公开(公告)号：EP4297537A2

公开(公告)日：2023-12-27

申请号：EP23209856.6

申请日：2010-04-27

申请人： AES Global Holdings, Pte. Ltd.

发明人： HECKMAN, Randy ,  BROUK, Victor

IPC分类号： H05H1/00

摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary system includes an ion-energy control portion, and the ion- energy control portion provides at least one ion-energy control signal responsive to at least one ion-energy setting that is indicative of a desired distribution of energies of ions bombarding a surface of a substrate. A controller is coupled to the switch-mode power supply, and the controller provides at least two drive-control signals. In addition, a switch-mode power supply is coupled to the substrate support, the ion-energy control portion and the controller. The switch-mode power supply includes switching components configured to apply power to the substrate responsive to the drive signals and the ion-energy control signal so as to effectuate the desired distribution of the energies of ions bombarding the surface of the substrate.

公开(公告)号：EP4297537A3

公开(公告)日：2024-03-20

申请号：EP23209856.6

申请日：2010-04-27

申请人： AES Global Holdings, Pte. Ltd.

发明人： HECKMAN, Randy ,  BROUK, Victor

IPC分类号： H02M7/48 ,  H01L21/3065 ,  C23C16/509 ,  H02M3/00 ,  H02M3/158 ,  H01J37/32

摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary system includes an ion-energy control portion, and the ion- energy control portion provides at least one ion-energy control signal responsive to at least one ion-energy setting that is indicative of a desired distribution of energies of ions bombarding a surface of a substrate. A controller is coupled to the switch-mode power supply, and the controller provides at least two drive-control signals. In addition, a switch-mode power supply is coupled to the substrate support, the ion-energy control portion and the controller. The switch-mode power supply includes switching components configured to apply power to the substrate responsive to the drive signals and the ion-energy control signal so as to effectuate the desired distribution of the energies of ions bombarding the surface of the substrate.

公开(公告)号：EP4084315A1

公开(公告)日：2022-11-02

申请号：EP22171681.4

申请日：2010-04-27

申请人： AES Global Holdings, Pte. Ltd.

发明人： HECKMAN, Randy ,  BROUK, Victor

IPC分类号： H02M7/48 ,  H01L21/3065 ,  C23C16/52 ,  H01L21/205 ,  H05H1/00 ,  H02M3/158 ,  H02M3/00

摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary system includes an ion-energy control portion, and the ion- energy control portion provides at least one ion-energy control signal responsive to at least one ion-energy setting that is indicative of a desired distribution of energies of ions bombarding a surface of a substrate. A controller is coupled to the switch-mode power supply, and the controller provides at least two drive-control signals. In addition, a switch-mode power supply is coupled to the substrate support, the ion-energy control portion and the controller. The switch-mode power supply includes switching components configured to apply power to the substrate responsive to the drive signals and the ion-energy control signal so as to effectuate the desired distribution of the energies of ions bombarding the surface of the substrate.