利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

241 条记录 (耗时 0.017 秒)

    DEPOSITION MASK AND PRODUCTION METHOD OF DEPOSITION MASK
    51.
    发明公开
    DEPOSITION MASK AND PRODUCTION METHOD OF DEPOSITION MASK 审中-公开

    公开(公告)号：EP3715495A1

    公开(公告)日：2020-09-30

    申请号：EP20166143.6

    申请日：2020-03-27

    申请人： Dainippon Printing Co., Ltd.

    发明人： IKENAGA, Chikao ,  AOKI, Daigo

    IPC分类号： C23C14/04 ,  C23C14/12 ,  C23C14/26 ,  H01L51/00 ,  H01L51/56 ,  H05B33/10 ,  C23F1/02

    摘要： A wall surface of an opening of a deposition mask includes a first wall surface that extends from a first end toward a second surface, a second wall surface that extends from a second end toward a first surface, and a connection at which the first wall surface is connected to the second wall surface. When the opening is viewed from the first surface side along a normal direction of the first surface, the first end of the opening includes a first portion that extends in a first direction and has a first dimension and a second portion that extends in a second direction intersecting the first direction and a second dimension shorter than the first dimension. The first wall surface includes a first wall surface section that extends from the first portion toward the connection and a second wall surface section that extends from the second portion toward the connection. A height of the first wall surface section is lower than a height of the second wall surface section.

    VAPOR DEPOSITION APPARATUS AND METHOD
    55.
    发明公开
    VAPOR DEPOSITION APPARATUS AND METHOD 审中-公开
    蒸气沉积装置和方法

    公开(公告)号：EP3266901A1

    公开(公告)日：2018-01-10

    申请号：EP17179810.1

    申请日：2017-07-05

    申请人： United Technologies Corporation

    发明人： NIELSEN, Erik M. ,  GERO, Peter

    IPC分类号： C23C14/24 ,  C23C14/26

    CPC分类号： C23C14/26 ,  C23C14/24 ,  C23C14/243 ,  C23C14/246

    摘要： A vapor deposition apparatus includes a chamber configured to operate at vacuum and at least one crucible in the chamber. The crucible is configured to receive an ingot, a feeder operable to move the ingot with respect to the at least one crucible, and a heater in the chamber and configured to heat a hot zone between the at least one crucible and the feeder. A method for vapor deposition is also disclosed.

    摘要翻译： 气相沉积装置包括配置成在真空下操作的腔室和腔室中的至少一个坩埚。 坩埚配置为接收锭料，可操作以相对于至少一个坩埚移动锭料的供料器，以及室中的加热器，并且配置为加热至少一个坩埚和供料器之间的热区。 还公开了一种用于气相沉积的方法。

    HEATING ASSEMBLY FOR VACUUM DEPOSITION, AND VACUUM DEPOSITION APPARATUS COMPRISING SAME
    57.
    发明公开
    HEATING ASSEMBLY FOR VACUUM DEPOSITION, AND VACUUM DEPOSITION APPARATUS COMPRISING SAME 有权
    贵州UR UR IT IT IT IT IT IT IT IT IT IT IT IT IT IT

    公开(公告)号：EP2711442A4

    公开(公告)日：2015-04-08

    申请号：EP13774597

    申请日：2013-07-23

    申请人： CEKO CO LTD

    发明人： KIM HYUN JOONG ,  KIM HONG CHUL ,  JUN KYUNG II ,  KIM YOUNG RAE ,  HWANG YOUNG JUN

    IPC分类号： C23C14/24 ,  C23C14/26 ,  H05B3/02 ,  H05B3/12

    CPC分类号： C23C14/243 ,  C23C14/26 ,  H05B3/03 ,  H05B3/12 ,  H05B2203/021 ,  H05B2203/022

    摘要： The present invention is a vacuum evaporation heating assembly for heating a carrier, in which an evaporation material is filled, in a vacuum evaporation process, the vacuum evaporation heating assembly comprising: a carrier container in which the carrier is installed; and an electrode connector which extends in both directions of the carrier container to be connected to an electrode. At least one of the carrier container and the electrode connector is a plate-shaped member. The vacuum evaporation heating assembly can securely hold the carrier, in which the evaporation material is filled, and can vaporize the evaporation material in a specialized direction, thereby uniformly and efficiently evaporating the evaporation material with a small number of carriers.

    摘要翻译： 本发明是一种真空蒸发加热组件，其用于在真空蒸发过程中加热其中填充有蒸发材料的载体，该真空蒸发加热组件包括：承载容器，载体安装在该载体容器中; 以及电极连接器，其在载体容器的两个方向上延伸以连接到电极。 载体容器和电极连接器中的至少一个是板状构件。 真空蒸发加热组件可以牢固地保持蒸发材料填充的载体，并且可以沿着专门的方向蒸发蒸发材料，从而均匀有效地用少量的载体蒸发蒸发材料。

    VAPOR DEPOSITION SYSTEM AND SUPPLY HEAD
    58.
    发明公开
    VAPOR DEPOSITION SYSTEM AND SUPPLY HEAD 审中-公开
    气相沉积系统与供料头

    公开(公告)号：EP2723913A1

    公开(公告)日：2014-04-30

    申请号：EP11730607.6

    申请日：2011-06-22

    申请人： Aixtron SE

    发明人： LONG, Michael ,  GERSDORFF, Markus ,  GOPI, Baskar Pagadala

    IPC分类号： C23C14/12 ,  C23C14/22 ,  C23C14/24 ,  C23C14/56 ,  C23C14/26

    CPC分类号： C23C14/12 ,  C23C14/228 ,  C23C14/243 ,  C23C14/246 ,  C23C14/26 ,  C23C14/56

    摘要： A vapor deposition system for delivering a mixture of a carrier gas and a deposition gas to a temperature controlled target substrate comprising a rotor; a stator positioned within the rotor for relative rotational movement between the stator and the rotor, the rotor including a plurality of support faces, each of the support faces having a frame mounted thereto; an electrically conductive, three-dimensional, open cell, reticulated structure heater element having a solid coating of a selected vapor deposition material vapor deposited thereon supported within each frame, the heater element capable of controllably vaporizing the solid coating; a carrier gas feed tube connected to the stator for delivering carrier gas to a delivery duct within the stator; a plurality of facet ducts in the rotor, each facet duct aligning with a respective support face, the relative rotational movement of the rotor and stator allowing the delivery duct to be aligned with any selected one of the facet ducts, the carrier gas thereby flowing through the heater element adjacent the selected facet duct.