ION SOURCE
    86.
    发明公开
    ION SOURCE 审中-公开

    公开(公告)号:EP3454359A1

    公开(公告)日:2019-03-13

    申请号:EP18192990.2

    申请日:2018-09-06

    Inventor: Cisterni, Marco

    Abstract: The object of the present invention is an ionic source, preferably the ionic source of a mass spectrometer the inner walls of which are coated with a high density graphite material.

    Mass spectrometer
    88.
    发明授权

    公开(公告)号:EP1995764B1

    公开(公告)日:2018-05-30

    申请号:EP06728825.8

    申请日:2006-03-09

    CPC classification number: H01J49/147 H01J27/205 H01J49/0468

    Abstract: An electrically conductive heat-blocking plate 11 with an opening 12 for allowing thermions to pass through is provided between a filament 3, whose temperature can be as high as 2000° to 3000°C, and an ionization chamber 2. The heat-blocking plate 11 is thermally connected via an aluminum block 10 to a heater for maintaining the ionization chamber 2 within a range temperature from 200° to 300°C, and also electrically set at a ground potential, which is approximately equal to the potential of the ionization chamber 2. The heat-blocking plate 11 blocks the radiation heat that the filament 3 emits when energized. Thus, the wall of the ionization chamber 2 is prevented from being locally heated to an abnormally high temperature. As a result, the inner space of the ionization chamber 2 is maintained at an approximately uniform temperature, and the noise due to the decomposition of a metallic material by abnormal heating is prevented. The heat-blocking plate 11 also prevents a thermion-accelerating electric field from penetrating through an electron injection port 5 into the ionization chamber 2 and impeding the extraction of ions produced within the ionization chamber 2. Thus, the ion extraction efficiency is also improved.

    GRAPHENE-ENHANCED SECONDARY ION MASS SPECTROSCOPY ANALYSIS
    89.
    发明公开
    GRAPHENE-ENHANCED SECONDARY ION MASS SPECTROSCOPY ANALYSIS 审中-公开
    石墨增强二次离子质谱分析

    公开(公告)号:EP3288061A1

    公开(公告)日:2018-02-28

    申请号:EP16461554.4

    申请日:2016-08-24

    CPC classification number: H01J49/142 G01N23/2258

    Abstract: The present invention is related to a method of analysing a solid substrate by means of Secondary lon Mass Spectroscopy (SIMS) comprising the steps of providing a graphene layer over the substrate surface, sputtering of the graphene-coated substrate in a dynamic mode (dSIMS), and detecting and analyzing ejected secondary anions by mass spectrometry analysis. The method according to the invention is useful for characterising surfaces, 2D materials, ultra-thin films, 2D and 3D imaging, depth profiling and concentration analysis, preferably for determining concentration of trace elements in a thin support.

    Abstract translation: 本发明涉及一种借助次级质谱(SIMS)分析固体基质的方法,该方法包括以下步骤:在基质表面上提供石墨烯层,以动态模式溅射石墨烯涂布的基质(dSIMS) ,并通过质谱分析检测和分析喷出的二级阴离子。 根据本发明的方法可用于表征表面,2D材料,超薄膜,2D和3D成像,深度剖析和浓度分析,优选用于确定薄载体中微量元素的浓度。

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