公开(公告)号：EP4228897A1

公开(公告)日：2023-08-23

申请号：EP21799369.0

申请日：2021-09-01

申请人： Cabot Corporation

发明人： ZHANG, Xiaofeng ,  ZHANG, Han ,  SULLIVAN, Sean S. ,  CHEN, Limeng ,  SANCHEZ GARCIA, Angelica M. ,  KYRLIDIS, Agathagelos ,  SHAH, Tushar ,  KUTSOVSKY, Yakov E. ,  FITZPATRICK, Darragh ,  HERSEE, Rachel ,  WALTER, Pablo

IPC分类号： B33Y70/00 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027

公开(公告)号：EP4219631A1

公开(公告)日：2023-08-02

申请号：EP21872486.2

申请日：2021-09-22

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED ,  Dongwoo Fine-Chem Co., Ltd. ,  Sumika Technology Co., Ltd.

发明人： MANABE, Hitomi ,  TAKAISHI, Yu ,  TSUJIUCHI, Sho ,  TOGAI, Manabu

IPC分类号： C09B35/025 ,  C08F220/06 ,  C08F220/32 ,  C08F222/40 ,  G03F7/004 ,  G02B5/20 ,  C09B67/20

摘要： The present invention addresses the problem of providing a colored composition capable of forming a color filter having excellent UV ashing resistance. This problem is solved by a colored composition comprising an alkali soluble resin and a colorant containing a compound represented by formula (I):

        A-L 1 -B     (I)

wherein L 1 represents a group represented by formula (ph1), A represents a group represented by formula (ia), and B represents a group represented by formula (ib).

公开(公告)号：EP3605160B1

公开(公告)日：2023-08-02

申请号：EP18774199.6

申请日：2018-03-29

发明人： CHUKO, Tomotaka ,  HIKI, Kenji ,  DOI, Ryuji ,  KITAZAWA, Kazushige ,  OKAMOTO, Shinichi ,  HIROTA, Tetsuya ,  MAEDA, Tadatoshi ,  CHINONE, Hiroyuki

IPC分类号： G02B5/20 ,  C09B67/20 ,  C09B67/22 ,  G03F7/004 ,  G03F7/027 ,  G03F7/031

公开(公告)号：EP3565861B1

公开(公告)日：2023-06-21

申请号：EP17877057.4

申请日：2017-11-29

发明人： SITZMANN, Eugene V. ,  WOOD JR., Mervin G. ,  JONES JR., Charles E. ,  YU, Ziniu ,  HALL, Thomas N. ,  TAHIR, Zulfiqar A.

IPC分类号： C09D123/04 ,  G03F7/027 ,  C09D7/40 ,  G03F7/031 ,  G03F7/004 ,  B05D7/26 ,  C08F222/10 ,  C08K5/00 ,  C08K5/07 ,  C08K5/50 ,  C09D4/00

公开(公告)号：EP4188697A1

公开(公告)日：2023-06-07

申请号：EP21848847.6

申请日：2021-07-30

申请人： Digimarc Corporation ,  MacDermid Graphics Solutions, LLC

发明人： SPERRY, Jay Kelly ,  VEST, Ryan W.

IPC分类号： B32B7/03 ,  C08F299/02 ,  G03C5/08 ,  G03F7/004 ,  G03F7/26 ,  G06T7/30

公开(公告)号：EP3489026B1

公开(公告)日：2023-05-24

申请号：EP18210060.2

申请日：2015-02-03

发明人： Wariishi, Koji ,  Hayashi, Shunsuke ,  Shiraki, Fumiya ,  Ooshima, Atsushi

IPC分类号： B41N1/14 ,  B41C1/10 ,  B41N3/00 ,  B41N3/08 ,  G03F7/00 ,  G03F7/004 ,  G03F7/11

公开(公告)号：EP3632696B1

公开(公告)日：2023-04-26

申请号：EP18809362.9

申请日：2018-05-08

发明人： HIRANO,Shuji ,  NOZAKI, Atsuyasu

IPC分类号： B41C1/10 ,  C08F2/44 ,  C08F212/34 ,  C08F220/00 ,  C08F222/00 ,  C08F246/00 ,  C08F290/06 ,  G03F7/00 ,  G03F7/004 ,  G03F7/038

公开(公告)号：EP4166537A1

公开(公告)日：2023-04-19

申请号：EP21822341.0

申请日：2021-05-19

申请人： FUJIFILM Corporation

发明人： KOJIMA Masafumi ,  TAKADA Akira ,  GOTO Akiyoshi ,  KAWABATA Takeshi ,  USHIYAMA Aina

IPC分类号： C07C309/07 ,  C07C309/17 ,  C07C309/65 ,  C07C311/09 ,  C07C311/48 ,  C07C311/53 ,  C07C381/12 ,  C07D207/48 ,  C07D211/96 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20

摘要： A first object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having a good shape can be obtained. Furthermore, a second object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. In addition, a third object of the present invention is to provide a compound which can be suitably used in the actinic ray-sensitive or radiation-sensitive resin composition.
The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound that generates an acid upon irradiation with actinic rays or radiation, an acid-decomposable resin having a weight-average molecular weight of 30,000 or less, and a solvent, and the compound that generates an acid upon irradiation with actinic rays or radiation includes a compound (I).

公开(公告)号：EP4162323A1

公开(公告)日：2023-04-12

申请号：EP21728204.5

申请日：2021-05-21

申请人： Joanneum Research Forschungsgesellschaft mbH ,  Allnex Belgium, S.A.

发明人： NEES, Dieter ,  GÖTZ, Johannes ,  RUTTLOFF, Stephan ,  BONTINCK, Dirk

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/027

公开(公告)号：EP4159458A1

公开(公告)日：2023-04-05

申请号：EP21813150.6

申请日：2021-05-21

申请人： FUJIFILM Corporation

发明人： ENOMOTO, Kazuaki ,  YAMAMOTO, Akira ,  NAMBA, Yusuke ,  NOGOSHI, Keisuke

IPC分类号： B41N1/14 ,  B41C1/10 ,  B41M1/06 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/029 ,  G03F7/033 ,  G03F7/09 ,  G03F7/11

摘要： Provided is an on-press development type lithographic printing plate precursor having a support, an image-recording layer, and an outermost layer in this order, in which the image-recording layer contains an infrared absorber, an electron-accepting polymerization initiator, and a polymerizable compound, LUMO of the electron-accepting polymerization initiator - LUMO of the infrared absorber is 0.45 eV or more, and the outermost layer contains a discoloring compound. Also provided is a method of preparing a lithographic printing plate and a lithographic printing method in which the on-press development type lithographic printing plate precursor is used.