公开(公告)号：EP1837705A3

公开(公告)日：2007-12-19

申请号：EP07013766.6

申请日：2006-04-26

申请人： ASML Netherlands B.V.

发明人： Streefkerk, Bob ,  Donders, Sjoerd, Nicolaas, Lambertus ,  De Graaf, Roelof, Frederik ,  Hoogendam, Christiaan, Alexander ,  Jansen, Hans ,  Leenders, Martinus, Hendrikus, Antonius ,  Liebregts, Paulus, Martinus, Maria ,  Mertens, Jeroen, Johannes, Sophia, Maria ,  Van der Toorn, Jan-Gerard, Cornelis ,  Riepen, Michel

IPC分类号： G03F7/20

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a barrier member which defines a space for containing liquid between the projection system and the substrate. In order to minimize the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In some embodiments the shape of the final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有阻挡构件，该阻挡构件限定用于在投影系统和衬底之间容纳液体的空间。 为了最小化正在成像的衬底边缘的交叉（其可以导致在浸没液体中包含气泡），平行于衬底的平面中的空间的横截面面积被制成与 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一些实施例中，投影系统的最终元件的形状也被改变为在平行于衬底的横截面中具有与目标部分的横截面类似的尺寸和/或形状。

公开(公告)号：EP1837705A2

公开(公告)日：2007-09-26

申请号：EP07013766.6

申请日：2006-04-26

申请人： ASML Netherlands B.V.

发明人： Streefkerk, Bob ,  Donders, Sjoerd, Nicolaas, Lambertus ,  De Graaf, Roelof, Frederik ,  Hoogendam, Christiaan, Alexander ,  Jansen, Hans ,  Leenders, Martinus, Hendrikus, Antonius ,  Liebregts, Paulus, Martinus, Maria ,  Mertens, Jeroen, Johannes, Sophia, Maria ,  Van der Toorn, Jan-Gerard, Cornelis ,  Riepen, Michel

IPC分类号： G03F7/20

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a barrier member which defines a space for containing liquid between the projection system and the substrate. In order to minimize the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In some embodiments the shape of the final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有阻挡构件，其在投影系统和基板之间限定用于容纳液体的空间。 为了最小化正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的边缘的交叉，平行于衬底的平面中的空间的横截面积被制成小到 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一些实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。