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公开(公告)号：EP3595864A1
公开(公告)日：2020-01-22
申请号：EP18766926.2
申请日：2018-03-15
Applicant: Molecular Imprints, Inc.
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公开(公告)号：EP3548424A1
公开(公告)日：2019-10-09
申请号：EP17877037.6
申请日：2017-09-14
Applicant: Molecular Imprints, Inc.
Inventor： SINGH, Vikramjit , MILLER, Michael Nevin , XU, Frank Y.
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公开(公告)号：EP2529274B1
公开(公告)日：2014-10-08
申请号：EP11704694.6
申请日：2011-01-31
Applicant: Canon Nanotechnologies, Inc. , Molecular Imprints, Inc. , The Board of Regents, University of Texas System
Inventor： XU, Frank Y. , SREENIVASAN, Sidlgata V. , Shuqiang, Yang
IPC: G03F7/00
CPC classification number: G03F7/0002 , B82Y10/00 , B82Y40/00
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公开(公告)号：EP2635419A2
公开(公告)日：2013-09-11
申请号：EP11838943.6
申请日：2011-11-07
Inventor： SREENIVASAN, Sidlgata V. , SINGH, Vikramjit , XU, Frank Y. , CHOI, Byung-Jin
CPC classification number: B29C59/022 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L29/0673
Abstract: Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles.
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5.发明授权METHOD AND SYSTEM TO CONTROL MOVEMENT OF A BODY FOR NANO-SCALE MANUFACTURING 有权方法和系统用于控制主体的运动纳米规模化生产
公开(公告)号：EP1754122B1
公开(公告)日：2012-10-31
申请号：EP05757972.4
申请日：2005-05-27
Applicant: MOLECULAR IMPRINTS, INC.
Inventor： CHOI, Byung-Jin , SREENIVASAN, Sidlgata V.
CPC classification number: G03F7/0002 , B29C43/021 , B29C2043/025 , B29C2043/5858 , B82Y10/00 , B82Y40/00 , G03F9/00 , Y10T74/20341 , Y10T74/20348 , Y10T74/20354
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Patent Agency Ranking6.发明授权STRAIN AND KINETICS CONTROL DURING SEPARATION PHASE OF IMPRINT PROCESS 有权电压和KINETIKSTEUERUNG印刷工艺的分离阶段期间
公开(公告)号：EP2350741B1
公开(公告)日：2012-08-29
申请号：EP09748532.0
申请日：2009-10-26
Applicant: MOLECULAR IMPRINTS, INC.
Inventor： KHUSNATDINOV, Niyaz , XU, Frank, Y. , MEISSL, Mario, Johannes , MILLER, Michael, N. , THOMPSON, Ecron , SCHMID, Gerard , NIMMAKAYALA, Pawan, K. , LU, Xiaoming , CHOI, Byung-Jin
IPC: G03F7/00
CPC classification number: B29C37/0003 , B82Y10/00 , B82Y40/00 , G03F7/0002
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公开(公告)号：EP1957249A4
公开(公告)日：2012-07-25
申请号：EP06844789
申请日：2006-11-30
Applicant: MOLECULAR IMPRINTS INC
Inventor： CHOI BYUNG-JIN , SREENIVASAN SIDLGATA V
CPC classification number: G03F7/70425 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , Y10S977/887
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公开(公告)号：EP2262592A4
公开(公告)日：2012-07-11
申请号：EP09726571
申请日：2009-04-01
Applicant: MOLECULAR IMPRINTS INC , UNIV TEXAS
Inventor： SREENIVASAN SIDLGATA V , SINGHAL SHRAWAN , CHOI BYUNG-JIN , MCMACKIN IAN M
CPC classification number: G03F7/0002 , B82Y10/00 , B82Y40/00
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公开(公告)号：EP2250020A4
公开(公告)日：2012-07-11
申请号：EP09716103
申请日：2009-02-26
Applicant: MOLECULAR IMPRINTS INC
Inventor： BROOKS CYNTHIA B , LABRAKE DWAYNE L , KHUSNATDINOV NIYAZ , MILLER MICHAEL N , SREENIVASAN SIDLGATA V , LENTZ DAVID JAMES , XU FRANK Y
CPC classification number: G03F7/0002 , B82Y10/00 , B82Y40/00
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10.发明公开Method and system for determining characteristics of substrates employing fluid geometries 有权方法和系统，用于确定与液体几何形状衬底的性质
公开(公告)号：EP2418544A3
公开(公告)日：2012-04-04
申请号：EP11187815.3
申请日：2003-12-12
Applicant: Molecular Imprints, Inc.
Inventor： Choi, Byung-Jin , Sreenivasan, Sidlgata V.
IPC: G03F7/00
CPC classification number: G03F7/0002 , B82Y10/00 , B82Y40/00
Abstract: The present invention provides a technique for determining characteristics of substrates, such as the presence of contaminants. The technique includes forming a volume of fluid on the second substrate, with the volume of fluid having an area associated therewith. The volume of fluid is compressed between the first and second substrates to effectuate a change in properties of the area, defining changed properties. The changed properties are sensed, and the characteristics of the first and second substrates are determined as a function of the changed properties.
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