PLASMA DEVICE AND PLASMA GENERATING METHOD
    2.
    发明公开
    PLASMA DEVICE AND PLASMA GENERATING METHOD 审中-公开
    PLASMAEINRICHTUNG UND PLASMEERZEUGUNGSVERFAHREN

    公开(公告)号:EP1361782A1

    公开(公告)日:2003-11-12

    申请号:EP02715809.6

    申请日:2002-01-18

    CPC分类号: H01J37/32192 H01J37/3244

    摘要: A plasma device includes a slot antenna (30) for supplying a high frequency electromagnetic field (F) supplied through a feeding part into a processing vessel (11). The feeding part has a cavity (35) for forming a resonator and converting the fed high frequency electromagnetic field (F) into a rotating electromagnetic field and supplying the rotating electromagnetic field to the slot antenna (30).

    摘要翻译: 等离子体装置包括用于将通过馈送部分供应的高频电磁场(F)提供到处理容器(11)中的缝隙天线(30)。 馈电部分具有用于形成谐振器的空腔(35),并将馈送的高频电磁场(F)转换成旋转的电磁场,并将旋转的电磁场提供给缝隙天线(30)。