公开(公告)号：EP1500986B1

公开(公告)日：2011-04-06

申请号：EP04254151.6

申请日：2004-07-12

申请人： ASML Netherlands B.V.

发明人： Sengers, Timotheus Franciscus ,  Donders, Sjoerd Nicolaas Lambertus ,  Jansen, Hans ,  Boogaard, Arjen

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

摘要： In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate of the lithographic projection apparatus. A sensor positioned on a substrate table which holds the substrate is adapted for being imaged when immersed in immersion liquid (i.e. under the same conditions as the substrate will be imaged). By ensuring that a primary outer surface of an absorption element of the sensor is formed of one or fewer metal types, long life of the sensor can be expected.

公开(公告)号：EP1500986A1

公开(公告)日：2005-01-26

申请号：EP04254151.6

申请日：2004-07-12

申请人： ASML Netherlands B.V.

发明人： Sengers, Timotheus Franciscus ,  Donders, Sjoerd Nicolaas Lambertus ,  Jansen, Hans ,  Boogaard, Arjen

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

摘要： In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate of the lithographic projection apparatus. A sensor positioned on a substrate table which holds the substrate is adapted for being imaged when immersed in immersion liquid (i.e. under the same conditions as the substrate will be imaged). By ensuring that a primary outer surface of an absorption element of the sensor is formed of one or fewer metal types, long life of the sensor can be expected.

摘要翻译： 在光刻投影设备中，液体供应系统将液体保持在投影系统的最终元件和光刻投影设备的基板之间的空间中。 定位在保持衬底的衬底台上的传感器适于在浸入浸没液体中时（即，在与衬底成像相同的条件下）成像。 通过确保传感器的吸收元件的主要外表面由一种或多种金属类型形成，可以预期传感器的长寿命。