摘要:
A semiconductor module (10) comprises a semiconductor chip (12) comprising a Si base layer (14) and a SiC epitaxy layer (16) on the Si base layer (14), the SiC epitaxy layer (16) comprising a semiconductor element (17); an electrical conducting top layer (Mo) (24) for providing an electrical contact of the semiconductor module (10) on a side of the SiC epitaxy layer (16); an electrical conducting bottom layer (Mo) (22) for providing an electrical contact of the semiconductor module (10) on a side of the Si base layer (14); and a failure mode layer (26, 26a, 26b) in contact with a top and/or bottom surface (18, 20) of the semiconductor chip (12) and arranged between the top layer (24) and the bottom layer (22), the failure mode layer (26, 26a, 26b) comprising a metal material (Al, Cu, Ag, Au) (27) adapted for forming a conducting path with the Si base layer (14), for example for forming a eutectic alloy with the Si base layer (14), to short-circuit the semiconductor module (10). The failure mode layer (26, 26b) at the bottom surface (20) of the semiconductor chip (12) may be coated to a core (30) of the bottom layer (22).
摘要:
A power semiconductor device includes a Si chip providing a Si switch and a wide bandgap material chip providing a wide bandgap material switch, wherein the Si switch and the wide bandgap material switch are electrically connected in parallel. A method for controlling a power semiconductor device includes: during a normal operation mode, controlling at least the wide bandgap material switch for switching a current through the power semiconductor device by applying corresponding gate signals to at least the wide bandgap material switch; sensing a failure in the power semiconductor device; and, in the case of a sensed failure, controlling the Si switch by applying a gate signal, such that a current is generated in the Si chip heating the Si chip to a temperature forming a permanent conducting path through the Si chip.
摘要:
A power semiconductor device includes a base plate; a Si chip including a Si substrate, the Si chip attached to the base plate; a first metal preform pressed with a first press pin against the Si chip; a wide bandgap material chip comprising a wide bandgap substrate and a semiconductor switch provided in the wide bandgap substrate, the wide bandgap material chip attached to the base plate; and a second metal preform pressed with a second press pin against the wide bandgap material chip; the Si chip and the wide bandgap material chip are connected in parallel via the base plate and via the first press pin and the second press pin; the first metal preform is adapted for forming a conducting path through the Si chip, when heated by an overcurrent; and the second metal preform is adapted for forming an temporary conducting path through the wide bandgap material chip or an open circuit, when heated by an overcurrent.