公开(公告)号：EP1100112A1

公开(公告)日：2001-05-16

申请号：EP99122582.2

申请日：1999-11-12

申请人： Advantest Corporation

发明人： Kintaka, Akira ,  Seyama, Masahiro ,  Frosien, Jürgen, Dr.

IPC分类号： H01J49/46 ,  H01J49/48 ,  G01R31/305

CPC分类号： H01J49/488 ,  H01J37/10 ,  H01J37/244 ,  H01J37/252

摘要： Spectrometer objective for a particle beam measuring system with an objective lens and a retarding field spectrometer which form a particle beam optical unit for focussing a primary particle beam, wherein the retarding field spectrometer comprises an extraction electrode arrangement for extracting secondary particles from a specimen, an acceleration electrode arrangement for accelerating the secondary particles in the direction of the objective lens, a retarding field electrode arrangement for establishing a potential barrier which retards the secondary particles and means for charging the first electrode arrangement with at least two different voltages for adjustment of the extraction field strength. Furthermore, there are means for charging the acceleration electrode arrangement dependent on the voltage of the extraction electrode arrangement to form a secondary particle bundle being adapted for passing the retarding field electrode arrangement.

摘要翻译： 用于具有物镜和延迟场光谱仪的粒子束测量系统的光谱仪物镜，其形成用于聚焦初级粒子束的粒子束光学单元，其中所述延迟场光谱仪包括用于从样本中提取二次粒子的提取电极装置， 用于在物镜的方向上加速二次粒子的加速电极装置，用于建立延迟二次粒子的势垒的延迟场电极装置，以及用于至少两个不同电压对第一电极装置充电的装置，用于调节提取 场强。 此外，存在取决于提取电极装置的电压来对加速电极装置进行充电以形成适于使延迟场电极装置通过的二次粒子束的装置。

公开(公告)号：EP3038130A2

公开(公告)日：2016-06-29

申请号：EP15189949.9

申请日：2015-10-15

申请人： ADVANTEST CORPORATION

发明人： Yamada, Akio ,  Sugatani, Shinji ,  Kurokawa, Masaki ,  Seyama, Masahiro

IPC分类号： H01J37/04 ,  H01J37/317

CPC分类号： H01J37/3174 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/31761 ,  H01J2237/31766 ,  H01J2237/31774

摘要： To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section (20, 30, 40, 50) that generates a plurality of the charged particle beams at different irradiation positions in a width direction (Y) of the line pattern; a scanning control section (190) that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction (X) of the line pattern; a selecting section (160) that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section (170) that controls the at least one selected charged particle beam to irradiate the sample.

摘要翻译： 为了通过组合光学曝光技术和带电粒子束曝光技术来形成复杂且精细的图案，提供了一种曝光设备，其在与样品上的线图案相对应的位置处发射带电粒子束，该曝光设备包括光束产生部分（20， 在所述线图案的宽度方向（Y）上的不同照射位置处产生多个所述带电粒子束的步骤（30,30,40,50） 扫描控制部（190），其沿着所述线图案的长度方向（X），利用所述带电粒子束的照射位置进行扫描; 选择部，在所述线图案的长度方向的指定照射位置，从所述多个带电粒子束中选择照射所述试样的至少一个带电粒子束; 以及照射控制部（170），其控制所述至少一个选择的带电粒子束照射所述样本。

公开(公告)号：EP3038130A3

公开(公告)日：2016-10-19

申请号：EP15189949.9

申请日：2015-10-15

申请人： ADVANTEST CORPORATION

发明人： Yamada, Akio ,  Sugatani, Shinji ,  Kurokawa, Masaki ,  Seyama, Masahiro

IPC分类号： H01J37/04 ,  H01J37/317

CPC分类号： H01J37/3174 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/31761 ,  H01J2237/31766 ,  H01J2237/31774

摘要： To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section (20, 30, 40, 50) that generates a plurality of the charged particle beams at different irradiation positions in a width direction (Y) of the line pattern; a scanning control section (190) that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction (X) of the line pattern; a selecting section (160) that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section (170) that controls the at least one selected charged particle beam to irradiate the sample.

公开(公告)号：EP3147930B1

公开(公告)日：2019-03-20

申请号：EP16181810.9

申请日：2016-07-28

申请人： ADVANTEST CORPORATION

发明人： Kojima, Shoji ,  Yamada, Akio ,  Seyama, Masahiro

IPC分类号： H01J37/317 ,  H01J37/04

公开(公告)号：EP3147930A1

公开(公告)日：2017-03-29

申请号：EP16181810.9

申请日：2016-07-28

申请人： ADVANTEST CORPORATION

发明人： Kojima, Shoji ,  Yamada, Akio ,  Seyama, Masahiro

IPC分类号： H01J37/317 ,  H01J37/04

CPC分类号： G03F7/7055 ,  G03F7/2059 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/304

摘要： Provided is an exposure apparatus that exposes a pattern on a sample, the exposure apparatus including a plurality of blanking electrodes that are provided corresponding to a plurality of charged particle beams and each switch whether the corresponding particle beam irradiates the sample according to an input voltage; an irradiation control section that outputs switching signals for switching blanking voltages supplied respectively to the blanking electrodes; and a measuring section that, for each blanking electrode, measures a delay amount that is from when the switching signal changes to when the blanking voltage changes.

摘要翻译： 提供一种曝光装置，其对样本进行曝光，所述曝光装置包括对应于多个带电粒子束设置的多个消隐电极，并且每个切换相应的粒子束是否根据输入电压照射样本; 照射控制部分，其输出用于切换分别施加到消隐电极的消隐电压的切换信号; 以及测量部，对于每个消隐电极，测量从切换信号变化到消隐电压变化时的延迟量。