公开(公告)号：EP4235741A1

公开(公告)日：2023-08-30

申请号：EP22461517.9

申请日：2022-02-28

Applicant: TRUMPF Huettinger Sp. Z o. o.

Inventor： The designation of the inventor has not yet been filed

IPC: H01J37/32 ,  C23C14/34 ,  H01J37/34 ,  H03K3/00 ,  H03K4/00

Abstract: High-power- (HP-) generator (10) and method to deliver pulsed high power with a high value of voltage and/or high current value to a capacitive load, in particular to a plasma process, comprising:
- several low-power- (LP-) generators (14, 16 ,18),
∘ each LP-generator (14, 16, 18) comprising an energy storage component (C1, L1), wherein in use the energy storage component (C1, L1) is charged to a predefined value related to the energy storage component,
∘ each LP-generator (14, 16, 18) supplying, in use, at its output an LP-generator-value which corresponds to the value of the energy storage component (C1, C2, Cn L1, L2, Ln) incorporated in the respective LP-generator (14, 16, 18),

- a coupling (20) in which the LP-generators (14, 16, 18) are electrically connected such that a coupling-value at the output of the coupling (20), which corresponds to the output value of the HP-generator (10), may be obtained, and which is, in use, at least in some states of the HP-generator (10) higher than the LP-generator-value at the output of one of the LP-generators (14, 16, 18),
- a control unit (22) configured to select the contribution of LP-generators (14, 16, 18) to the output value of the HP-generator (10) during power delivery of the HP-generator (10), in order to generate a rise and/or decay of a pulse at the output of the coupling (20),
- the control unit (22) is further configured to select the contribution of LP-generators (14, 16, 18) in a galvanically isolated way, in particular via a fiber optic connection or magnetically coupling.

公开(公告)号：EP4035195A1

公开(公告)日：2022-08-03

申请号：EP20786441.4

申请日：2020-09-23

Applicant: TRUMPF Huettinger Sp. Z o. o.

Inventor： GAJEWSKI, Wojciech ,  RUDA, Krzysztof ,  SWIATNICKI, Jakub

IPC: H01J37/32 ,  H01J37/34

公开(公告)号：EP3952083A1

公开(公告)日：2022-02-09

申请号：EP20461558.7

申请日：2020-08-06

Applicant: TRUMPF Huettinger Sp. Z o. o.

Inventor： Klimczak, Andrzej ,  Gieraltowski, Andrzej ,  Balcerak, Michal

IPC: H02M1/088 ,  H02M1/34

Abstract: Method of balancing the voltage distribution over the switches (S1, S2, Si, Sn) connected in series in an HV switch (HVS), wherein a snubber arrangement (10, 10',', 12, 12', 14, 14') is associated with each switch (S1, S2, Si, Sn), comprising the steps of:
a. Determining a first quantity related to the snubber arrangement (10, 10', 12, 12', 14, 14') of a first switch (S1),
b. Adjusting the drive signal (6) of the first switch (S1) based on the first quantity.

公开(公告)号：EP3605842A1

公开(公告)日：2020-02-05

申请号：EP18461596.1

申请日：2018-08-02

Applicant: TRUMPF Huettinger Sp. Z o. o.

Inventor： Ozimek, Pawel ,  Klimczak, Andrzej ,  Golan, Marcin

IPC: H03H7/42 ,  H03F3/24

Abstract: A balun (100) provides
a. a balanced signal port (110) comprising a first connection (130) and a second connection (140) and
b. a single-ended (120) signal port comprising a third connection (150) and a fourth connection (160), the fourth connection being connected to ground (30),
the balun (100) comprising
c. a first capacitor (170, 170') between the first connection (130) and a first end (210) of a first resistor (190) and
d. a second capacitor (180, 180') between the second connection 140) and the first end (210) of the first resistor (190),
e. a second end (220) of the first resistor (190) being connected to ground (30).

公开(公告)号：EP3234980A1

公开(公告)日：2017-10-25

申请号：EP15817182.7

申请日：2015-12-15

Applicant: TRUMPF Huettinger Sp. Z o. o.

Inventor： GAPIÑSKI, Cezary ,  GIERALTOWSKI, Andrzej ,  GRABOWSKI, Adam ,  LACH, Piotr ,  ZELECHOWSKI, Marcin

IPC: H01J37/32

CPC classification number: H01J37/32944

Abstract: A plasma power supply (10) for supplying a plasma process in a plasma chamber(30) with a power comprises: a. a DC-Source (15); b. an output signal generator (16) connected to the DC source (15); c. a first signal sequence measurement device (20) for measuring a signal sequence present between the DC source (15) and the output signal generator (16); d. a second signal sequence measurement device (18, 19) for measuring a signal sequence present at the output of the output signal generator (16); f. a control unit (14), which is connected to the first and second signal sequence measurement devices (18, 19, 20).

Abstract translation: 等离子体电源（10）用于在等离子体腔室（30）中以功率供应等离子体工艺包括：a。 DC源（15）; 湾 连接到DC源（15）的输出信号发生器（16）; C。 第一信号序列测量装置（20），用于测量存在于DC源（15）和输出信号发生器（16）之间的信号序列; d。 第二信号序列测量装置（18,19），用于测量出现在输出信号发生器（16）输出端的信号序列; 即 控制单元（14），其连接到第一和第二信号序列测量装置（18,19,20）。

公开(公告)号：EP4487358A1

公开(公告)日：2025-01-08

申请号：EP23706643.6

申请日：2023-02-28

Applicant: TRUMPF Huettinger Sp. Z o. o.

Inventor： KLIMCZAK, Andrzej ,  GIERALTOWSKI, Andrzej ,  BALCERAK, Michal

IPC: H01J37/32 ,  C23C14/34 ,  H01J37/34 ,  H03K3/00 ,  H03K4/00

公开(公告)号：EP4465782A1

公开(公告)日：2024-11-20

申请号：EP23460018.7

申请日：2023-05-19

Applicant: TRUMPF Huettinger Sp. Z o. o.

Inventor： The designation of the inventor has not yet been filed

IPC: H05K7/20

Abstract: An electronic device (10), in particular a high power (HP), high voltage (HV) pulsed power supply for biasing a substrate in a plasma process, said electronic device (10) comprising:
- a plurality of electrical components (15) capable to generate heat when the device (10) is in use,
- a container (12), wherein at least a part of said plurality of electrical components (15) are placed,
- an electrically insolating heat transfer liquid (13), filled within said container (12) and having direct contact to the electrical components (15) to transport heat away from those electrical components (15) and to enhance the electrical insolation between those electrical components (15) in comparison to the electrical insolation of air and said liquid (13) being enclosed in a hermetical closed volume (17), this hermetical closed volume (17) is arranged at least partly inside the container (12) and kept in a predetermined regulated pressure area.

公开(公告)号：EP4465781A1

公开(公告)日：2024-11-20

申请号：EP23460017.9

申请日：2023-05-19

Applicant: TRUMPF Huettinger Sp. Z o. o.

Inventor： The designation of the inventor has not yet been filed

IPC: H05K7/20

Abstract: An electronic device (10), in particular a high power (HP), high voltage (HV) pulsed power supply for biasing a substrate in a plasma process, said electronic device (10) comprising:
- a plurality of electrical components (15) capable to generate heat when the device (10) is in use,
- a container (12), wherein at least a part of said plurality of electrical components (15) are placed,
- an electrically insolating heat transfer liquid (13), filled within said container (12) and having direct contact to the electrical components (15) to transport heat away from those electrical components (15) and to enhance the electrical insolation between those electrical components in comparison to the electrical insolation of air, the liquid (13) being enclosed in the container, so that it has no contact with extraneous gas outside the container, and the liquid has been degassed before the start of operation.

公开(公告)号：EP4235740A1

公开(公告)日：2023-08-30

申请号：EP22461516.1

申请日：2022-02-28

Applicant: TRUMPF Huettinger Sp. Z o. o.

Inventor： KLIMCZAK, Andrzej ,  GIERALTOWSKI, Andrzej ,  BALCERAK, Michal

IPC: H01J37/32 ,  H01J37/34 ,  C23C14/34 ,  C23C16/515 ,  H03K3/00 ,  H03K4/00

Abstract: High-power- (HP-) generator (10) and method to deliver pulsed high power with a high value of voltage and/or high current value to a capacitive load, in particular to a plasma process, comprising:
- several low-power- (LP-) generators (14, 16 ,18),
∘ each LP-generator (14, 16, 18) comprising an energy storage component (C1, L1), wherein in use the energy storage component (C1, L1) is charged to a predefined value related to the energy storage component,
∘ each LP-generator (14, 16, 18) supplying, in use, at its output an LP-generator-value which corresponds to the value of the energy storage component (C1, C2, Cn L1, L2, Ln) incorporated in the respective LP-generator (14, 16, 18),

- a coupling (20) in which the LP-generators (14, 16, 18) are electrically connected such that a coupling-value at the output of the coupling (20), which corresponds to the output value of the HP-generator (10), may be obtained, and which is, in use, at least in some states of the HP-generator (10) higher than the LP-generator-value at the output of one of the LP-generators (14, 16, 18),
- a control unit (22) configured to select the contribution of LP-generators (14, 16, 18) to the output value of the HP-generator (10) during power delivery of the HP-generator (10), in order to generate a rise and/or decay of a pulse at the output of the coupling (20), wherein the charging energy of the LP-generators (14, 16, 18) is supplied over a transformer (T1, T2, ..Tn), with a primary winding (P1, P2, .. Pn), and a secondary winding (SW1, SW2, .. SWn) for each LP-generator (14, 16, 18)

公开(公告)号：EP4235737A1

公开(公告)日：2023-08-30

申请号：EP22461513.8

申请日：2022-02-28

Applicant: TRUMPF Huettinger Sp. Z o. o.

Inventor： The designation of the inventor has not yet been filed

IPC: H01J37/32 ,  H01J37/34 ,  C23C14/34 ,  C23C16/515 ,  H03K3/00 ,  H03K4/00

Abstract: High-power- (HP-) generator (10) and method to deliver pulsed high power with a high value of voltage and/or high current value to a capacitive load, in particular to a plasma process, comprising:
- several low-power- (LP-) generators (14, 16 ,18),
∘ each LP-generator (14, 16, 18) comprising an energy storage component (C1, L1), wherein in use the energy storage component (C1, L1) is charged to a predefined value related to the energy storage component,
∘ each LP-generator (14, 16, 18) supplying, in use, at its output an LP-generator-value which corresponds to the value of the energy storage component (C1, C2, Cn L1, L2, Ln) incorporated in the respective LP-generator (14, 16, 18),

- a coupling (20) in which the LP-generators (14, 16, 18) are electrically connected such that a coupling-value at the output of the coupling (20), which corresponds to the output value of the HP-generator (10), may be obtained, and which is, in use, at least in some states of the HP-generator (10) higher than the LP-generator-value at the output of one of the LP-generators (14, 16, 18),
- a control unit (22) configured to select the contribution of LP-generators (14, 16, 18) to the output value of the HP-generator (10) during power delivery of the HP-generator (10), in order to generate a rise and/or decay of a pulse at the output of the coupling (20),
- the control unit (22) may be further configured to select the contribution of the LP-generators (14, 16, 18) in a sequenced way through the LP-generators (14, 16, 18), in particular each pulse sequence may begin on a different LP-generator (14, 16, 18).