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1.发明公开SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, METHOD OF LOADING A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开光刻设备的支撑台，加载基板的方法，光刻设备和设备制造方法
公开(公告)号：EP3210080A1
公开(公告)日：2017-08-30
申请号：EP15775219.7
申请日：2015-10-07
发明人： TROMP, Siegfried Alexander , VERWEIJ, Antonie Hendrik , SOETHOUDT, Abraham Alexander , VAN DE POEL, Jan Pieter , BAGGEN, Mark Constant Johannes
CPC分类号： F16C32/0611 , F16C29/025 , F16C32/0607 , G03F7/20 , G03F7/707 , G03F7/708
摘要： A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate,
摘要翻译： 公开了用于光刻设备的支撑台，加载衬底的方法，光刻设备和使用光刻设备制造设备的方法。 在一种布置中，支撑台（100）被构造成支撑基板（W）。 支撑台包括基部表面（101）。 当基板由支撑台支撑时，基座表面面对基板的底表面（103）。 一个或多个气垫构件（102）设置在基部表面上方。 每个气垫元件包括凹槽（108）。 该凹部被成形和构造成使得基板降落到支撑台上的基板由支撑台支撑的位置处引起凹部内的局部压力积聚。 压力的局部积聚在降低基板期间提供了局部的气体缓冲作用。
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公开(公告)号：EP3695276A1
公开(公告)日：2020-08-19
申请号：EP18769724.8
申请日：2018-09-19
发明人： ROSET, Niek Jacobus Johannes , VERMEULEN, Marcus Martinus Petrus Adrianus , RAVENSBERGEN, Simon Karel , BAGGEN, Mark Constant Johannes , KRAMER, Gijs , TIMMERMANS, Roger Anton Marie , VAN DEN BERKMORTEL, Frank Pieter Albert
IPC分类号： G03F7/20 , H01L21/687
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公开(公告)号：EP3876036A1
公开(公告)日：2021-09-08
申请号：EP20160840.3
申请日：2020-03-04
发明人： VAN DEN BERG, Christiaan Ruben , BAGGEN, Marcel Koenraad Marie , BAGGEN, Mark Constant Johannes , BUTLER, Hans , PEIJSTER, Jerry Johannes Martinus , KUINDERSMA, Lucas
IPC分类号： G03F7/20 , G01N21/956 , G01N21/21
摘要： An apparatus for improving vibration isolation for a vibration sensitive device, such as metrology device or lithographic apparatus is disclosed. The apparatus comprises a module frame for supporting a projection module of the vibration sensitive device; and an intermediate frame for supporting an object support system of the vibration sensitive device, said object support system being configured for supporting an object. The intermediate frame is suspended from the module frame with a connection between the module frame and the intermediate frame being stiff in at least a first direction, the first direction being perpendicular to a main surface plane of said object.
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公开(公告)号：EP3210080B1
公开(公告)日：2020-12-09
申请号：EP15775219.7
申请日：2015-10-07
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