Gain amplifier
    3.
    发明公开
    Gain amplifier 失效
    增益放大器

    公开(公告)号:EP0138260A3

    公开(公告)日:1987-07-15

    申请号:EP84201369

    申请日:1984-09-25

    IPC分类号: H03G01/00 H03G01/04 H03F03/00

    CPC分类号: H03F1/303 H03G1/04

    摘要: A novel switched capacitor gain stage uses a unique circuit design and clocking technique that reduces the component mismatch offset voltage and the clock-induced feedthrough offset voltage produced by the circuit. The totalcapac- itance ratio between the input capacitors and the feedback capacitor necessary to achieve a desired total gain is also minimized.

    TRI-WELL CMOS TECHNOLOGY
    4.
    发明公开
    TRI-WELL CMOS TECHNOLOGY 失效
    三个桶CMOS技术。

    公开(公告)号:EP0182876A1

    公开(公告)日:1986-06-04

    申请号:EP85902890.0

    申请日:1985-05-22

    IPC分类号: H01L21 H01L27 H01L29

    摘要: Structure de semi-conducteur possédant au moins trois types de puits (65, 68, 71) qui peuvent présenter différents niveaux de dopage, et procédés de fabricaton d'une telle structure. Dans un procédé, les régions qui deviendront des dispositifs actifs sont protégées par une couche de nitrure (62) lors de l'implantation des régions de puits associées (65, 68, 71). Dans une variante, des puits implantés au préalable sont recouverts d'une épaisse couche d'oxyde (66, 69) laquelle, en combinaison avec la couche de nitrure (62) produit un alignement automatique des puits adjacents. Dans une autre variante, les puits implantés sont recouverts d'oxyde (66) alors qu'un dernier puits est implanté en étant défini par une épaisse couche d'oxyde (66) et par une photoréserve (67a). Tous les procédés éliminent une étape de masquage et le besoin d'aligner le bord d'un masque de photoréserve successif avec le bord d'un masque de photoréserve précédent. Les structures ainsi formées peuvent présenter des puits P fortement dopés, des puits N fortement dopés, et des puits P ou N légèrement dopés, ou les deux, ce qui permet de former sur la même puce des dispositifs à tension de claquage élevée et de dispositifs à basse tension de claquage.

    ROM protection scheme
    6.
    发明公开
    ROM protection scheme 失效
    ROM-Sicherungsverfahren。

    公开(公告)号:EP0162707A2

    公开(公告)日:1985-11-27

    申请号:EP85303591.3

    申请日:1985-05-21

    发明人: Bauer, Jerry R.

    IPC分类号: G06F12/14

    摘要: In order to protect, from unauthorised copying, computer code placed in internal circuitry in a computer, an encoding Exclusive-OR gate (23) is provided in the computer for each data transmission lead (8) from the respective circuitry. One input lead of each encoding Exclusive-OR gate is connected to the corresponding incoming data transmission lead (7) in order to receive data to be transmitted on accessible data lines. The other input lead of each encoding Exclusive-OR gate is connected via a code matrix (22) to a source (11) of a random M-bit binary number. The output signal provided by each Exclusive-OR gate (23) is the encoded data bit which Is applied to one of the accessible data lines (8). The encoded data is decoded by a circuit similar to the encoding circuit. In the decoding circuit a decoding Exclusive-OR gate (33) is provided for each data transmission lead (9). One input lead of each decoding Exclusive-OR gate (33) is connected to an incoming encoded data transmission lead (8). The other input lead to the decoding Exclusive-OR gate (33) is connected via a code matrix (32) which is similar to the code matrix (22) provided in the encoding circuit, to a source (II) of a random M-bit binary number, where the M-bit binary number is the same M-bit binary number provided in the encoding circuit. The output leads of the decoding Exclusive-OR gates (9) are the transmission lines which carry the decoded data. The encoding matrix (22, 32) and the random M-bit word are the same in the encoding and decoding circuit, so the data on the output leads of the Exclusive-OR gates is properly decoded. However, the data on bus lines running between integrated circuits, and which therefore may be intercepted through the use of logic probes, is in encoded form, thereby. substantially increasing the effort required to illicitly determine the data stored.

    摘要翻译: 为了防止未经授权的复制,将计算机代码放置在计算机的内部电路中,在计算机中为每个数据传输引线(8)从相应的电路提供编码异或门(23)。 每个编码异或门的一个输入引线连接到相应的输入数据传输引线(7),以便接收要在可访问数据线上传输的数据。 每个编码异或门的另一输入引线经由码矩阵(22)连接到随机M位二进制数的源(11)。 由每个异或门(23)提供的输出信号是应用于可访问数据线(8)之一的编码数据位。 编码数据由类似于编码电路的电路解码。 在解码电路中,为每个数据传输线(9)提供解码异或门(33)。 每个解码异或门(33)的一个输入引线连接到输入的编码数据传输引线(8)。 经由与编码电路中提供的代码矩阵(22)类似的代码矩阵(32)将与解码异或门(33)的另一个输入连接到随机M- 位二进制数,其中M位二进制数是在编码电路中提供的相同的M位二进制数。 解码异或门(9)的输出引线是承载解码数据的传输线。 编码矩阵(22,32)和随机M位字在编码和解码电路中是相同的,因此异或门的输出引线上的数据被适当地解码。 然而,在集成电路之间运行的并且因此可能通过使用逻辑探针而被截取的总线线路上的数据是编码形式,从而显着增加非法确定存储的数据所需的努力。

    Semiconductor memory devices and methods for making the same
    8.
    发明公开
    Semiconductor memory devices and methods for making the same 失效
    半导体存储器件及其制造方法

    公开(公告)号:EP0109853A3

    公开(公告)日:1985-06-26

    申请号:EP83307114

    申请日:1983-11-21

    IPC分类号: H01L27/10 H01L29/60

    CPC分类号: H01L27/112 H01L27/115

    摘要: An array of MOS transistors (30) formed in a semiconductor substrate having a plurality of continuous diffused lines (bit lines) (7-3, 7-4, 7-5 and 7-6) serving as the source and drain regions of a plurality of MOS transistors. A plurality of conductive word lines (33, 133) are formed over the plurality of diffused lines, crossing the diffused lines at substantially right angles, with each conductive word line serving as the gates of a plurality of MOS transistors. Each transistor of the memory array is formed in a region containing two continuous diffused lines and a single word line. A single electrical contact (36-3, 4, 5, 6) to a bit line is formed for each such diffused line.

    摘要翻译: 形成在具有多个连续扩散线(位线)(7-3,7-4,7-5和7-6)的半导体衬底中的MOS晶体管阵列(30),其用作一个 多个MOS晶体管。 多个导电字线(33,133)形成在多条扩散线上,与大致直角的扩散线交叉,每个导电字线用作多个MOS晶体管的栅极。 存储器阵列的每个晶体管形成在包含两个连续扩散线和单个字线的区域中。 为每个这样的扩散线形成位线的单个电触点(36-3,4,5,6)。

    Process of producing custom programmed read only memory
    10.
    发明公开
    Process of producing custom programmed read only memory 失效
    编程的只读一种用于生产各种定制的方法存储器(ROM)。

    公开(公告)号:EP0132033A1

    公开(公告)日:1985-01-23

    申请号:EP84303740.9

    申请日:1984-06-04

    发明人: Batra, Tarsaim L.

    IPC分类号: H01L21/82 H01L27/10

    CPC分类号: H01L27/1126

    摘要: A late mask programming process is provided for factory programmed ROMs or logic circuitry. MOS transistors functioning as ROM cells or in logic circuitry are fabricated by a standard MOS Process. Then, a thin stop layer of silicon nitride is provided over the transistors and followed by a layer of silicon dioxide. Programming is accomplished by applying a program mask and etching through the layers overlying the gate regions of selected transistors down to the silicon nitride stop layer. The silicon nitride stop layer prevents overetching and shorting of the gates. Then, ions are implanted underneath the gates of the selected MOS transistors to alter their threshold so, for example, as ROM cells they signify a different state than those cells whose transistor gates are not implanted with ions. The silicon nitride layer serves to stop the etch solution but permits the ions to pass through, penetrate the substrate and raise the thresholds of the selected transistors. The silicon dioxide layer stops the ions from being implanted into the nonselected transistors.