公开(公告)号：EP2453310B1

公开(公告)日：2015-12-09

申请号：EP12000081.5

申请日：2007-06-19

申请人： Entegris, Inc.

发明人： Kishkovich, Oleg ,  Gabarre, Xavier ,  Goodwin, William ,  Lo, James ,  Scoggins, Troy

IPC分类号： G03F7/20 ,  H01L21/673 ,  H01L21/687 ,  H01L21/67 ,  H01L21/677 ,  G03F1/66

CPC分类号： H01L21/67769 ,  G03F1/66 ,  G03F7/70741 ,  G03F7/70866 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70933 ,  H01L21/67017 ,  H01L21/67253 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67386 ,  H01L21/67389 ,  H01L21/67393 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

公开(公告)号：EP2698815A3

公开(公告)日：2014-06-25

申请号：EP13188083.3

申请日：2012-03-12

申请人： Plasma-Therm, LLC

发明人： Johnson, Chris ,  Johnson, David ,  Martinez, Linnell ,  Pays-Volard, David ,  Westerman, Russell ,  Gordon, Grivna

IPC分类号： H01L21/3065 ,  H01L21/683 ,  H01L21/687 ,  H01L21/67 ,  H01L21/78 ,  H01J37/32

CPC分类号： H01L21/78 ,  H01J37/321 ,  H01J37/32155 ,  H01J37/32422 ,  H01J37/32623 ,  H01J37/32642 ,  H01J37/32651 ,  H01J37/32724 ,  H01L21/3065 ,  H01L21/30655 ,  H01L21/31116 ,  H01L21/67011 ,  H01L21/67069 ,  H01L21/67739 ,  H01L21/68 ,  H01L21/6831 ,  H01L21/6833 ,  H01L21/68735 ,  H01L21/68742 ,  H01L21/782 ,  H01L2221/68327 ,  Y10S414/139

摘要： The present invention provides a method for plasma dicing a substrate. The method comprising providing a process chamber having a wall; providing a plasma source adjacent to the wall of the process chamber; providing a work piece support within the process chamber; placing the substrate onto a support film on a frame to form a work piece work piece; loading the work piece onto the work piece support; providing a cover ring disposed above the work piece; generating a plasma through the plasma source; and etching the work piece through the generated plasma.

摘要翻译： 本发明提供了一种用于等离子体切割衬底的方法。 该方法包括提供具有壁的处理室; 提供与处理室的壁相邻的等离子体源; 在处理室内提供工件支撑件; 将衬底放置在框架上的支撑膜上以形成工件工件; 将工件装载到工件支撑件上; 提供设置在工件上方的盖环; 通过等离子体源产生等离子体; 并通过产生的等离子体蚀刻工件。

公开(公告)号：EP1684951B1

公开(公告)日：2014-05-07

申请号：EP04818697.7

申请日：2004-11-10

申请人： Brooks Automation, Inc.

发明人： VAN DER MEULEN, Peter

IPC分类号： B25J18/02

CPC分类号： H01L21/67167 ,  B25J9/042 ,  H01L21/67126 ,  H01L21/67161 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67207 ,  H01L21/67253 ,  H01L21/67259 ,  H01L21/67706 ,  H01L21/67727 ,  H01L21/67733 ,  H01L21/67736 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67754 ,  H01L21/67757 ,  H01L21/67781 ,  H01L21/68 ,  H01L21/68707 ,  H01L21/68735 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S414/139 ,  Y10T74/20305

公开(公告)号：EP2698812A2

公开(公告)日：2014-02-19

申请号：EP13188079.1

申请日：2012-03-12

申请人： Plasma-Therm, LLC

发明人： Johnson, Chris ,  Johnson, David ,  Martinez, Linnell ,  Pays-Volard, David ,  Westerman, Russell

IPC分类号： H01L21/3065 ,  H01L21/683 ,  H01L21/687 ,  H01L21/67 ,  H01L21/78

CPC分类号： H01L21/78 ,  H01J37/321 ,  H01J37/32155 ,  H01J37/32422 ,  H01J37/32623 ,  H01J37/32642 ,  H01J37/32651 ,  H01J37/32724 ,  H01L21/3065 ,  H01L21/30655 ,  H01L21/31116 ,  H01L21/67011 ,  H01L21/67069 ,  H01L21/67739 ,  H01L21/68 ,  H01L21/6831 ,  H01L21/6833 ,  H01L21/68735 ,  H01L21/68742 ,  H01L21/782 ,  H01L2221/68327 ,  Y10S414/139

摘要： The present invention provides a method for plasma dicing a substrate. The method comprising providing a process chamber having a wall; providing a plasma source adjacent to the wall of the process chamber; providing a work piece support within the process chamber; placing the substrate onto a support film on a frame to form a work piece work piece; loading the work piece onto the work piece support; providing a cover ring disposed above the work piece; generating a plasma through the plasma source; and etching the work piece through the generated plasma.

公开(公告)号：EP2686877A2

公开(公告)日：2014-01-22

申请号：EP12719486.8

申请日：2012-03-12

申请人： Plasma-Therm, LLC

发明人： WESTERMAN, Russell ,  JOHNSON, David ,  JOHNSON, Chris ,  PAYS-VOLARD, David ,  MARTINEZ, Linnell

IPC分类号： H01L21/3065 ,  H01L21/683 ,  H01L21/687 ,  H01L21/67 ,  H01L21/78 ,  H01J37/32

CPC分类号： H01J37/32623 ,  H01J37/321 ,  H01J37/32155 ,  H01J37/32422 ,  H01J37/32642 ,  H01J37/32651 ,  H01J37/32724 ,  H01L21/3065 ,  H01L21/30655 ,  H01L21/31116 ,  H01L21/67069 ,  H01L21/67739 ,  H01L21/68 ,  H01L21/6831 ,  H01L21/6833 ,  H01L21/68735 ,  H01L21/68742 ,  H01L21/78 ,  H01L2221/68327 ,  Y10S414/139

摘要： The present invention provides a method for plasma dicing a substrate. The method comprising providing a process chamber having a wall; providing a plasma source adjacent to the wall of the process chamber; providing a work piece support within the process chamber; placing the substrate onto a support film on a frame to form a work piece work piece; loading the work piece onto the work piece support; providing a cover ring disposed above the work piece; generating a plasma through the plasma source; and etching the work piece through the generated plasma.

摘要翻译： 本发明提供了一种等离子体切割基板的方法。 该方法包括提供具有壁的处理室; 提供与处理室壁相邻的等离子体源; 在处理室内提供工件支撑件; 将基板放置在框架上的支撑膜上以形成工件工件; 将工件装载到工件支架上; 提供设置在工件上方的盖环; 通过等离子体源产生等离子体; 并通过所产生的等离子体蚀刻工件。

公开(公告)号：EP1953802A3

公开(公告)日：2012-05-23

申请号：EP08250379.8

申请日：2008-02-01

申请人： PARKER-HANNIFIN CORPORATION

发明人： Datta, Amitava ,  Amos, Peter G. ,  More, Dominick G. ,  Cornett, Kenneth W. ,  Payne, Jeremy

IPC分类号： H01L21/67

CPC分类号： H01L21/67126 ,  Y10S277/913 ,  Y10S277/939 ,  Y10S277/944 ,  Y10S414/139 ,  Y10T29/49719

摘要： A process chamber 10 comprising a container (12), a lid (14), and a sealed interface (16) therebetween. The container's interface surface (30) and/or the lid's interface surface (32) includes at least one groove (36) in which a seal (40) is situated. The seal (40) comprises an elastomeric element (50) and a metallic element (60). The elastomeric element (50) and the metallic element (60) can be arranged and adapted to seal the chamber's interface (16) sequentially during its conversion to a sealed condition. And/or the elastomeric element (50) and the metallic element (60)can be arranged and adapted to seat the chamber's interface in series once the lid (14) is in its sealed condition.

公开(公告)号：EP2453310A2

公开(公告)日：2012-05-16

申请号：EP12000081.5

申请日：2007-06-19

申请人： Entegris, Inc.

发明人： Kishkovich, Oleg ,  Gabarre, Xavier ,  Goodwin, William ,  Lo, James ,  Scoggins, Troy

IPC分类号： G03F7/20 ,  H01L21/673

CPC分类号： H01L21/67769 ,  G03F1/66 ,  G03F7/70741 ,  G03F7/70866 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70933 ,  H01L21/67017 ,  H01L21/67253 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67386 ,  H01L21/67389 ,  H01L21/67393 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： The present invention provides a method, system, and components for protecting reticles and specifically for minimizing haze formation on reticles during storage and use. By substantially continually maintaining a purge in a storage housing having a reduced humidity level on reticles or by temporarily storing the reticle in a container in proximity to a desiccant or getter when not being purged, haze formation can be eliminated, minimized, or sufficiently controlled. Moreover, a filter media in the container may be positioned to be "recharged" during the substantially continual purging of the reticle, a reduced desireable humidity level can be readily maintained in the reticle container when the container is not currently being purged. Additionally, the system of the invention can comprise an ionizer associated with the purge system. For example, the ionizer can be associated with at least one of the plurality of purge lines of the purge system. The system of the invention can also include a purge gas source connected to the purge system that comprises a source of CDA or extra CDA. The storage housing can comprise a plurality of shelves that each include a plurality of reticle storage receptacles.

摘要翻译： 本发明提供了一种用于保护掩模版的方法，系统和组件，并且特别地用于最小化在保存和使用期间掩模版上的雾化形成。 通过基本上连续地将清洁保持在具有降低的刻度上的湿度水平的储存壳体（54.1）中，或者当不被清除时将掩模版临时存储在接近干燥剂或吸气剂（54.8）的容器中时，可以消除雾度形成， 最小化或充分控制。 此外，容器中的过滤介质可以被定位成在基本连续清洗标线板期间被“再充电”，当容器当前没有被清除时，可以容易地保持在掩模版容器中减少的所需湿度水平。 另外，本发明的系统可以包括与清洗系统（50,52）相关联的离子发生器。 例如，离子发生器可以与清洗系统的多个清除管线（54.9）中的至少一个相关联。 本发明的系统还可以包括连接到吹扫系统的吹扫气体源，其包括CDA或额外的CDA源。 存储壳体可以包括多个搁架（80），每个搁架（80）包括多个掩模版存储容器（58）。

公开(公告)号：EP1786710A4

公开(公告)日：2011-10-12

申请号：EP05791673

申请日：2005-08-19

申请人： BROOKS AUTOMATION INC

发明人： ULYSSES GILCHRIST ,  BUFANO MICHAEL L ,  FOSNIGHT WILLIAM ,  HOFMEISTER CHRISTOPHER ,  FRIEDMAN GERALD M

IPC分类号： H01L21/68

CPC分类号： H01L21/67763 ,  H01L21/67326 ,  H01L21/67353 ,  H01L21/67369 ,  H01L21/67373 ,  H01L21/67376 ,  H01L21/67383 ,  H01L21/67389 ,  H01L21/67393 ,  H01L21/67772 ,  H01L21/67778 ,  H01L21/6779 ,  Y10S414/139

摘要： A substrate transport apparatus is provided. The apparatus has a casing and a door. The casing is adapted to form a controlled environment therein. The casing has supports therein for holding at least one substrate in the casing. The casing defines a substrate transfer opening through which a substrate transport system accesses the substrate in the casing. The door is connected to the casing for closing the substrate transfer opening in the casing. The casing has structure forming a fast swap element allowing replacement of the substrate from the apparatus with another substrate without retraction of the substrate transport system and independent of substrate loading in the casing.

公开(公告)号：EP1350997A3

公开(公告)日：2010-09-08

申请号：EP03007399.3

申请日：2003-04-02

申请人： EBARA CORPORATION

发明人： Shinozaki, Hiroyuki

IPC分类号： F16J15/40 ,  H01L21/00

CPC分类号： H01L21/67126 ,  F16J15/406 ,  Y10S414/135 ,  Y10S414/139 ,  Y10S414/141

摘要： The present invention provides a seal device comprising a sealing passage which allows communication between a first space and a second space, and evacuation lines individually connected to the first space and the sealing passage. A gas feed line for feeding dry gas is connected to the sealing passage.

公开(公告)号：EP1892755A2

公开(公告)日：2008-02-27

申请号：EP07114942.1

申请日：2007-08-24

申请人： KAWASAKI JUKOGYO KABUSHIKI KAISHA

发明人： Hashimoto, Yasuhiko ,  Takatori, Masao

IPC分类号： H01L21/677

CPC分类号： H01L21/67772 ,  Y10S414/139

摘要： In this invention, a movable body movable in forward and backward directions and a connector fixed to an opener-side door are connected with each other by link members so as to constitute a parallel link mechanism, such that they can be angularly displaced relative to each other. Link member angular displacement means controls the angular displacement of each link member relative to the movable body to be in a predetermined angular position, corresponding to the position of the movable body along the forward and backward directions. Reciprocation of the movable body in the forward and backward directions by movable body drive means moves the opener-side door in the forward and backward directions as well as in the upward and downward directions, thereby opening an opener-side opening. Since the movable body is moved only in the forward and backward directions, and necessity of moving and guiding the movable body in the upward and downward directions can be eliminated, the substrate container opener can be downsized, and a space provided below a FOUP supporting portion can be utilized effectively.

摘要翻译： 在本发明中，在前后方向上可移动的移动体和固定在开启器侧门上的连接器通过连杆构件彼此连接，从而构成平行连杆机构，使得它们能够相对于每个连杆机构 其他。 连杆构件角位移装置将各连杆构件相对于可动体的角位移控制在与可动体沿前后方向的位置对应的预定角位置。 利用可动体驱动装置使可动体在前后方向上往复运动，使开启器侧门沿前后方向以及向上和向下方向移动，由此打开开启器侧开口。 由于可移动体仅在前后方向上移动，并且可以消除在上下方向上移动和引导移动体的必要性，所以可以使基板容器开启器小型化，并且设置在FOUP支撑部分下方的空间 可以有效利用。