摘要:
A plasma device, comprising a slot antenna (30) for feeding a high frequency electromagnetic field (F) fed through a feeding part into a processing container (11), the feeding part further comprising a cavity (35) forming an oscillator and converting the fed high frequency electromagnetic field (F) to a rotating electromagnetic field and feeding the rotating electromagnetic field to the slot antenna (30).
摘要:
A plasma device includes a slot antenna (30) for supplying a high frequency electromagnetic field (F) supplied through a feeding part into a processing vessel (11). The feeding part has a cavity (35) for forming a resonator and converting the fed high frequency electromagnetic field (F) into a rotating electromagnetic field and supplying the rotating electromagnetic field to the slot antenna (30).