Method for measuring polarization sensitivity of optical devices
    63.
    发明公开
    Method for measuring polarization sensitivity of optical devices 失效
    Verfahren und Apparat zur Messung der Polarisationsempfindlichkeit optischer Vorrichtungen。

    公开(公告)号:EP0536538A2

    公开(公告)日:1993-04-14

    申请号:EP92115177.5

    申请日:1992-09-04

    CPC classification number: G01M11/00 G01J4/04

    Abstract: An instrument (8) includes a polarized optical source (9) for producing three sequential predetermined states of polarization of a light beam (ℓ) and an optical polarization meter (10) for measuring the polarization of a portion (Δℓ) of the light beam (ℓ) transmitted by or reflected from an optical network (30,51,52;100) by splitting it into four beams (Δℓa - Δℓd), passing three of the beams (Δℓb - Δℓd) through optical elements, measuring the transmitted intensity of all four beams (Δℓa - Δℓd), and calculating Stokes parameters. The portion (Δℓ) of the light beam (ℓ) enters the optical polarization meter (10) through a single-mode optical fiber (11) that acts as a spatial filter for controlling the position and alignment of the beam with respect to the optical elements (12). The distortion of the light beam polarization caused by this optical fiber is corrected by introducing two different linearly polarized light beams (ℓ₁,ℓ₂) and measuring Stokes parameters which are used to construct a calibration matrix that is inverted and multiplied times measured normalized Stokes parameters of subsequent measurements to yield true Stokes parameters. The three sequential predetermined states of polarization yield three corresponding Jones input vectors, and the Stokes parameters for the responses of the optical network (30,51,52) are converted to three Jones output vectors. A Jones matrix for the optical network (30,51,52) to within a complex constant is then computed from the Jones input and output vectors. Relative polarization sensitivity can be determined from this matrix for the optical network (30,51,52). The relative distortion caused by the optical network (30,51,52) can be corrected by multiplying by the inverse of the matrix during later measurements through the optical network (30,51,52). Additionally, power measurements on the optical network (30,51,52) and a substituted optical through enable absolute determinations and corrections.

    Abstract translation: 仪器(8; 8')包括用于产生光束(P)的三个顺序的预定偏振态的偏振光源(9; 9')和用于测量光束 由光网络(30,51,52,30',51',52',100)透射或反射的光束(P)的一部分(WP),通过将其分成四个光束(WPa-WPd) 通过光学元件(14-17)通过三个光束(WPb-WPd),测量所有四个光束(WPa-WPd)的透射强度,并计算斯托克斯参数。 光束(P)的部分(WP)通过单模光纤(11)进入光偏振仪(10; 10'),该单模光纤作为空间滤光器,用于控制光束的位置和对准 到所述光学元件(12,14-17)。 通过引入两种不同的线性偏振光(P <5>,P <6>)和测量斯托克斯参数来校正由该光纤(11)引起的光束偏振的变形,该参数用于构建校准矩阵 反演和相乘时间测量后续测量的归一化斯托克斯参数,以产生真实的斯托克斯参数。 三个连续预定的极化状态产生三个对应的琼斯输入向量,光网络(30,51,52,30',51',52',100)的响应的斯托克斯参数被转换成三个琼斯输出向量 。 然后,从琼斯输入和输出向量计算一个复数常数内的光网络(30,51,52,30',51',52',100)的琼斯矩阵。 可以根据光网络(30,51,52,30',51',52',100)的矩阵来确定相对极化灵敏度。 由光网络(30,51,52,30',51',52',100)引起的相对失真可以通过在稍后测量期间通过光网络(30,51,52)乘以矩阵的倒数来校正 ; 30',51',52',100)。 此外,光网络(30,51,52,30',51',52',100)上的功率测量和经过替换的光学通过启用绝对确定和校正。

    METHOD AND MODULE FOR POLARIZATION ANALYSIS
    66.
    发明公开

    公开(公告)号:EP4194822A1

    公开(公告)日:2023-06-14

    申请号:EP21212895.3

    申请日:2021-12-07

    Abstract: It is claimed a polarization analysis module (1), preferably for quantum communication, quantum cryptography, and/or quantum key distribution (QKD), comprises a first and a second diffraction element, a wave-plate (4), and at least four single photon detectors (5), in order to enable a polarization analysis of single photons in two mutually unbiased bases and two orthogonal states per base. According to the invention, the first and second diffraction elements are polarization sensitive first and second dielectric metastructure gratings (2, 3), and the wave-plate (4) is arranged between the first and second dielectric metastructure grating (2, 3), and at least two detectors (5) are arranged in diffraction paths of the first diffraction element, and at least two detectors (5) are arranged in diffraction paths of the second diffraction element.

    SCATTEROMETRY MEASUREMENT OF ASYMMETRIC STRUCTURES

    公开(公告)号:EP3910285A1

    公开(公告)日:2021-11-17

    申请号:EP21175735.6

    申请日:2010-09-22

    Abstract: Asymmetry metrology is performed using at least a portion of Mueller matrix elements, including, e.g., the off-diagonal elements of the Mueller matrix. The Mueller matrix may be generated using, e.g., a spectroscopic or angle resolved ellipsometer (100) that may include a rotating compensator (122). The Mueller matrix is analyzed by fitting at least a portion of the elements to Mueller matrix elements calculated using a rigorous electromagnetic model of the sample (101) or by fitting the off-diagonal elements to a calibrated linear response. The use of the Mueller matrix elements in the asymmetry measurement permits, e.g., overlay analysis using in-chip devices thereby avoiding the need for special off-chip targets.

    POLARIZATION STATE ALIGNER (PSA)
    69.
    发明公开

    公开(公告)号:EP3812831A1

    公开(公告)日:2021-04-28

    申请号:EP20211976.4

    申请日:2016-03-02

    Abstract: A system comprises: a polarization state aligner (PSA) comprising: an input port; a first polarization beam splitter (PBS) coupled to the input port; a first phase shifter (PS) coupled to the first PBS; a first polarization rotator (PR) coupled to the first PBS; a first beam splitter (BS) coupled to the first PS and the first PR; a first output port coupled to the first BS; and a second output port coupled to the first BS.

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