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公开(公告)号：EP3480659A1
公开(公告)日：2019-05-08
申请号：EP17199539.2
申请日：2017-11-01
IPC分类号： G03F7/20
摘要： Methods and apparatus for estimating an unknown value of at least one of a plurality of sets of data, each set of data comprising a plurality of values indicative of radiation diffracted and/or reflected and/or scattered by one or more features fabricated in or on a substrate, wherein the plurality of sets of data comprises at least one known value, and wherein at least one of the plurality of sets of data comprises an unknown value, the apparatus comprising a processor configured to estimate the unknown value of the at least one set of data based on: the known values of the plurality of sets of data; a first condition between two or more values within a set of data of the plurality of sets of data; and a second condition between two or more values being part of different sets of data of the plurality of the sets of data.
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公开(公告)号：EP3910419A1
公开(公告)日：2021-11-17
申请号：EP20174756.5
申请日：2020-05-14
发明人： LANCIA, Carlo , GANTAPARA, Anjan Prasad , KERNKAMP, Dirk-Jan , MOSSAVAT, Seyed Iman , YPMA, Alexander
摘要： Disclosed is a method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method comprises obtaining a function comprising at least a first function of first prediction model parameters associated with said at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.
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公开(公告)号：EP3699688A1
公开(公告)日：2020-08-26
申请号：EP19158015.8
申请日：2019-02-19
IPC分类号： G03F7/20 , G01N23/20008 , G01N21/956
摘要： Methods and apparatus for directing onto a substrate a radiation beam emitted as a result of high harmonic generation (HHG). Exemplary apparatus comprising: a drive radiation source; an interaction region configured to receive a medium and positioned such that a drive radiation beam from the drive radiation source interacts with the medium during use to generate the emitted radiation beam by HHG, wherein the emitted radiation beam comprises a plurality of wavelengths and wherein an emission divergence angle of the emitted radiation is wavelength dependent; an optical system downstream of the interaction region and configured to focus the emitted radiation beam, wherein the plurality of wavelengths of the emitted radiation beam are focussed at a plurality of focal planes in dependence on the associated emission divergence angle; and a substrate support for holding the substrate at one of a plurality of axial positions relative to the plurality of focal planes, wherein one or more of the drive radiation source, the interaction region, the optical system and the substrate support is configurable to control a relative position of at least one of the focal planes with respect to the substrate.
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4.发明公开
公开(公告)号：EP4115241A1
公开(公告)日：2023-01-11
申请号：EP21702283.9
申请日：2021-02-04
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5.发明公开
公开(公告)号：EP3611568A1
公开(公告)日：2020-02-19
申请号：EP18189181.3
申请日：2018-08-15
IPC分类号： G03F7/20
摘要： A method of determining an estimated intensity of radiation scattered by a target illuminated by a radiation source, has the following steps: obtaining and training (402) a library REFLIB of wavelength-dependent reflectivity as a function of the wavelength, target structural parameters and angle of incidence K(λ,θ,x,y); determining (408) a wide-band library (W-BLIB) of integrals of wavelength-dependent reflectivity R of the target in a Jones framework over a range of radiation source wavelengths λ; training (TRN) (410) the wide-band library; and determining (412), using the trained wide-band library, an estimated intensity (INT) of radiation scattered by the target illuminated by the radiation source.
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公开(公告)号：EP3944020A1
公开(公告)日：2022-01-26
申请号：EP20186710.8
申请日：2020-07-20
发明人： KHEDEKAR, Satej, Subhash , GANTAPARA, Anjan Prasad , CASTELIJNS, Henricus, Jozef , BOND, Stephen Henry , MOSSAVAT, Seyed Iman , YPMA, Alexander , DICKER, Gerald , STEINMEIER, Ewout, Klaas , VAN BERKEL, Koos , BOLDER, Joost, Johan , GUO, Chaoqun , LIN, Chenxi , CHEN, Hongwei , LI, Zhaoze , ZOU, Yi , ZHANG, Youping
IPC分类号： G03F7/20
摘要： Generating a control output for a patterning process is described. A control input is received. The control input is for controlling the patterning process. The control input comprises one or more parameters used in the patterning process. The control output is generated with a trained machine learning model based on the control input. The control output comprises an adjustment of the one or more parameters. The machine learning model is trained with training data generated from simulation of the patterning process and/or actual process data. The training data comprises 1) a plurality of training control inputs corresponding to a plurality of operational conditions of the patterning process, where the plurality of operational conditions of the patterning process are associated with operational condition specific behavior of the patterning process over time, and 2) training control outputs generated using a physical model based on the training control inputs.
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公开(公告)号：EP3637186A1
公开(公告)日：2020-04-15
申请号：EP18199371.8
申请日：2018-10-09
发明人： MOSSAVAT, Seyed Iman , FAGGINGER AUER, Bastiaan Onne , DIRKS, Remco , ONOSE, Alexandru , CRAMER, Hugo Augustinus Joseph
IPC分类号： G03F7/20
摘要： Methods for calibrating metrology apparatuses and determining a parameter of interest are disclosed. In one arrangement, training data is provided that comprises detected representations of scattered radiation detected by each of plural metrology apparatuses. An encoder encodes each detected representation to provide an encoded representation, and a decoder generates a synthetic detected representation from the respective encoded representation. A classifier estimates from which metrology apparatus originates each encoded representation or each synthetic detected representation. The training data is used to simultaneously perform, in an adversarial relationship relative to each other, a first machine learning process involving the encoder or decoder and a second machine learning process involving the classifier.
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公开(公告)号：EP3528049A1
公开(公告)日：2019-08-21
申请号：EP18157680.2
申请日：2018-02-20
摘要： Disclosed is method of optimizing bandwidth of measurement illumination for a measurement application, and an associated metrology apparatus. The method comprises performing a reference measurement (305) with reference measurement illumination having a reference bandwidth and performing one or more optimization measurements (310), each of said one or more optimization measurements being performed with measurement illumination having a varied candidate bandwidth. The one or more optimization measurements are compared with the reference measurement; and an optimal bandwidth for the measurement application is selected (330) based on the comparison.
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