公开(公告)号：EP1685598A2

公开(公告)日：2006-08-02

申请号：EP04780607.0

申请日：2004-08-10

申请人： BROOKS AUTOMATION, INC.

发明人： SULLIVAN, Robert, P. ,  HARIS, Clint ,  BUFANO, Michael ,  FRIEDMAN, Gerald ,  HOFMEISTER, Christopher

IPC分类号： H01L29/00

CPC分类号： H01L21/68707 ,  B65G13/00 ,  B65G37/02 ,  H01L21/6773 ,  H01L21/67736

摘要： A semiconductor workpiece processing system compπsing at least one processing tool, a container(151 ), a first transport section (12) and a second transport section ( 14) The first transporting section having a transport vehicle (200) for moving a cassette while moving along a first track (16) The second transport section is not vehicle based and has a second track (18) The first and second tracks are disposed proximate to each other to allow a container to be moved therebetween in a single operation

公开(公告)号：EP1330835B1

公开(公告)日：2005-01-05

申请号：EP01988944.3

申请日：2001-10-01

申请人： Infineon Technologies SC300 GmbH & Co. KG

发明人： PEITER, Martin

IPC分类号： H01L21/00

CPC分类号： H01L21/67775 ,  H01L21/67724 ,  H01L21/67727 ,  H01L21/67736 ,  Y10S414/14

摘要： For bay type structures of semiconductor wafer transport systems an arrangement is provided with interbay rail tacks (10) and intrabay rail tracks (20) mounted on each other, and the vehicles (11) of the interbay system, and the carrier transfer cars (21) of the intrabay system can move freely bi-directional inside the bay area without obstructing each other. The carrier transfer car is designed such that a wafer carrier (1) can be directly loaded from the vehicle (11) to the load port (31) of a processing machine. The arrangement simplifies and accelerates the transfer, and enhances the flexibility of vehicles in wafer transport.

公开(公告)号：EP1320874B1

公开(公告)日：2004-06-16

申请号：EP01985775.4

申请日：2001-09-26

申请人： Infineon Technologies SC300 GmbH & Co. KG

发明人： LERING, Michael

IPC分类号： H01L21/00 ,  B62B3/00

CPC分类号： H01L21/67775 ,  B62B3/10 ,  B62B2203/10 ,  B62B2203/20 ,  H01L21/67724 ,  H01L21/67736 ,  Y10S414/14

摘要： A vehicle for transporting semiconductor devices is provided, that allows to serve the loadports (2) of semiconductor processing tools (1) with device carriers (5) like a portal hoist (4) from the top. Thereby, the vehicle comprises an empty inner space (10) and an open front side, such that the loadport (2) is enclosed by the vehicle, when it approaches and docks to the loadport (2). Time for loading is shortened, complexity of structure and procedure is reduced and cleanroom space is saved.

公开(公告)号：EP0911867A3

公开(公告)日：2004-01-28

申请号：EP98119238.8

申请日：1998-10-12

申请人： SIEMENS AKTIENGESELLSCHAFT

发明人： Möges, Gerhard, Dipl.-Ing. ,  Seyler, Bernhard

IPC分类号： H01L21/00

CPC分类号： H01L21/67236 ,  B23Q7/04 ,  B23Q7/14 ,  B23Q7/1494 ,  H01L21/67736 ,  H01L21/67766

摘要： Leadframes werden in Magazinen (M1-M12) mittels eines längs einer Trasse beweglichen Roboters (R) von und zu Bearbeitungsstationen (B1,B2) verfahren. Dadurch, daß der Roboter (R) jeweils die Magazine (M1-M12) handhabt, sind nur relativ wenige Roboterarmbewegungen nötig. Gemäß der Erfindung weist der Roboter (R) an seinem Fahrgestell (F) Halterungen (H1-H3) für weitere Magazine auf, so daß er ständig einen Magazinvorrat mitführt, wodurch seine Verfahrwege gering gehalten werden können.

公开(公告)号：EP1076354A3

公开(公告)日：2002-08-07

申请号：EP00121402.2

申请日：1991-08-19

申请人： Hitachi, Ltd.

发明人： Kato, Shigekazu ,  Tsubone, Tsunehiko ,  Nishihata, Kouji ,  Itou, Atsushi

IPC分类号： H01L21/00

CPC分类号： H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A vacuum processing apparatus has vacuum processing chambers (11a,11b,11c) the insides of which must be dry cleaned. When the vacuum processing chambers are dry-cleaned, dummy substrates (30) are transferred into the vacuum processing chamber by substrate conveyor means (13,14) from dummy substrate storage means (1c) which is diposed in the air atmosphere separate from storage means (1a,1b) for storing substrates (20) to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate (30) is returned to the dummy substrate storage means (1c) after dry cleaning is completed. Accordingly, no specific mechanism for the cleaning is necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates (30) used for dry cleaning and the substrates (20) to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

摘要翻译： 真空处理设备具有真空处理室（11a，11b，11c），其内部必须干燥清洁。 当真空处理室被干洗时，通过衬底传送装置（13,14）将虚拟衬底（30）从虚拟衬底存储装置（1c）传送到真空处理室中，所述虚拟衬底存储装置（1c）插入空气环境中，与存储装置 （1a，1b），用于存储待处理的基片（20），并且通过产生等离子体来干洗真空处理室的内部。 在干洗完成之后，将虚设衬底（30）返回到虚设衬底存储装置（1c）。 因此，不需要用于清洁的具体机构，并且装置的结构可以变得简单。 此外，用于干洗的虚拟衬底（30）和待处理的衬底（20）不共存，可防止由于灰尘和残留气体而导致待处理衬底的污染，并且生产成品率可高。

公开(公告)号：EP1193736A1

公开(公告)日：2002-04-03

申请号：EP00121040.0

申请日：2000-09-27

申请人： Infineon Technologies SC300 GmbH & Co. KG

发明人： Lering, Michael

IPC分类号： H01L21/00 ,  B62B3/00

CPC分类号： H01L21/67775 ,  B62B3/10 ,  B62B2203/10 ,  B62B2203/20 ,  H01L21/67724 ,  H01L21/67736 ,  Y10S414/14

摘要： A vehicle for transporting semiconductor devices is provided, that allows to serve the loadports (2) of semiconductor processing tools (1) with device carriers (5) like a portal hoist (4) from the top. Thereby, the vehicle comprises an empty inner space (10) and an open front side, such that the loadport (2) is enclosed by the vehicle, when it approaches and docks to the loadport (2). Time for loading is shortened, complexity of structure and procedure is reduced and cleanroom space is saved.

摘要翻译： 提供了一种用于运输半导体器件的车辆，其允许从顶部为诸如门式起重机（4）的装置载体（5）提供半导体加工工具（1）的加载端口（2）。 因此，车辆包括空的内部空间（10）和敞开的前侧，使得当车辆接近并且停靠在承载口（2）时，承载舱（2）被车辆包围。 缩短加载时间，减少结构和程序的复杂性，节省洁净室空间。

公开(公告)号：EP1159212A1

公开(公告)日：2001-12-05

申请号：EP99966286.9

申请日：1999-12-15

申请人： ASYST TECHNOLOGIES, INC.

发明人： BONORA, Anthony, C. ,  GOULD, Richard, H. ,  BRAIN, Michael, D. ,  ADAMS, David, V.

IPC分类号： B65G29/00 ,  B65G37/00 ,  B65G47/04 ,  B65G47/34 ,  B65G47/84

CPC分类号： H01L21/67775 ,  H01L21/67706 ,  H01L21/67727 ,  H01L21/6773 ,  H01L21/67733 ,  H01L21/67736 ,  H01L21/67763 ,  H01L21/67766 ,  H01L21/67769

摘要： An integrated intra-bay transfer, storage and delivery system (18) is provided for moving an article between a conveyor and a station such as a work station. The system (18) includes a transfer assembly which includes a lift mechanism and a displacement mechanism. The transfer assembly transfers the article between the conveyor system and a buffer or storage station for storage of the article. A delivery robot transfers the article between the buffer or storage station and a work station for delivery to the station. The robot includes a vertical movement mechanism and a horizontal movement mechanism. The robot also includes an arm that is adapted to grip the article, particularly an article of a standard configuration having a mushroom-shaped handle on top. The arm engages the handle and lifts the article or transport pod (12) from the storage station to a load port of the work station. In one embodiment, the arm includes a C-shaped adaptation that passively engages the handle from a side thereof. In other embodiments, the arm includes an actuator coupled to an assembly that actively grips the handle from above. Advantages of the invention include the ability to safely move the transport pod (12) from an elevated storage station to the lower placed storage stations or load ports of a work station.

公开(公告)号：EP1076354A2

公开(公告)日：2001-02-14

申请号：EP00121402.2

申请日：1991-08-19

申请人： Hitachi, Ltd.

发明人： Kato, Shigekazu ,  Tsubone, Tsunehiko ,  Nishihata, Kouji ,  Itou, Atsushi

IPC分类号： H01L21/00

CPC分类号： H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A vacuum processing apparatus has vacuum processing chambers (11a,11b,11c) the insides of which must be dry cleaned. When the vacuum processing chambers are dry-cleaned, dummy substrates (30) are transferred into the vacuum processing chamber by substrate conveyor means (13,14) from dummy substrate storage means (1c) which is diposed in the air atmosphere separate from storage means (1a,1b) for storing substrates (20) to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate (30) is returned to the dummy substrate storage means (1c) after dry cleaning is completed. Accordingly, no specific mechanism for the cleaning is necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates (30) used for dry cleaning and the substrates (20) to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

公开(公告)号：EP0956907A1

公开(公告)日：1999-11-17

申请号：EP99109476.4

申请日：1999-05-12

申请人： Dürr Systems GmbH ,  AUDI AG

发明人： Gutjahr, Rolf ,  Raible, Alfred ,  Dintner, Alfons

IPC分类号： B05B15/00 ,  B65G69/00 ,  B65G49/00

CPC分类号： H01L21/67775 ,  H01L21/67724 ,  H01L21/67736

摘要： Um ein Transportsystem zum Transportieren von Gegenständen in einen Arbeitsraum (100) hinein oder aus einem Arbeitsraum (100) heraus zu schaffen, das es ermöglicht, den Eintrag von Staub- und Schmutzteilchen aus dem Außenraum (118) des Arbeitsraums in den Arbeitsraum (100) hinein beim Transportieren der Gegenstände in den Arbeitsraum (100) hinein bzw. aus dem Arbeitsraum (100) heraus zu vermindern, wird erfindungsgemäß ein Transportsystem vorgeschlagen, das einen geschlossenen, transportablen Behälter (142) mit einer verschließbaren Zugangsöffnung (156) und einen Andockbereich (122) umfaßt, der in eine Außenwand (114) des Arbeitsraums (100) integriert ist und eine verschließbare Andocköffnung (122) aufweist, wobei der transportable Behälter (142) von der Außenseite des Arbeitsraums (100) her so mit dem Andockbereich (122) verbindbar ist, daß bei geöffneter Zugangsöffnung (156) und geöffneter Andocköffnung (122) der Innenraum (158) des Behälters (142) von dem Arbeitsraum (100) aus zugänglich und von dem Außenraum (118) des Arbeitsraums (100) getrennt ist.

摘要翻译： 一个封闭的运输容器（142）与可关闭的通道门（156）的系统besteht。 集成在车间（100）的外壁（114）的对接区域具有可关闭的门的对接（122）。 当容器连接到对接区域，存取门和对接门是打开的，所以没有容器内部（158）是从车间访问，并且是从外部（118）的车间的分离。 一种对接帧（138）围绕所述对接门具有弹性的密封件，并且门是由一自闭合门关闭。 该容器被携带在提升卡车。

公开(公告)号：EP0856875A3

公开(公告)日：1999-04-28

申请号：EP98106162.5

申请日：1991-08-19

申请人： HITACHI, LTD.

发明人： Kato, Shigekazu ,  Nishihata, Kouji ,  Tsubone, Tsunehiko ,  Itou, Atsushi

IPC分类号： H01L21/00

CPC分类号： H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A vacuum processing apparatus has vacuum processing chambers (11a,11b,11c) the insides of which must be dry cleaned. When the vacuum processing chambers are dry-cleaned, dummy substrates (30) are transferred into the vacuum processing chamber by substrate conveyor means (13,14) from dummy substrate storage means (1c) which is diposed in the air atmosphere separate from storage means (1a,1b) for storing substrates (20) to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate (30) is returned to the dummy substrate storage means (1c) after dry cleaning is completed. Accordingly, no specific mechanism for the cleaning is necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates (30) used for dry cleaning and the substrates (20) to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.