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公开(公告)号：EP4386478A1
公开(公告)日：2024-06-19
申请号：EP22212752.4
申请日：2022-12-12
发明人： JANSEN, Maarten, Mathijs, Marinus , VAN EMPEL, Tjarko, Adriaan, Rudolf , REIJNEN, Martinus, Cornelis , DE VRIES, Sjoerd, Frans
IPC分类号： G03F7/00 , H01L21/683
CPC分类号： G03F7/70708 , G03F7/70916 , H01L21/6833 , H01L21/68742
摘要： The disclosure provides an apparatus comprising: at least one substrate table for holding a substrate, the substrate table being provided with an electrostatic clamp for electrostatically clamping the substrate; and at least one reflective surface for reflecting charged particles in a direction away from a front side of the substrate. A method of use comprises the steps of electrostatically clamping at least one substrate table on a substrate table; releasing the clamped substrate; lifting the substrate from the substrate table; and providing at least one reflective surface for reflecting charged particles in a direction away from a front side of the substrate.
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公开(公告)号：EP4286941A3
公开(公告)日：2024-03-06
申请号：EP23203497.5
申请日：2015-11-16
发明人： AZEREDO LIMA, Jorge, Manuel , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , DE KLERK, Angelo, Cesar, Peter , DEKKERS, Jeroen , DINGS, Jacobus, Maria , JANSEN, Maarten, Mathijs, Marinus , JANSSEN, Maurice, Leonardus, Johannes , JANSSEN, Paul , KERSTENS, Roland, Jacobus, Johannes , KESTER, Martinus, Jozef, Maria , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LOOPSTRA, Erik, Roelof , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester, Matheus , THEUERZEIT, Frank, Johannes, Christiaan , VAN DEN BOSCH, Gerrit , VAN DER MEULEN, Frits , VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：EP4286941A2
公开(公告)日：2023-12-06
申请号：EP23203497.5
申请日：2015-11-16
发明人： AZEREDO LIMA, Jorge, Manuel , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , DE KLERK, Angelo, Cesar, Peter , DEKKERS, Jeroen , DINGS, Jacobus, Maria , JANSEN, Maarten, Mathijs, Marinus , JANSSEN, Maurice, Leonardus, Johannes , JANSSEN, Paul , KERSTENS, Roland, Jacobus, Johannes , KESTER, Martinus, Jozef, Maria , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LOOPSTRA, Erik, Roelof , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester, Matheus , THEUERZEIT, Frank, Johannes, Christiaan , VAN DEN BOSCH, Gerrit , VAN DER MEULEN, Frits , VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
IPC分类号： G03F1/64
摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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