公开(公告)号：EP1066365A4

公开(公告)日：2002-10-09

申请号：EP00904197

申请日：2000-01-04

申请人： ASHLAND INC

发明人： PETERS DARYL W ,  WARD IRL E

IPC分类号： C11D3/00 ,  C11D7/04 ,  C11D7/10 ,  C11D7/26 ,  C11D7/30 ,  C11D7/32 ,  C11D7/50 ,  C11D9/60 ,  C11D11/00 ,  G03F7/42 ,  H01L21/027 ,  H01L21/304 ,  C11D9/04

CPC分类号： C11D7/5022 ,  C11D3/0073 ,  C11D7/10 ,  C11D7/265 ,  C11D7/267 ,  C11D7/30 ,  C11D7/3218 ,  C11D7/3263 ,  C11D7/3281 ,  C11D7/5013 ,  C11D11/0047 ,  G03F7/422 ,  G03F7/425 ,  G03F7/426 ,  H01L2224/0381

摘要： The present invention relates to compositions useful in removing photoresist and organic and inorganic residues and processes for removal of photoresists and etch residues. The compositions are aqueous, acidic compositions containing fluoride and organic polar solvents. The compositions are free of glycols and have a low surface tension and viscosity. Corrosion inhibitors are optionally present.

公开(公告)号：EP1023129A4

公开(公告)日：2001-01-03

申请号：EP98953431

申请日：1998-10-13

申请人： ASHLAND INC

发明人： WARD IRL E ,  MICHELOTTI FRANK W

IPC分类号： B08B3/08 ,  C09D9/00 ,  C11D3/20 ,  C11D3/30 ,  C11D3/34 ,  C11D3/43 ,  C11D7/26 ,  C11D7/32 ,  C11D7/50 ,  C11D11/00 ,  C23G5/036 ,  G03F7/42

CPC分类号： C09D9/005 ,  C09D9/00 ,  C11D3/2086 ,  C11D3/30 ,  C11D3/3445 ,  C11D3/43 ,  C11D7/265 ,  C11D7/5009 ,  C11D7/5013 ,  C11D11/0023 ,  C11D11/0035 ,  C11D11/0047 ,  C23G5/036 ,  G03F7/425

摘要： An aqueous stripping composition comprising a mixture of a polar amine, an organic or inorganic amine and a corrosion inhibitor which is gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures without redepositing any susbtantial amount of metal ions.

公开(公告)号：EP1066123A4

公开(公告)日：2001-04-11

申请号：EP98951057

申请日：1998-10-13

申请人： ASHLAND INC

发明人： PETERS DARRYL WAYNE ,  WARD IRL E ,  MICHELOTTI FRANK W ,  RIDDLE FLOYD JR

IPC分类号： C09D9/00 ,  C11D3/20 ,  C11D3/28 ,  C11D3/30 ,  C11D11/00 ,  C23G1/20 ,  G03F7/42 ,  H01L21/306 ,  B08B3/08 ,  C11D7/26 ,  C11D7/32 ,  C11D7/34

CPC分类号： G03F7/425 ,  C09D9/00 ,  C11D3/2086 ,  C11D3/2093 ,  C11D3/28 ,  C11D3/30 ,  C11D11/0047 ,  C23G1/20 ,  H01L21/02063

摘要： An aqueous stripping composition comprising a mixture of an organic amine and a corrosion inhibitor which is benzotriazole alone or in combination with gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper or titanium containing substrates.

摘要翻译： 包含有机胺和腐蚀抑制剂的混合物的含水汽提组合物，所述腐蚀抑制剂是苯并三唑单独或与没食子酸，其酯或类似物组合。 剥离组合物有效去除光刻胶，等离子体处理产生的有机，金属 - 有机材料，无机盐，氧化物，氢氧化物或配合物的残余物与有机光致抗蚀剂薄膜组合或在低温下腐蚀含铜或钛的基材 。

公开(公告)号：EP0897420A4

公开(公告)日：2000-09-13

申请号：EP97916842

申请日：1997-03-20

申请人： ASHLAND INC

发明人： WARD IRL E ,  MICHELOTTI FRANCIS W

IPC分类号： C11D1/22 ,  C11D3/18 ,  C11D3/20 ,  C11D3/34 ,  G03F7/42 ,  C11D3/00 ,  C11D3/16 ,  C11D3/43 ,  C11D3/44 ,  C11D11/00 ,  C23G5/024

CPC分类号： C11D3/43 ,  C11D1/22 ,  C11D3/18 ,  C11D3/2034 ,  C11D3/3418 ,  G03F7/426

摘要： A non-aqueous negative photoresist stripping composition which consists essentially of about 40 to 85 % by weight of an alkylnaphthalene solvent, about 5 to 20 % by weight of an alkyl phenol which provides a corrosion inhibitory effect, about 5 to 20 % by weight of a linear monoalkylbenzene sulfonic acid which is a surfactant and about 1 to 10 % by weight of a dialkylbenzene sulfonic acid. There is further provided a process for removing coatings from a photoresist with the compositions of the invention.