Method for the deposition of films of mixed oxides on composite material substrates
    1.
    发明公开
    Method for the deposition of films of mixed oxides on composite material substrates 有权
    Verfahren zur Abscheidung von Mischoxiden auf Verbundmaterial-Substraten

    公开(公告)号:EP2886678A1

    公开(公告)日:2015-06-24

    申请号:EP14199052.3

    申请日:2014-12-18

    申请人: EDISON S.p.A.

    摘要: In a method for the deposition of a film of mixed oxide on a composite material substrate, a step of evaporation-deposition of the mixed oxide, carried out with the aid of an electron beam sent to a target of mixed oxide having the same stoichiometric composition as the film to deposit, is carried out at an increasing deposition rate, measured on the substrate; in particular, the evaporation-deposition step comprises at least one first step of growth carried out at a deposition rate lower than or equal to a predetermined threshold, and at least one second step of growth carried out at a deposition rate higher than the threshold.

    摘要翻译: 在用于在复合材料基板上沉积混合氧化物膜的方法中,借助于发送到具有相同化学计量组成的混合氧化物靶的电子束进行蒸发沉积混合氧化物的步骤 作为沉积膜,以增加的沉积速率进行,在基底上测量; 特别地,蒸发沉积步骤包括以低于或等于预定阈值的沉积速率进行生长的至少一个第一步骤,以及以高于阈值的沉积速率进行的生长的至少一个第二步骤。

    A method for the deposition of a film of a manganese/cobalt mixed oxide on a metallic substrate
    4.
    发明公开
    A method for the deposition of a film of a manganese/cobalt mixed oxide on a metallic substrate 有权
    Verfahren zur Abscheidung eines Films eines Mangan- / Kobaltmischoxids auf einem metallischen Substrat

    公开(公告)号:EP2684977A1

    公开(公告)日:2014-01-15

    申请号:EP13175966.4

    申请日:2013-07-10

    申请人: Edison S.p.A.

    IPC分类号: C23C14/16 C23C14/58 H01M8/02

    摘要: The invention relates to a method for the formation of a protective film comprising a spinel of formula Mn x Co y O 4-δ , where x+y=3, on a metallic substrate, characterised in that it comprises the steps of:
    a) depositing on the substrate manganese and cobalt as metal species in a molar ratio x/y corresponding to the above-mentioned formula by thermal co-evaporation; and
    b) oxidising in situ the metal species to form the spinel. The method is applied in particular for the coating of metal interconnections for solid oxide fuel cells (SOFC).

    摘要翻译: 本发明涉及在金属基底上形成包含式Mn x Co y O 4-'尖晶石的保护膜的方法,其中x + y = 3,其特征在于它包括以下步骤:a) 通过热共蒸发,以与上述式相对应的摩尔比x / y作为金属物质沉积在基底上的锰和钴; 和b)原位氧化金属物质以形成尖晶石。 该方法特别用于固体氧化物燃料电池(SOFC)的金属互连涂层。

    Method for the deposition of films of mixed oxides on composite material substrates
    7.
    发明公开
    Method for the deposition of films of mixed oxides on composite material substrates 有权
    用于在复合材料基底上沉积混合氧化物膜的方法

    公开(公告)号:EP2886678A8

    公开(公告)日:2015-10-28

    申请号:EP14199052.3

    申请日:2014-12-18

    申请人: EDISON S.p.A.

    摘要: In a method for the deposition of a film of mixed oxide on a composite material substrate, a step of evaporation-deposition of the mixed oxide, carried out with the aid of an electron beam sent to a target of mixed oxide having the same stoichiometric composition as the film to deposit, is carried out at an increasing deposition rate, measured on the substrate; in particular, the evaporation-deposition step comprises at least one first step of growth carried out at a deposition rate lower than or equal to a predetermined threshold, and at least one second step of growth carried out at a deposition rate higher than the threshold.

    摘要翻译: 在用于在复合材料基底上沉积混合氧化物膜的方法中,借助于发送到具有相同化学计量组成的混合氧化物靶的电子束进行混合氧化物的蒸发沉积步骤 作为要沉积的膜,以在衬底上测量的增加的沉积速率进行; 特别地,蒸发沉积步骤包括以低于或等于预定阈值的沉积速率进行的至少一个第一生长步骤和以高于阈值的沉积速率进行的至少一个第二生长步骤。