公开(公告)号：EP1666136B1

公开(公告)日：2008-10-15

申请号：EP03770124.0

申请日：2003-11-04

申请人： AOGAKI, Ryoichi ,  ITO, Eiko

发明人： AOGAKI, Ryoichi ,  ITO, Eiko ,  OGATA, Mikio

IPC分类号： B01J19/00 ,  C25D5/00 ,  C25D7/12 ,  C23F1/08

CPC分类号： B01F13/0077 ,  B01J19/0093 ,  B01J2219/00783 ,  B01J2219/00822 ,  B01J2219/00824 ,  B01J2219/00831 ,  B01J2219/00833 ,  B01J2219/00837 ,  B01J2219/00853 ,  B01J2219/0086 ,  B01J2219/00889 ,  B01J2219/00918 ,  B01J2219/00921 ,  B01J2219/0093 ,  B01J2219/00952 ,  B01J2219/0097 ,  B01L3/502707 ,  B01L3/502746 ,  B01L2300/0816 ,  B01L2400/043 ,  B01L2400/084 ,  C23F1/08 ,  C25D5/34

摘要： Means for enabling plating on sites of complex configuration, etching for fine complex pattern, etc. through reduction of the viscosity resistance brought about by walls of fine liquid channel of microreactor. In particular, a microreactor comprising a liquid inlet, a fine liquid channel and a liquid discharge zone characterized in that the liquid channel is formed of a magnetic barrier of band ferromagnet so that a magnetic liquid introduced through the inlet undergoes at least one operation of chemical reaction, mixing, extraction and absorption in the liquid channel. Further, there is provided means for plating or etching performed by causing a plating solution or an etching solution to flow through the liquid channel.

公开(公告)号：EP1666136A1

公开(公告)日：2006-06-07

申请号：EP03770124.0

申请日：2003-11-04

申请人： AOGAKI, Ryoichi ,  ITO, Eiko

发明人： AOGAKI, Ryoichi ,  ITO, Eiko ,  OGATA, Mikio

IPC分类号： B01J19/00 ,  C25D5/00 ,  C25D7/12 ,  C23F1/08

CPC分类号： B01F13/0077 ,  B01J19/0093 ,  B01J2219/00783 ,  B01J2219/00822 ,  B01J2219/00824 ,  B01J2219/00831 ,  B01J2219/00833 ,  B01J2219/00837 ,  B01J2219/00853 ,  B01J2219/0086 ,  B01J2219/00889 ,  B01J2219/00918 ,  B01J2219/00921 ,  B01J2219/0093 ,  B01J2219/00952 ,  B01J2219/0097 ,  B01L3/502707 ,  B01L3/502746 ,  B01L2300/0816 ,  B01L2400/043 ,  B01L2400/084 ,  C23F1/08 ,  C25D5/34

摘要： Means for enabling plating on sites of complex configuration, etching for fine complex pattern, etc. true reduction of the viscosity resistance brought about by walls of fine liquid channel of microreactor. In particular, a microreactor comprising a liquid inlet, a fine liquid channel and a liquid discharge zone characterized in that a liquid channel is formed of a magnetic barrier of band ferromagnet so that a magnetic liquid introduced through the inlet undergoes at least one operation of chemical reaction, mixing, extraction and adsorption in the liquid channel. Further, there is provided means for plating or etching performed by causing a plating solution or an etching solution to flow through the liquid channel.

摘要翻译： 用于在复杂构造的位置进行电镀的方法，精细复合图案的蚀刻等。真空降低由微反应器的细液体通道壁引起的粘度阻力。 特别地，微反应器包括液体入口，细液体通道和液体排放区，其特征在于，液体通道由磁带铁磁体的磁屏障形成，使得通过入口引入的磁性液体经历至少一种化学操作 液体通道中的反应，混合，萃取和吸附。 此外，提供通过使电镀溶液或蚀刻溶液流过液体通道进行的电镀或蚀刻的装置。