Manufacturing method for producing silicon carbide crystal using source gases and apparatus for the same
    31.
    发明授权
    Manufacturing method for producing silicon carbide crystal using source gases and apparatus for the same 有权
    为生产使用的源气体的碳化硅晶体的方法和装置

    公开(公告)号:EP1205584B1

    公开(公告)日:2004-09-29

    申请号:EP01126620.2

    申请日:2001-11-07

    申请人: Denso Corporation

    IPC分类号: C30B25/00 C30B29/36

    摘要: A crucible 30 has first member 31 and second cylindrical body 36, and is disposed in a lower chamber 2. The fist member 31 is disposed in the second cylindrical body 36 so as to define a gas flow path formed therebetween as a gap. A pedestal 33 is disposed inside the first member 31. A seed crystal 34 is fixed to the pedestal 33. SiC single crystals are formed on the pedestal 33 by introducing a mixture gas through an inlet conduit 50. During growth of the SiC single crystals, conductance in introduction of the mixture gas into the crucible 30 is larger than that in exhaust of the mixture gas, so that pressure of the mixture gas in the crucible 30 is larger than that of the mixture gas after exhausted from the crucible 30.

    PRODUCTION OF BULK SINGLE CRYSTALS OF SILICON CARBIDE
    36.
    发明公开
    PRODUCTION OF BULK SINGLE CRYSTALS OF SILICON CARBIDE 有权
    PROCESS FOR SILICON CARBIDE块状单晶的制备

    公开(公告)号:EP1129238A2

    公开(公告)日:2001-09-05

    申请号:EP99954808.4

    申请日:1999-10-08

    申请人: CREE, INC.

    IPC分类号: C30B1/00

    CPC分类号: C30B23/00 C30B25/00 C30B29/36

    摘要: Bulk, low impurity silicon carbide single crystals are grown by deposition of vapor species containing silicon and vapor species containing carbon on a crystal growth interface. The silicon source vapor is provided by vaporizing liquid silicon and transporting the silicon vapor to a crystal growth crucible. The carbon vapor species are provided by either a carbon containing source gas (for example, CN) or by flowing the silicon source vapor over or through a solid carbon source, for example flowing the silicon vapor through porous graphite or a bed of graphite particles.

    A method for the heat-treatment of ZnSe crystal
    38.
    发明授权
    A method for the heat-treatment of ZnSe crystal 失效
    ZnSe晶体的热处理的方法

    公开(公告)号:EP0826800B1

    公开(公告)日:2001-07-04

    申请号:EP97306116.1

    申请日:1997-08-12

    IPC分类号: C30B33/00 C30B29/48 C30B25/00

    摘要: An object of the present invention is to provide a method for the heat-treatment of ZnSe crystal whereby a deterioration in crystallinity can be prevented and a crystal having a low resistivity, without the occurrence of precipitates, can be produced. The feature of the present invention comprises a method for the heat-treatment of a ZnSe crystal comprising subjecting a ZnSe crystal grown by a chemical vapor transport method, using iodine as a transport agent, to a heat-treatment in a Zn vapor atmosphere and controlling the cooling rate after the heat-treatment to in the range of from 10 to 200 DEG C/min.