公开(公告)号：EP2223910A4

公开(公告)日：2011-09-07

申请号：EP07860061

申请日：2007-12-25

申请人： ADEKA CORP

发明人： SAWAMOTO DAISUKE ,  TOMINAGA NOBUHIDE

IPC分类号： C07C251/66 ,  C07C251/62 ,  C07C255/64 ,  C07C323/47 ,  C07C323/63 ,  C07C391/02 ,  C07D209/86 ,  C07D215/18 ,  C07D303/16 ,  C07D303/22 ,  C07D307/91 ,  C07D327/08 ,  C07D333/76 ,  C07D345/00 ,  C07F9/50 ,  C08F2/50 ,  C08L101/00

CPC分类号： C08F2/50 ,  B33Y70/00 ,  C07C251/62 ,  C07C251/66 ,  C07C323/47 ,  C07C323/63 ,  C07C391/02 ,  C07C2603/18 ,  C07D209/86 ,  C07D215/18 ,  C07D303/16 ,  C07D303/22 ,  C07D307/91 ,  C07D327/08 ,  C07D333/76 ,  C07D345/00 ,  C07F9/5022 ,  G03F7/0007 ,  G03F7/031

公开(公告)号：EP2829534A4

公开(公告)日：2015-12-30

申请号：EP13764684

申请日：2013-03-05

申请人： ADEKA CORP

发明人： OISHI TAKEO ,  KIMIJIMA KOICHI ,  TOMINAGA NOBUHIDE ,  SHINANO HIROKATSU ,  SAWAMOTO DAISUKE ,  MURATA KIYOSHI

IPC分类号： C07D209/86 ,  C07D209/88 ,  C07D401/12 ,  C07D403/12 ,  G03F7/004 ,  G03F7/028 ,  G03F7/031 ,  G03F7/038

CPC分类号： G03F7/0045 ,  C07D209/86 ,  C07D209/88 ,  C07D211/70 ,  C07D233/06 ,  C07D241/06 ,  C07D401/12 ,  C07D403/12 ,  G03F7/038

摘要： A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator comprising at least one compound (1) and (B) a photosensitive resin are provided. Preferred are the compound (1) in which R 1 is an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, the compound (1) in which at least one of R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 is nitro, and the compound (1) in which n is 0. The symbols in general formula (1) are as defined in the description.