EP12772370.8

申请日：2012-09-13

Applicant: Pilkington Group Limited

Inventor： NELSON, Douglas Martin

IPC: C03C17/00 ,  C03C17/245 ,  C03C17/34 ,  C23C16/02 ,  C23C16/40

CPC classification number: C03C17/245 ,  C03C17/002 ,  C03C17/3417 ,  C03C2217/213 ,  C03C2218/1525 ,  C23C16/402 ,  C23C16/45512 ,  C23C16/545

Abstract: A chemical vapor deposition process for the deposition of a silica layer on a glass substrate is provided. The process includes providing a glass substrate. The process also includes forming a gaseous precursor mixture comprising a silane compound, oxygen, water vapor, and a radical scavenger and directing the precursor mixture toward and along the glass substrate. The mixture reacts over the glass substrate to form a silica coating thereon.

公开(公告)号：EP2755927A1

公开(公告)日：2014-07-23

申请号：EP12773023.2

申请日：2012-09-12

Applicant: Saint-Gobain Glass France

Inventor： AGUIAR, Rosiana

IPC: C03C17/245 ,  C03C17/34 ,  B01J37/02 ,  B01J37/34 ,  B01J21/06 ,  C23C16/40 ,  C23C16/453 ,  C23C16/46

CPC classification number: H01G9/2031 ,  B01J21/063 ,  B01J37/0238 ,  B01J37/0244 ,  B01J37/349 ,  C03C17/3417 ,  C03C2217/71 ,  C03C2217/77 ,  C03C2218/1525 ,  C23C16/0272 ,  C23C16/405

Abstract: The subject matter of the invention is a material comprising a glass or vitroceramic sheet, of which at least part of one of the faces is furnished with a photocatalytic coating with titanium oxide base deposited on a silica-based substrate that is deposited by combustion chemical vapour deposition, having roughness Ra of between 4 and 30 nm including the limits thereof.