POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION, ACTIVE MATRIX SUBSTRATE, DISPLAY DEVICE, AND METHOD FOR PRODUCING ACTIVE MATRIX SUBSTRATE
    1.
    发明公开
    POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION, ACTIVE MATRIX SUBSTRATE, DISPLAY DEVICE, AND METHOD FOR PRODUCING ACTIVE MATRIX SUBSTRATE 审中-公开
    正性光敏硅氧烷组合物,有源矩阵衬底,显示装置和生产有源矩阵衬底的方法

    公开(公告)号:EP3255494A1

    公开(公告)日:2017-12-13

    申请号:EP16746667.1

    申请日:2016-02-03

    摘要: The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate 30 includes a plurality of gate wirings 11 provided so as to extend parallel to each other on an insulating substrate 10, and a plurality of source wirings 12 provided so as to extend parallel to each other in a direction intersecting the respective gate wirings 11. An interlayer insulating film 14 and a gate insulating film 15 are interposed at portions including the intersecting portions of the gate wirings 11 and the source wirings 12, on a lower side of the source wiring 12. The interlayer insulating film 14 is formed using the positive type photosensitive siloxane composition without using a resist.

    摘要翻译: 本发明提供一种正型光敏硅氧烷组合物,其中由其形成的膜具有高耐热性,高强度和高抗裂性,其中不产生副产物的有源矩阵基板,抑制了缺陷的发生, 以低成本容易地形成层间绝缘膜,同时具有良好的透射率,包括有源矩阵基板的显示装置以及有源矩阵基板的制造方法。 有源矩阵基板30具备:在绝缘基板10上相互平行地延伸设置的多个栅极配线11;以及在与各栅极交叉的方向上相互平行地延伸设置的多个源极配线12 布线11.在源极布线12的下侧,在包括栅极布线11和源极布线12的交叉部分的部分处插入层间绝缘膜14和栅极绝缘膜15.层间绝缘膜14形成 使用正型光敏硅氧烷组合物而不使用抗蚀剂。