公开(公告)号：EP2106458A1

公开(公告)日：2009-10-07

申请号：EP07847343.6

申请日：2007-11-26

申请人： Leica Microsystems CMS GmbH ,  BANKMANN, Joachim

发明人： BANKMANN, Joachim ,  EISENKRÄMER, Frank

IPC分类号： C23C14/50 ,  C23C14/56

CPC分类号： C23C14/56 ,  C23C14/505

摘要： The invention relates to a coating installation (2000) comprising a coating chamber (2001) and at least one substrate holder (2002) that is arranged in a displaceable manner inside the coating chamber (2001) to accommodate substrates (2003) that are to be coated. The coating installation (2000) also comprises a radio device with at least one first radio (2004) that is connected to the substrate holder (2002), and a second radio (2005) that is disposed at least partially outside the coating chamber (2001). A radio link for transmitting information is at least temporally disposed between the first (2004) and the second radio (2005).

公开(公告)号：EP1419285A4

公开(公告)日：2009-08-19

申请号：EP02768666

申请日：2002-08-23

申请人： NANONEXUS INC

发明人： SMITH DONALD LEONARD

IPC分类号： C23C14/34 ,  C23C14/35 ,  C23C14/50 ,  C23C14/58 ,  B05C11/00 ,  B05C13/00 ,  B05D1/36

CPC分类号： C23C14/5833 ,  C23C14/352 ,  C23C14/505 ,  Y10T428/31

摘要： The invention provides a method and apparatus for producing uniform, isotropic stresses in a sputtered film. In the presently preferred embodiment, a new sputtering geometry and a new domain of transport speed are presented, which together allow the achievement of the maximum stress that the film material can hold while avoiding X-Y stress anisotropy and avoiding stress non-uniformity across the substrate.

公开(公告)号：EP2077797A2

公开(公告)日：2009-07-15

申请号：EP07814498.7

申请日：2007-08-28

申请人： Cornova, Inc.

发明人： RYAN, S., Eric ,  SAHAGIAN, Richard

IPC分类号： A61F2/06

CPC分类号： C23C14/025 ,  A61F2/82 ,  A61L31/088 ,  A61L31/18 ,  C23C14/027 ,  C23C14/165 ,  C23C14/505

摘要： Textured coatings for implantable medical devices can be provided in metallic or polymer surface layers having surface texture factors down to nanometer and sub-nanometer levels. Implantable devices having such textured surfaces and methods of coating such devices comprises providing a substrate surface of an implantable device and forming a coating layer of the substrate surface by directing a mixture of atoms of a first type of material and a second type of material toward the substrate surface while simultaneously and collinearly bombarding the substrate surface with ions, wherein the first type of material is substantially resistant to a removal process and the second type of material is substantially susceptible to a removal process.

公开(公告)号：EP2072632A1

公开(公告)日：2009-06-24

申请号：EP08253913.1

申请日：2008-12-08

申请人： Kojima Press Industry Co., Ltd.

发明人： Matsui, Hirotoshi ,  Ito, Kaoru

IPC分类号： C23C14/04 ,  C23C14/50 ,  C23C14/22

CPC分类号： C23C14/044 ,  C23C14/223 ,  C23C14/505 ,  Y10T428/24612

摘要： A sputtering apparatus (10) is provided which is capable of forming a coating film (6) made of a metallic film on a coating surface (4) of a substrate (3) by sputtering to have such a film thickness that gradually increases or gradually decreases from its one end side to the other end side. The apparatus comprising: at least one supporting means (38) supporting at least one substrate (3) such that a coating surface (4) thereof is opposed to an emission surface (24) of a sputtering target (22) at an angle; and at least one shielding member (3,66) for preventing part of sputtering particles emitted from the emission surface from reaching the coating surface, the at least one shielding member being disposed in the vacuum chamber so as to be positioned in a space (α) between the coating surface of the at least one substrate and the emission surface of the sputtering target.

摘要翻译： 提供一种溅射装置（10），其能够通过溅射在基板（3）的涂布表面（4）上形成由金属膜制成的涂膜（6），以使其具有逐渐增加或逐渐增加的膜厚 从其一端侧向另一端侧减小。 该装置包括：至少一个支撑装置（38），其支撑至少一个基板（3），使得其涂层表面（4）以一定角度与溅射靶（22）的发射表面（24）相对; 以及用于防止从所述发射表面发射的溅射颗粒的一部分到达所述涂层表面的至少一个屏蔽构件（3,66），所述至少一个屏蔽构件设置在所述真空室中以便被定位在空间（± ）在所述至少一个基板的涂覆表面和所述溅射靶的发射表面之间。

公开(公告)号：EP1630261A3

公开(公告)日：2008-12-10

申请号：EP05255095.1

申请日：2005-08-17

申请人： JDS Uniphase Corporation

发明人： Seddon, Richard I.

IPC分类号： C30B25/12 ,  C30B31/14 ,  C23C16/44 ,  C23C14/50 ,  C23C16/458 ,  H01F7/02 ,  H01L21/687

CPC分类号： C30B31/14 ,  C23C14/505 ,  C23C16/4584 ,  C30B25/12 ,  H01F7/0252 ,  H01F7/04 ,  H01J37/32715 ,  H01J37/34 ,  H01J37/3417 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/68785

摘要： The invention relates to a partially disposable substrate holder used in magnetic latches for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum chamber of a vapor deposition system, e.g. a chemical vapor deposition (CVD) system or a physical vapor deposition (PVD) system. The substrate holder includes a reusable base formed, at least partially, from a ferro-magnetic material, which is attracted to the magnetic latch, and a disposable cover formed from a relatively inexpensive, ferromagnetic, easily formable material, which encourages adherence of coating material and has a low vapor pressure at coating temperatures.

公开(公告)号：EP1630260A3

公开(公告)日：2008-11-05

申请号：EP05255001.9

申请日：2005-08-11

申请人： JDS Uniphase Inc.

发明人： Seddon, Richard I. ,  Tilsch, Markus K. ,  Hayes, Jeremy

IPC分类号： C30B25/12 ,  C30B31/14 ,  C23C16/44 ,  C23C14/50 ,  C23C16/458 ,  H01F7/02 ,  H01L21/687

CPC分类号： C30B31/14 ,  C23C14/505 ,  C23C16/4584 ,  C30B25/12 ,  H01F7/0252 ,  H01F7/04 ,  H01J37/32715 ,  H01J37/34 ,  H01J37/3417 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/68785

摘要： The invention relates to a magnetic latch for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum chamber of a vapor deposition system, e.g. a chemical vapor deposition (CVD) system or a physical vapor deposition (PVD) system. The magnetic latch includes a permanent magnetic, which is moveable between a latching position, in which the permanent magnet magnetizes the latch for attracting a substrate holder, and an unlatching position, in which the permanent magnet is connected in a bypass circuit, thereby demagnetizing the latch for releasing the substrate holder.

公开(公告)号：EP1696470A3

公开(公告)日：2008-09-10

申请号：EP06290313.3

申请日：2006-02-24

申请人： Canon Anelva Corporation

发明人： Wickramanayaka, Sunil

IPC分类号： C23C14/34 ,  C23C14/50 ,  H01L21/00 ,  H01L21/683 ,  H01L21/687

CPC分类号： H01L21/68735 ,  C23C14/04 ,  C23C14/225 ,  C23C14/50 ,  C23C14/505 ,  H01J37/3417 ,  H01L21/67103 ,  H01L21/67109

摘要： A wafer holder (15) including a wafer stage (1) and a wafer stage outer-ring (2) surrounding the wafer stage (1) wherein the wafer stage (1) has a diameter smaller than the diameter of a wafer (5) loaded on the wafer stage (1), the wafer stage outer-ring (2) has an inner diameter at the upper side of the outer-ring (2) which is larger than the diameter of the wafer (5) loaded on the wafer stage (1), and the upper surface of the outer-ring (2) lies above the upper surface of the wafer (5) loaded on the wafer stage (1).

公开(公告)号：EP1960566A2

公开(公告)日：2008-08-27

申请号：EP06850190.7

申请日：2006-11-22

申请人： SUPERCONDUCTOR TECHNOLOGIES INC.

发明人： RUBY, Ward ,  VON DESSONNECK, Kurt ,  MOECKLY, Brian

IPC分类号： C23C16/00

CPC分类号： C23C14/0021 ,  C23C14/24 ,  C23C14/505 ,  C23C14/541 ,  C23C14/546 ,  C23C14/566

摘要： A heater for growing a thin film on substrates contained on a substrate support member (110) includes a plurality of heater elements (101). The substrate support member (110) containing the substrates is at least partially surrounded by the plurality of heater elements (101). At least two of the plurality of heater elements are moveable with respect to one another so as to provide external access to the substrate support member. An oxygen pocket is formed in one of the heater elements or a separate oxygen pocket member (108) and is used for oxidation of the film on the substrates.

公开(公告)号：EP1507887B1

公开(公告)日：2008-07-09

申请号：EP03737973.2

申请日：2003-05-26

申请人： Schott AG

发明人： BEHLE, Stephan ,  LÜTTRINGHAUS-HENKEL, Andreas ,  ARNOLD, Gregor ,  BICKER, Matthias ,  WALTHER, Marten ,  Dr.Jürgen Klein

IPC分类号： C23C16/04 ,  C23C16/50 ,  B05D7/24 ,  C03C17/00

CPC分类号： C23C16/4409 ,  B05D1/62 ,  B08B7/00 ,  B08B9/426 ,  B29C49/421 ,  B29C2049/4221 ,  B29C2791/001 ,  B65D23/02 ,  B65G29/00 ,  B65G2201/0244 ,  C03C17/005 ,  C08J9/0004 ,  C08J2300/14 ,  C23C14/046 ,  C23C14/505 ,  C23C14/56 ,  C23C16/045 ,  C23C16/401 ,  C23C16/4412 ,  C23C16/455 ,  C23C16/458 ,  C23C16/50 ,  C23C16/511 ,  C23C16/54 ,  H01J37/32733

摘要： In order to simplify insertion and removal of work pieces (25, 27) in a reactor for plasma coating and to increase throughput, the invention provides for a coating device (1) comprising a reactor (18) with a movable sleeve part (19) and a base element (33), wherein at least one sealed coating chamber (15, 17) is defined between the sleeve part (19) and the base part (33) in side-by-side position, in addition to a device (2) for discharging electromagnetic energy in the at least one coating chamber (15, 17), wherein the reactor (18) has at least two coating stations (12, 14).

公开(公告)号：EP1835048A1

公开(公告)日：2007-09-19

申请号：EP07004978.8

申请日：2007-03-10

申请人： Carl Zeiss AG

发明人： Littek, Martin ,  Kurz, Norbert

IPC分类号： C23C14/50

CPC分类号： C23C14/505

摘要： Die Erfindung betrifft eine Vorrichtung (1) sowie ein Verfahren zum Halten sowie zum Drehen und/oder Wenden eines Gegenstands, insbesondere eines optischen Elements wie z.B. einer Linse (2), bei dessen Beschichtung in einer Vakuumbeschichtungsanlage. Die Vorrichtung umfasst einen individuellen Halter (3) mit dem der Gegenstand (2) gehalten wird. Erfindungsgemäß ist vorgesehen, dass dem individuellen Halter (3) wenigstens ein individueller Antrieb (9) zugeordnet ist, mit dem der individuelle Halter (3) gedreht und/oder gewendet wird.

摘要翻译： 用于支撑和用于光学元件E. G.的旋转和/或倒位的装置 一个透镜（2）或例如非光学元件 在真空镀膜的工具厂，各个支撑（3）的元件，和直接驱动单元包括（9）分配给所述元件的旋转和/或倒位的支持。 该驱动单元包括一个传递机构（4），单官能或多官能真空适合的控制和/或调节机构，和压电微型马达和/或压电致动器。 用于支撑和用于光学元件E. G.的旋转和/或倒位的装置 一个透镜（2）或例如非光学元件 在真空镀膜的工具厂，各个支撑（3）的元件，和直接驱动单元包括（9）分配给所述元件的旋转和/或倒位的支持。 该驱动单元包括一个传递机构（4），单官能或多官能真空适合的控制和/或调节机构，和压电微型马达和/或压电致动器。 传动机构是一个齿条 - 小齿轮和/或一个正齿轮和/或蜗轮和/或行星齿轮和/或球的发射和/或谐波驱动传输。 摩擦机构（6）是用于传递驱动功率和/或驱动单元的到各个支撑的驱动转矩。 各个支撑和驱动单元间接地或彼此为正和/或非正和/或面向位置的几何闭合直接连接。 的定位机构的目的是旋转和/或反转期间，以使各个支撑到预先确定的位置，包括止动元件，针对其旋转和/或反转期间各个支撑碰撞的可激活和/或失活。 锁定机构的目的是锁定在预定位置上的定位单独的支承。 的变换机构是用于线性电动机的线性运动转换成旋转和/或反转运动，并且包括一个齿条和配合齿轮。 压电微型马达展品在椭圆振动发动机座，所有这些是未配合地连接的摩擦与摩擦轮和/或一个摩擦条。 附接机构是用于可拆卸地紧固到一个半球形凹部和调节机构包括固定装置的位置相对于所述半球形凹部。 各个支撑具有两个接头，在该光学元件被连接。 独立权利要求中包括了：（1）设置有设备的半球形凹部; 和（2）用于支撑和用于光学元件E. G.的旋转和/或倒位一个程序 一个透镜或一个非光学元件E.G. 的工具。