公开(公告)号：EP1695367A1

公开(公告)日：2006-08-30

申请号：EP03818358.8

申请日：2003-08-20

申请人： Cdream Display Corporation

发明人： CHANG, Chul, Ha ,  GU, Kang, Sung

IPC分类号： H01J1/02 ,  H01J1/30 ,  H01J1/304

CPC分类号： B82Y10/00 ,  H01J1/3048 ,  H01J2201/30469

摘要： An electron-emitting device contains an emitter resistor layer (125) patterned into multiple laterally separated sections situated between the electron-emissive elements (155), on one hand, and emitter electrodes (120), on the other hand. Sections of the seed layer (130) are spaced apart along each emitter electrode (120) to electrically decouple electron emission elements (155) disposed on the resistor layer (125).

公开(公告)号：EP1563122A2

公开(公告)日：2005-08-17

申请号：EP03789997.8

申请日：2003-11-21

申请人： Cdream Display Corporation

发明人： KANG, Sung, Gu ,  BAE, Craig

IPC分类号： C30B29/04 ,  C30B29/06

CPC分类号： C30B25/00 ,  B82Y30/00 ,  C30B29/605 ,  C30B33/12 ,  Y10S977/843 ,  Y10S977/844 ,  Y10S977/845

摘要： Carbon nanotubes are formed on a surface of a substrate using a plasma chemical deposition process. After the nanotubes have been grown, a post-treatment step is performed on the newly formed nanotube structures. The post-­treatment removes graphite and other carbon particles from the walls of the grown nanotubes and controls the thickness of the nanotube layer. The post-treatment is performed with the plasma at the same substrate temperature. For the post-treatment, the hydrogen containing gas is used as a plasma source gas. During the transition from the nanotube growth stop to the post treatment step, the pressure in the plasma process chamber is stabilized with the aforementioned purifying gas without shutting off the plasma in the chamber. This eliminates the need to purge and evacuate the plasma process chamber.

公开(公告)号：EP1563121A2

公开(公告)日：2005-08-17

申请号：EP03789929.1

申请日：2003-11-21

申请人： Cdream Display Corporation

发明人： KANG, Sung, Gu ,  BAE, Craig

IPC分类号： C30B23/00

CPC分类号： C30B25/105 ,  B82Y30/00 ,  C30B29/605 ,  Y10S977/843 ,  Y10S977/844 ,  Y10S977/845

摘要： Carbon nanotubes are formed on a surface of a substrate using a plasma chemical deposition process. After the nanotubes have been grown, a purification step is performed on the newly formed nanotube structures. The purification removes graphite and other carbon particles from the walls of the grown nanotubes and controls the thickness of the nanotube layer. The purification is performed with the plasma at the same substrate temperature. For the purification, the hydrogen containing gas added as an additive to the source gas for the plasma chemical deposition is used as the plasma source gas. Because the source gas for the purification plasma is added as an additive to the source gas for the chemical plasma deposition, the grown carbon nanotubes are purified by reacting with the continuous plasma which is sustained in the plasma process chamber. This eliminates the need to purge and evacuate the plasma process chamber as well as to stabilize the pressure with the purification plasma source gas. Accordingly, the growth and the purification may be performed without shutting off the plasma in the plasma process chamber.

摘要翻译： 使用等离子体化学沉积工艺在衬底的表面上形成碳纳米管。 - 纳米管生长后，在新形成的纳米管结构上进行纯化步骤。 纯化从生长的纳米管壁去除石墨和其他碳颗粒并控制纳米管层的厚度。 在相同的基底温度下用等离子体进行纯化。 为了净化，将用作等离子体化学沉积的源气体作为添加剂添加的含氢气体用作等离子体源气体。 因为用于纯化等离子体的源气体作为添加剂添加到用于化学等离子体沉积的源气体中，所生长的碳纳米管通过与在等离子体处理室中维持的连续等离子体反应而被净化。 这消除了清洗和排空等离子体处理室以及使用净化等离子体源气体稳定压力的需要。 因此，可以执行生长和纯化而不关闭等离子体处理室中的等离子体。

公开(公告)号：EP1547114A2

公开(公告)日：2005-06-29

申请号：EP03815183.3

申请日：2003-08-20

申请人： Cdream Display Corporation

发明人： KANG, Simon ,  BAE, Craig ,  KIM, jung, Jao

IPC分类号： H01J1/05

CPC分类号： B82Y10/00 ,  H01J1/3048 ,  H01J9/025 ,  H01J2201/30469 ,  Y10S977/952

摘要： A flat panel display and a method for forming a carbon nanotube based flat panel display. In one embodiment, the flat panel display includes a barrier layer formed between a catalyst layer upon which microstructures of carbon nanotubes are formed and a resistor layer. The barrier layer acts as an anti diffusion layer between the catalysts layer and the resistor layer to prevent the catalyst layer from diffusing into the resistor layer during the growing of the carbon nanotubes. The barrier layer also enhances the adhesion characteristics of the catalyst layers to enable the uniform growth of the carbon nanotube structures on the catalyst layer.

公开(公告)号：EP1695366A1

公开(公告)日：2006-08-30

申请号：EP03818357.0

申请日：2003-08-20

申请人： Cdream Display Corporation

发明人： CHANG, Chul, Ha ,  SON, Jong, Woo ,  KIM, Jung, Jae

IPC分类号： H01J1/02

CPC分类号： H01J9/025 ,  B82Y10/00 ,  H01J1/304 ,  H01J2201/30469 ,  H01J2329/0455

摘要： An electron-emitting device contains an emitter seed layer (120) patterned into multiple laterally separated sections situated between the electron-emissive elements (140), on one hand, and emitter electrodes (110), on the other hand. Sections of the seed layer are spaced apart along each emitter electrode (110) to electrically decouple electron emission elements disposed on the seed layer (120).

公开(公告)号：EP1573794A1

公开(公告)日：2005-09-14

申请号：EP03800046.9

申请日：2003-12-19

申请人： Cdream Display Corporation ,  SANYO ELECTRIC CO., LTD.

发明人： SONG, Jong Woo ,  CHANG, Chul Ha ,  KIM, Jung-Jae ,  SUZUKI, Koji ,  KUWAHARA, Takashi

IPC分类号： H01L21/302

CPC分类号： B82Y30/00 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/162 ,  H01J9/025 ,  H01J2201/30469 ,  H01L21/32134

摘要： An electron-emitting device including a protective layer that is formed on a catalyst layer to protect the catalyst layer from the deleterious environmental conditions before or during a cathode process. The present invention further includes a half etching process that is adapted to partially remove portions of the protective layer from the catalyst layer to etch the catalyst layer except carbon nano-tube growing portions. Portions of the protective layer still remain on the catalyst layer to protect the catalyst layer from the deleterious conditions from next cathode formation process.