GAAS/AL(GA)AS DISTRIBUTED BRAGG REFLECTOR ON INP
    33.
    发明公开
    GAAS/AL(GA)AS DISTRIBUTED BRAGG REFLECTOR ON INP 审中-公开
    GAAS / AL(GA)AS分布式布拉格反射器ON INP

    公开(公告)号:EP1479141A2

    公开(公告)日:2004-11-24

    申请号:EP03713605.8

    申请日:2003-02-21

    发明人: KWON, Ho-Ki

    IPC分类号: H01S5/183

    摘要: A vertical cavity surface emitting laser having a GaAs/AI(Ga)As DBR mirror over an InP layer. A first GaAs layer (126) is MOCVD grown on an InP layer (124) at a growth temperature of between 400 and 450 °C. Then, a second GaAs layer (128) is grown by MOCVD at a growth temperature of about 600 °C over the first GaAs layer (126). A GaAs/AI(Ga)As DBR mirror (132) is then grown over the second GaAs layer. Beneficially, an insulating layer (130) is disposed between the second GaAs layer (128) and the GaAs/AI(Ga)As DBR mirror (132). The insulating layer includes an opening (131) that exposes the second GaAs layer (128). Then, the GaAs/AI(Ga)As DBR mirror (132) is grown by lateral epitaxial overgrowth. The lower DBR (116) can be comprised of a material that provides an acceptable lattice match with InP layers. A tunnel junction can be formed over an InP active region.

    GAIN GUIDE IMPLANT IN OXIDE VERTICAL CAVITY SURFACE EMITTING LASER
    34.
    发明公开
    GAIN GUIDE IMPLANT IN OXIDE VERTICAL CAVITY SURFACE EMITTING LASER 审中-公开
    GAIN引导种植体OXIDIERTEN-面发射激光器具有垂直谐振器

    公开(公告)号:EP1459416A2

    公开(公告)日:2004-09-22

    申请号:EP02787002.1

    申请日:2002-12-11

    IPC分类号: H01S5/183

    摘要: A vertical cavity surface emitting laser [100] with a current guide comprised of an ion (160) implant region and an oxide structure (140). The oxide structure (140) is beneficially formed first, then, a gain guide ion implant region (160) is formed in or below the oxide structure (140). The ion (160) implant region extends into an active region (22). The energy and dosage used when forming the ion (160) implant gain guide can be selected to control the lateral sheet resistance and the active region's (22) non-radiative recombination centers.

    Indium-phoshpide-based vertical-cavity surface-emitting laser
    36.
    发明公开
    Indium-phoshpide-based vertical-cavity surface-emitting laser 有权
    激光镭射激光共振器

    公开(公告)号:EP1294063A1

    公开(公告)日:2003-03-19

    申请号:EP01122286.6

    申请日:2001-09-18

    IPC分类号: H01S5/183

    CPC分类号: H01S5/18358 H01S5/1039

    摘要: A vertical-cavity surface-emitting laser (100) comprises one or more quantum well layers (107) and one or more barrier layers (108) to define a gain region (106), a first mirror means (103) and a second mirror means (102), wherein the first and second mirror means define a resonator. Moreover, the vertical-cavity surface-emitting laser further comprises a first indium phosphide layer (109) adjacent to the gain region (106) and a second indium phosphide layer (110) adjacent to the gain region (106) to define a laser cavity (112).

    摘要翻译: 垂直腔表面发射激光器(100)包括一个或多个量子阱层(107)和一个或多个势垒层(108)以限定增益区域(106),第一反射镜装置(103)和第二反射镜 装置(102),其中所述第一和第二反射镜装置限定谐振器。 此外,垂直腔表面发射激光器还包括与增益区域(106)相邻的第一铟磷化物层(109)和与增益区域(106)相邻的第二磷化铟层(110),以限定激光腔 (112)。

    VERTICAL OPTICAL CAVITIES PRODUCED WITH SELECTIVE AREA EPITAXY
    40.
    发明公开
    VERTICAL OPTICAL CAVITIES PRODUCED WITH SELECTIVE AREA EPITAXY 审中-公开
    MIT HILFE VON SELEKTIVER-ZONEN-EPITAXY HERGESTELLTE VERTIKALE OPTISCHE RESONATOREN

    公开(公告)号:EP1066667A4

    公开(公告)日:2001-04-11

    申请号:EP99908409

    申请日:1999-02-24

    申请人: BANDWIDTH 9

    摘要: A monolithic vertical optical cavity device (100) has a bottom Distributed Bragg Reflector (DBR), a quantum well (QW) region consisting of at least one active layer grown on top of the bottom DBR by using a Selective Area Epitaxy (SAE) mask such that the active layer or layers exhibit a variation in at least one physical parameter in a horizontal plane perpendicular to the vertical direction and a top DBR deposited on top of the QW region (70). The device has a variable Fabry-Perot distance (82) defined along the vertical direction between the bottom DBR (50) and the top DBR (76) and a variable physical parameter of the active layer.

    摘要翻译: 单片垂直光学腔设备(100)具有底部分布式布拉格反射器(DBR),量子阱(QW)区域,其由通过使用选择性面积外延(SAE)掩模在底部DBR的顶部上生长的至少一个有源层组成 使得一个或多个有源层在垂直于垂直方向的水平面中的至少一个物理参数和沉积在QW区域(70)顶部上的顶部DBR中呈现变化。 该装置具有沿底部DBR(50)和顶部DBR(76)之间的垂直方向定义的可变法布里 - 珀罗距离(82)和活性层的可变物理参数。