公开(公告)号：EP1262752B1

公开(公告)日：2005-08-03

申请号：EP02010847.8

申请日：2002-05-15

Applicant: THORLABS GmbH

Inventor： Peupelmann, Jens ,  Krause, Egbert ,  Bandemer, Adalbert, Dr.

IPC: G01J4/00

CPC classification number: G02B6/274 ,  G01J4/00 ,  G02B6/02109 ,  G02B6/276 ,  G02B6/2766 ,  G02B6/29317

公开(公告)号：EP1532432A1

公开(公告)日：2005-05-25

申请号：EP03760755.3

申请日：2003-06-19

Applicant: CENTRE NATIONAL DELA RECHERCHE SCIENTIFIQUE (CNRS) ,  UNIVERSITE PIERRE ET MARIE CURIE

Inventor： AUSSERRE, Dominique ,  VALIGNAT, Marie-Pierre

IPC: G01N21/21 ,  G01J4/00 ,  G01B11/00

CPC classification number: G01N21/211 ,  G01J4/00

Abstract: The invention concerns a support designed for observing between intersecting polarizers an object located in its vicinity in a medium (3) of index n0 with incident convergent incoherent illumination under an angle θ0 at a wavelength λ. Said support comprises a substrate (1) with complex refractive index n2 and a layer (2) of refractive index n1 and thickness e1. According to the invention, the value of the thickness e1 of the layer (2) is at ± 2 % such that d2/de21 1nIσI2 = 0 with σ = σ01 + σ12(1 + π01)e(-2jβ1) + σ01π12e(-4jβ1)/1 + r01(p) + r12(p)e(-2jβ1))(1 + r01(s)r12(s)e(-2jβ1)). The invention also concerns observation devices incorporating such a support.

公开(公告)号：EP1329702B1

公开(公告)日：2005-03-23

申请号：EP02018761.3

申请日：2002-08-22

Applicant: Agilent Technologies Inc. a Delaware Corporation

Inventor： Witzel, Eckart ,  Haisch, Hansjörg

IPC: G01M11/00 ,  G01J9/02

CPC classification number: G01M11/33 ,  G01J4/00 ,  G01J9/02 ,  G01M11/331

公开(公告)号：EP1280185B1

公开(公告)日：2004-09-22

申请号：EP02018112.9

申请日：1997-10-08

Applicant: Symyx Technologies, Inc.

Inventor： Weinberg, W. Henry ,  McFarland, Eric W. ,  Cong, Peijun ,  Guan, Shenheng

IPC: H01J49/00 ,  H01J49/04

CPC classification number: G01N29/2425 ,  B01J19/0046 ,  B01J2219/00315 ,  B01J2219/00317 ,  B01J2219/00364 ,  B01J2219/00378 ,  B01J2219/0043 ,  B01J2219/00443 ,  B01J2219/00497 ,  B01J2219/005 ,  B01J2219/00511 ,  B01J2219/00515 ,  B01J2219/0052 ,  B01J2219/00527 ,  B01J2219/00536 ,  B01J2219/00583 ,  B01J2219/00585 ,  B01J2219/0059 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/0061 ,  B01J2219/00612 ,  B01J2219/00621 ,  B01J2219/00626 ,  B01J2219/00628 ,  B01J2219/00637 ,  B01J2219/00641 ,  B01J2219/00659 ,  B01J2219/00675 ,  B01J2219/00689 ,  B01J2219/00702 ,  B01J2219/00704 ,  B01J2219/00722 ,  B01J2219/00738 ,  B01J2219/00745 ,  B01J2219/00747 ,  B01J2219/0075 ,  B01J2219/00754 ,  B82Y30/00 ,  C07F15/0066 ,  C07F15/045 ,  C40B20/08 ,  C40B30/08 ,  C40B40/14 ,  C40B40/18 ,  C40B50/14 ,  C40B60/12 ,  C40B60/14 ,  G01H13/00 ,  G01J4/00 ,  G01N9/002 ,  G01N11/16 ,  G01N21/211 ,  G01N21/253 ,  G01N21/6402 ,  G01N21/6452 ,  G01N21/66 ,  G01N25/4813 ,  G01N29/022 ,  G01N29/036 ,  G01N29/2418 ,  G01N29/30 ,  G01N29/348 ,  G01N29/42 ,  G01N29/4418 ,  G01N29/4427 ,  G01N31/10 ,  G01N2009/006 ,  G01N2203/0094 ,  G01N2291/014 ,  G01N2291/0224 ,  G01N2291/0255 ,  G01N2291/0256 ,  G01N2291/02818 ,  G01N2291/02827 ,  G01N2291/02863 ,  G01N2291/0422 ,  G01N2291/0423 ,  G01N2291/0427 ,  G01N2291/106 ,  H01J49/0409 ,  H01J49/0468

公开(公告)号：EP1034413B1

公开(公告)日：2004-03-17

申请号：EP98948735.0

申请日：1998-08-06

Applicant: ROBERT BOSCH GMBH

Inventor： HAHN, Jürgen ,  KÜHNLE, Götz

IPC: G01B11/06

CPC classification number: G01B11/065 ,  G01J4/00

Abstract: The invention relates to an ellipsometer measuring instrument for determining the thickness of a film deposited on a substrate. Said ellipsometer comprises: a light source (3) which emits an entrance ray (9); a transmitting optical system which guides the entrance ray (9) to a point of incidence (P) on the substrate; and a receiving optical system with an analyzer (5.4) which guides the reflection ray (10) formed at the point of incidence (P) to a photoreceptor device (5.7). The polarizing directions of the entrance ray (9) and of the analyzer (5.4) are modified in time in relation to each other, and the intensity modifications thus generated are evaluated by an evaluation device (7) in order to determine the thickness of the film. The inventive measuring instrument is characterized by its ease of operation and its precision in measuring film thickness, even for objects which are not easily accessible and are differently curved. To this end, the ellipsometer has an angle-measuring device (5.7) for detecting the angle ( beta ) of the reflection ray (10) in relation to a tangential plane of the substrate at the point of incidence (P). The film thickness can then be determined in accordance with the angle ( beta ) detected by means of the evaluation device (7).

公开(公告)号：EP1026495A3

公开(公告)日：2003-12-17

申请号：EP99306533.3

申请日：1999-08-19

Applicant: J.A. WOOLLAM CO. INC.

Inventor： Hertzinger, Craig M. ,  Johs, Blaine D.

IPC: G01N21/21 ,  G02B26/08 ,  G02B27/28 ,  G01J4/00 ,  G02B5/30

CPC classification number: G01J3/447 ,  G01J4/00 ,  G01J2003/2866 ,  G01N21/211

Abstract: A compensator or retarder system (3) allows adjustment to eliminate introduction of significant deviation and/or displacement into the propagation direction of a beam of electromagnetic radiation (LB) (LB') caused to interact therewith, even when the compensator or retarder system is caused to continuously rotate in a rotating compensator (C1) (C2) (C3) ellipsometer system (1). The system (3) consists of two pivotable reflectors (OS1,OS2) and a totally internally reflecting prism (P2).

公开(公告)号：EP1247079A1

公开(公告)日：2002-10-09

申请号：EP01932496.1

申请日：2001-01-08

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： WAGNER, Jeff, A.

IPC: G01J4/00

CPC classification number: G01J4/00 ,  G01N21/211

Abstract: An improved ellipsometry method and a self-correcting simultaneous multiple angle/multiple wavelength return path ellipsometer (20) are disclosed which allow for simultaneous measurement at multiple angles of incidence in a manner which permits separation of instrument error from the measured properties. Non-sample optical system ellipsometric effects of the ellipsometer are measured and the measured changes in polarization state are corrected to eliminate errors introduced thereby. The disclosed embodiment is self-correcting by way of a convex reflector (6) which can be inserted into and removed from the optical path of the beam of polarized light between a focusing optic (5) and the sample optical system (7) under study. The convex reflector (6) when inserted into the optical path causes the light rays of the beam of polarized light in each of the plurality of angles of incidence to retrace its path through the focusing optic (5) for detection by a detector array (10) without undergoing reflection and re-reflection as during a sample measurement configuration of the ellipsometer (20) is removed from the optical path.

公开(公告)号：EP1084393A1

公开(公告)日：2001-03-21

申请号：EP99919164.6

申请日：1999-03-30

Applicant: GlukoMediTech AG

Inventor： LANG, Klaus ,  PÖTZSCHKE, Harald ,  ZIRK, Kai ,  BARNIKOL, Wolfgang

IPC: G01N21/21 ,  G01J4/04

CPC classification number: G01J4/00

Abstract: A method for miniaturizing a polarimeter with a very long optical path length for analyzing low concentrated components in particular in a fluid measuring product on an optical basis, whereby the optical measuring beam is guided several times through the measuring product. The measuring beam is deflected by means of total reflection in prisms which are arranged on the outer sides of the measuring chamber or by reflection onto mirrors arranged inside the measuring chamber. A specific optical structure ensures that no modification occurs in the polarization state of the light, i.e. the angle of rotation and ellipticity thereof.

公开(公告)号：EP1038165A1

公开(公告)日：2000-09-27

申请号：EP98907397.8

申请日：1998-02-02

Applicant: J.A. WOOLLAM CO. INC.

Inventor： Johs, Blaine D. ,  Thompson, Daniel W.

IPC: G01N21/21

CPC classification number: G01N21/211 ,  G01J3/447 ,  G01J4/00 ,  G01J2003/2866

Abstract: A spectroscopic rotating compensator material system investigation system including a photo array (DE's) for simultaneously detecting a multiplicity of wavelengths is disclosed. The spectroscopic rotating compensator material system investigation system is calibrated by a mathematical regression based technique involving, where desirable, parameterization of calibration parameters. Calibration is possible of calibration parameters. Calibration is possible utilizing a single two-dimensional data set obtained with the spectroscopic rotating compensator material system investigation system in a 'material system present' or in a 'straight-through' configuration.

Abstract translation: 公开了一种包括用于同时检测多个波长的光阵列（DE）的光谱旋转补偿器材料系统调查系统。 光谱旋转补偿器材料系统调查系统通过基于数学回归的技术进行校准，该技术涉及在需要时对校准参数进行参数化。 校准是可能的校准参数。 使用通过光谱旋转补偿器材料系统调查系统在“材料系统存在”或“直通”配置中获得的单个二维数据集进行校准是可能的。

公开(公告)号：EP0429219B1

公开(公告)日：1995-09-27

申请号：EP90312195.2

申请日：1990-11-07

Applicant: International Business Machines Corporation

Inventor： Asthana, Rahul ,  Miller, Robert Dennis ,  Schellenberg, Franklin Mark ,  Sincerbox, Glenn Tavernia ,  Zavislan, James Matthew

IPC: G11B11/10 ,  G11B13/04 ,  G11B7/12

CPC classification number: G11B11/10543 ,  G01J4/00 ,  G11B11/10576