公开(公告)号：EP3392371A1

公开(公告)日：2018-10-24

申请号：EP17167150.6

申请日：2017-04-19

申请人： Vestel Elektronik Sanayi ve Ticaret A.S.

发明人： KUYUCU, Ömer Gökce

IPC分类号： C23C14/50 ,  H01L21/68 ,  B25B5/00

CPC分类号： C23C14/505 ,  B25B5/00 ,  H01L21/68721 ,  H01L21/68728

摘要： The present invention refers to a tool for fixing a substrate with a satellite in a PVD process. The tool for fixing the substrate (7) with the satellite (6) in a PVD process to perform at least two circular axial turning motions and to work with different strength/ squeeze grades for getting better coating efficiency. The tool preferably comprises of a clamp (16), at least two connecting means and a forcing structure (17). The clamp (16) may include at least two connection pins and a head. The forcing structure (17) can be provided to control a squeeze force on the substrate (7). The connection pins of the clamp (16) can be fixed in non-coaxial axis holes (12, 13) that may be provided in the connecting means thereby making squeeze force on the substrate (7) for coating. One end of the forcing structure (17) can be connected to the connecting means and another end may be connected to the satellite (6).

公开(公告)号：EP3256619B1

公开(公告)日：2018-09-26

申请号：EP16706999.6

申请日：2016-02-15

申请人： Oerlikon Surface Solutions AG, Pfäffikon

发明人： KIM, Dong-Ju ,  KEPLINGER, Christian ,  VESTER, Armin ,  BECKER, Jürgen

IPC分类号： C23C16/458 ,  C23C14/50 ,  H01J37/32

CPC分类号： C23C16/4581 ,  C23C14/505 ,  C23C16/50 ,  H01J37/32715 ,  H01J2237/3321

摘要： A method for using a fixture system and a fixture system for holding workpieces or parts to be treated by a plasma assisted vacuum process, the fixture system including magnetic means which generate a magnetic field with a magnetic force which is high enough for holding the workpiece or part. The magnetic means of the fixture system are designed and arranged in such a manner that magnetic field lines of the generated magnetic field are largely confined to the space including the fixture system and the body of the workpiece or part, so that a generation of unintended plasma inhomogeneities caused by the magnetic field lines is avoided.

公开(公告)号：EP3369503A1

公开(公告)日：2018-09-05

申请号：EP16859882.9

申请日：2016-10-27

申请人： Mitsubishi Materials Corporation

发明人： OGAMI Tsuyoshi ,  HASHIMOTO Tatsuo ,  ICHIMIYA Natsuki

IPC分类号： B23B27/14 ,  B23B51/00 ,  B23C5/16 ,  C23C14/06

CPC分类号： B23B27/14 ,  B23B51/00 ,  B23B2228/105 ,  B23C5/16 ,  C23C14/0021 ,  C23C14/0641 ,  C23C14/325 ,  C23C14/505 ,  C23C16/34 ,  C23C28/042 ,  C23C28/044

摘要： A surface-coated cutting tool includes a tool body and a hard coating layer including a lower layer and an upper layer. The lower layer is made of a complex nitride layer of Al, Ti, and Si with the thickness of 0.3 to 3.0 µm. It satisfies 0.3 ≤ α ≤ 0.5 and 0.01 ≤ β ≤ 0.10 (atomic ratio) being expressed by (Al 1-α-β Ti α Si β )N. The upper layer is made of a complex nitride layer of Al, Cr, Si, and Cu with the thickness of 0.5 to 5.0 µm. It satisfies 0.15 ≤ a ≤ 0.40, 0.05 ≤ b ≤ 0.20, and 0.005 ≤ c ≤ 0.05 (atomic ratio) being expressed by (Al 1-a-b-c Cr a Si b Cu c )N. The upper layer is made of crystals having a hexagonal structure, and a half width of a diffraction peak of a (110) plane present in a range of 2θ = 55° to 65° is 1.0° to 3.5°.

公开(公告)号：EP3310941A1

公开(公告)日：2018-04-25

申请号：EP16730695.0

申请日：2016-06-16

申请人： Schneider GmbH & Co. KG

发明人： SCHNEIDER, Gunter ,  HUTTENHUIS, Stephan ,  FUHR, Markus

IPC分类号： C23C14/35 ,  C23C14/50 ,  H01J37/34 ,  G02B1/10 ,  C23C14/34

CPC分类号： C23C14/505 ,  C23C14/3407 ,  C23C14/35 ,  C23C14/352 ,  G02B1/10 ,  H01J37/32403 ,  H01J37/32715 ,  H01J37/32752 ,  H01J37/3405 ,  H01J37/347

摘要： A device, a method and a use for the coating of lenses are proposed, the lenses that are to be coated being arranged in pairs over parallel tubular targets in such a way that they respectively cover both a homogeneous depositing region and an inhomogeneous depositing region of the target and the lenses rotating, and so a particularly uniform coating is achievable.

公开(公告)号：EP3279364A1

公开(公告)日：2018-02-07

申请号：EP16182561.7

申请日：2016-08-03

申请人： IHI Hauzer Techno Coating B.V.

发明人： Derckx, Don ,  Doerwald, Dave ,  Jacobs, Ruud ,  Gelten, Marijn

IPC分类号： C23C14/34 ,  C23C14/54 ,  C23C14/50 ,  C23C14/56

CPC分类号： C23C14/541 ,  C23C14/34 ,  C23C14/3492 ,  C23C14/505 ,  C23C14/564 ,  H01J37/32715 ,  H01J37/32724 ,  H01J37/32779 ,  H01J37/34

摘要： An apparatus for coating substrates includes a vacuum chamber having an opening through which substrates can be received and a door configured to seal the opening; one or more targets arranged in the vacuum chamber; a cooling unit configured to cool the substrates and/or a heating unit configured to heat the substrates; rotating means configured to rotate substrates relative to the one or more targets, the cooling unit and/or the heating unit; and a lifting chamber that communicates with the interior of the vacuum chamber and is configured to receive the cooling unit and the heating unit. The vacuum chamber defines a lifting axis along which the cooling unit and/or the heating unit and the lifting chamber are arranged, and the apparatus further comprises displacement means configured to displace the cooling unit and/or the heating unit along the lifting axis and between the vacuum chamber and the lifting chamber.

摘要翻译： 一种用于涂覆基板的设备包括：具有开口的真空室，通过所述开口能够容纳基板;以及门，所述门构造成密封开口; 布置在真空室中的一个或多个目标; 冷却单元，其被配置为冷却所述基板和/或被配置为加热所述基板的加热单元; 旋转装置，其被配置成相对于所述一个或多个目标，所述冷却单元和/或所述加热单元旋转基板; 以及提升室，其与真空室的内部连通并且构造成接收冷却单元和加热单元。 所述真空室限定提升轴线，所述冷却单元和/或所述加热单元和所述提升室沿所述提升轴线布置，并且所述设备还包括位移装置，所述位移装置配置为沿着所述提升轴线和在所述提升轴线之间移动所述冷却单元和/或所述加热单元 真空室和提升室。

公开(公告)号：EP3153258A4

公开(公告)日：2017-12-27

申请号：EP15803141

申请日：2015-04-30

申请人： KK KOBE SEIKO SHO (KOBE STEEL LTD )

发明人： HIROTA SATOSHI

IPC分类号： B23B27/14 ,  B23B51/00 ,  B23C5/16 ,  B23P15/28 ,  C23C14/02 ,  C23C28/04

CPC分类号： C23C14/081 ,  B23B51/00 ,  B23B2224/08 ,  B23B2224/24 ,  B23B2228/08 ,  B23C5/16 ,  B23C2224/24 ,  B23C2228/08 ,  C23C14/024 ,  C23C14/0641 ,  C23C14/325 ,  C23C14/345 ,  C23C14/352 ,  C23C14/505

摘要： Provided is a tool for machining in which defective adhesion of a coating film at an interface of a layer containing titanium and an alumina layer is prevented. A method for producing a tool for machining is provided in which a coating film of a plurality of layers is formed on a surface of a base material (21) by physical vapor deposition (PVD), the method including: a first layer formation step of forming a first layer (22) containing a nitride or carbide of titanium on the surface of the base material (21); a first barrier layer formation step of forming a barrier layer (23) that covers a surface of the first layer (22); and a second layer formation step of forming a second layer (24) containing aluminum oxide on a surface of the barrier layer (23).

公开(公告)号：EP2955247B1

公开(公告)日：2017-12-20

申请号：EP15171956.4

申请日：2015-06-12

申请人： United Technologies Corporation

发明人： Neal, James W. ,  Litton, David A. ,  Hazel, Brian T. ,  Maloney, Michael J. ,  Jorzik, Eric M.

IPC分类号： C23C14/50 ,  C23C14/56

CPC分类号： C23C16/463 ,  C23C14/22 ,  C23C14/50 ,  C23C14/505 ,  C23C14/56 ,  C23C16/455 ,  C23C16/458 ,  C23C16/46

摘要： A deposition apparatus comprises: an infeed chamber (28; 28-1); a preheat chamber (30; 30-1); a deposition chamber (26; 26-1); and optionally at least one of a cooldown chamber (34) and an outlet chamber (38). At least a first of the preheat chamber and the cooldown chamber contains a buffer system (60; 60-1; 60-2) for buffering workpieces respectively passing to or from the deposition chamber.

公开(公告)号：EP3177753A4

公开(公告)日：2017-08-02

申请号：EP15828966

申请日：2015-07-08

申请人： OKINAWA INST SCIENCE & TECH SCHOOL CORP

发明人： QI YABING ,  ONO LUIS KATSUYA ,  WANG SHENGHAO

IPC分类号： C23C16/44 ,  C07F7/22 ,  C07F7/24 ,  C23C14/24 ,  H01L51/44 ,  H01L51/48

CPC分类号： C23C14/542 ,  C07F7/22 ,  C07F7/24 ,  C23C14/0694 ,  C23C14/12 ,  C23C14/24 ,  C23C14/243 ,  C23C14/505 ,  H01L31/0256 ,  H01L51/0008 ,  H01L51/0029 ,  H01L51/4226

公开(公告)号：EP3177753A1

公开(公告)日：2017-06-14

申请号：EP15828966.0

申请日：2015-07-08

申请人： Okinawa Institute of Science and Technology School Corporation

发明人： QI, Yabing ,  ONO, Luis Katsuya ,  WANG, Shenghao

IPC分类号： C23C16/44 ,  H01L51/44 ,  H01L51/48 ,  C07F7/22 ,  C07F7/24

CPC分类号： C23C14/542 ,  C07F7/22 ,  C07F7/24 ,  C23C14/0694 ,  C23C14/12 ,  C23C14/24 ,  C23C14/243 ,  C23C14/505 ,  H01L31/0256 ,  H01L51/0008 ,  H01L51/0029 ,  H01L51/4226

摘要： A system and method for fabricating a perovskite film is provided, the system including a substrate stage configured to rotate around its central axis at a rotation speed, a first set of evaporation units, each coupled to the side section or the bottom section of the chamber, a second set of evaporation units coupled to the bottom section, and a shield defining two or more zones having respective horizontal cross-sectional areas, which are open and facing the substrate, designated for the two or more evaporation units in the second set. The resultant perovskite film includes multiple unit layers, wherein each unit layer is formed by one rotation of the substrate stage, and the composition and thickness of the unit layer are controlled by adjusting at least the evaporation rates, the rotation speed and the horizontal cross-sectional areas.

摘要翻译： 一种用于制造钙钛矿电影的系统和方法被提供，该系统包括被配置为在旋转速度中，第一组的蒸发装置，每个都耦合到所述侧部或该腔室的底部区段绕其中心轴线旋转的基片台 ，第二组耦合到底部蒸发单元和屏蔽限定具有respectivement水平横截面区域的两个或更多个区，其是开放的，面向所述基板，指定为在第二组中的两个或更多个蒸发单元。 所得钙钛矿电影包括多个单元层，每个单元worin层通过衬底台的一个旋转而形成，并且该层单元的组成和厚度是由蒸发速率，旋转速度和所述水平横调整至少控制 截面积。

公开(公告)号：EP3075474A4

公开(公告)日：2017-05-17

申请号：EP13898341

申请日：2013-11-26

申请人： OSG CORP ,  NAT UNIV CORP TOHOKU UNVERSITY

发明人： WANG MEI ,  SAKURAI MASATOSHI ,  SUTOU YUJI ,  KOIKE JUNICHI

IPC分类号： B23B27/14 ,  B23C5/16 ,  B23C5/28 ,  C23C14/00 ,  C23C14/06 ,  C23C14/08 ,  C23C14/34 ,  C23C14/50 ,  C23C28/00 ,  C23C28/04

CPC分类号： C23C14/0073 ,  B23C5/28 ,  B23C2228/04 ,  B23C2228/08 ,  B23C2228/10 ,  C23C14/06 ,  C23C14/0635 ,  C23C14/0641 ,  C23C14/0664 ,  C23C14/0676 ,  C23C14/345 ,  C23C14/505 ,  C23C28/042 ,  C23C28/044 ,  C23C28/42

摘要： Provided are: a hard lubricating coating film which is hard and has wear resistance; and a hard lubricating coating film-covered tool. A hard coating film (10), which is hard and has wear resistance, and an end mill (12) can be obtained by alternately forming two or more (CraMobWcVdBe)1-x-yCxNy layers A (22) and two or more (CraMobWcVdBe)1-x-y-zCxNyOz layers B (24) by controlling the composition ratios of Cr, Mo, W, V and B and various reaction gases during the film formation, or alternatively by controlling only the various reaction gases during the film formation. In this connection, the atomic ratios a-e, y and (x + y) of the layers A (22) are within predetermined ranges; the atomic ratios a-e, x, y, z and (x + y + z) of the layers B (24) are within predetermined ranges; the film thickness (D1) of the layers A (22) is within the range from 2 nm to 1,000 nm (inclusive); the film thickness (D2) of the layers B (24) is within the range from 2 nm to 500 nm (inclusive); and the total film thickness (D) is within the range from 0.1 µm to 10.0 µm (inclusive).

摘要翻译： 提供：坚硬并具有耐磨性的硬质润滑涂膜; 和硬质润滑涂膜覆盖工具。 通过交替形成两个或更多个（CraMobWcVdBe）1-x-yCxNy层A（22）和两个或更多个（（C））（（22））的硬质涂层膜 通过在成膜过程中控制Cr，Mo，W，V和B以及各种反应气体的组成比，或者通过在成膜过程中仅控制各种反应气体，可以制备1-xy-zCxNyOz层B（24）。 就此而言，层A（22）的原子比a-e，y和（x + y）在预定范围内; 层B（24）的原子比a-e，x，y，z和（x + y + z）在预定范围内; A（22）的膜厚（D1）在2nm以上且1000nm以下的范围内。 层B（24）的膜厚（D2）在2nm以上且500nm以下的范围内。 并且总膜厚度（D）在0.1μm至10.0μm（包括端值）的范围内。