公开(公告)号：EP3839621A1

公开(公告)日：2021-06-23

申请号：EP19216363.2

申请日：2019-12-16

申请人： ASML Netherlands B.V.

发明人： JIN, Wenjie ,  LIN, Nan ,  PORTER, Christina Lynn ,  SMORENBURG, Petrus Wilhelmus

IPC分类号： G02F1/35 ,  G01N21/956

摘要： Disclosed is an illumination source comprising a gas delivery system comprising a gas nozzle. The gas nozzle comprises an opening in an exit plane of the gas nozzle. The gas delivery system is configured to provide a gas flow from the opening for generating an emitted radiation at an interaction region. The illumination source is configured to receive a pump radiation having a propagation direction and to provide the pump radiation in the gas flow. A geometry shape of the gas nozzle is adapted to shape a profile of the gas flow such that gas density of the gas flow first increases to a maximum value and subsequently falls sharply in a cut-off region along the propagation direction.

公开(公告)号：EP4170421A1

公开(公告)日：2023-04-26

申请号：EP21204494.5

申请日：2021-10-25

申请人： ASML Netherlands B.V.

发明人： SMORENBURG, Petrus Wilhelmus ,  EDWARD, Stephen ,  DONDERS, Sjoerd Nicolaas Lambertus ,  SCHELLEKENS, Adrianus Johannes Hendrikus ,  O'DWYER, David ,  NIKIPELOV, Andrey ,  DE VRIES, Gosse Charles

IPC分类号： G02F1/35 ,  G03F7/20

摘要： An assembly comprises a space configured for placing a medium to receive a first radiation for generating a second radiation. In operation, the second radiation propagates coaxially with the first radiation after the medium. The assembly further comprises an optical element after the medium for transmitting or reflecting the first radiation with a surface area. The assembly is configured such that, in operation, a cleaning gas is in contact with the surface area. A reactive medium is generated from at least a part of the cleaning gas by the second radiation for removing a contamination from the surface area.

公开(公告)号：EP4006640A1

公开(公告)日：2022-06-01

申请号：EP20209950.3

申请日：2020-11-26

申请人： Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  ASML Netherlands B.V. ,  Stichting VU ,  Universiteit van Amsterdam

发明人： KRAUS, Peter Michael ,  ROSCAM ABBING, Sylvianne Dorothea Christina ,  CAMPI, Filippo ,  ZHANG, ZhuangYan ,  SMORENBURG, Petrus Wilhelmus ,  LIN, Nan ,  WITTE, Stefan Michiel ,  DEN BOEF, Arie Jeffrey

IPC分类号： G03F7/20 ,  G01N21/47 ,  G01N21/956 ,  G01N23/22

摘要： Disclosed is a metrology apparatus and method for measurement of a diffractive structure on a substrate. The metrology apparatus comprises a radiation source operable to provide first radiation for excitation of the diffractive structure such that high harmonic second radiation is generated from said diffractive structure and/or substrate; and a detection arrangement operable to detect said second radiation, at least a portion of which having been diffracted by said diffractive structure.

公开(公告)号：EP4045973A1

公开(公告)日：2022-08-24

申请号：EP20781597.8

申请日：2020-10-07

申请人： ASML Netherlands B.V.

发明人： JIN, Wenjie ,  LIN, Nan ,  PORTER, Christina Lynn ,  SMORENBURG, Petrus Wilhelmus

IPC分类号： G02F1/35 ,  G03F7/20

公开(公告)号：EP3614813A1

公开(公告)日：2020-02-26

申请号：EP18189877.6

申请日：2018-08-21

申请人： ASML Netherlands B.V.

发明人： SMORENBURG, Petrus Wilhelmus ,  BRUSSAARD, Gerrit Jacobus Hendrik ,  O DWYER, David

IPC分类号： H05G2/00

摘要： Methods and corresponding apparatus operable to cause an interaction between a drive radiation beam and a medium for generation of emitted radiation by high harmonic generation, the arrangement comprising: an interaction region positioned at an interaction plane and configured to receive the medium; a beam block positioned upstream of the interaction plane at a beam block plane and configured to partially block the drive radiation beam; at least one lens positioned upstream of the interaction plane and downstream of the beam block plane; and an aperture positioned downstream of the interaction plane at an aperture plane and configured to allow at least part of the emitted radiation to pass through and to block at least part of the drive radiation beam, the aperture plane being positioned with respect to the beam block plane and the lens such that an image of the beam block is formed at the aperture plane.

公开(公告)号：EP4017221A1

公开(公告)日：2022-06-22

申请号：EP20216083.4

申请日：2020-12-21

申请人： ASML Netherlands B.V.

发明人： SMORENBURG, Petrus Wilhelmus ,  LUITEN, Otger Jan ,  SCHAAP, Brian Herman ,  FRANSSEN, Jim Gerardus Hubertus

IPC分类号： H05G2/00 ,  H01J31/00 ,  H05H15/00

摘要： A method for controlling a density distribution of electrons provided by an electron source for use in hard X-ray, soft X-ray and/or extreme ultraviolet generation, the method comprising generating a plurality of electrons from a pattern of ultracold excited atoms using an ionization laser inside a cavity, wherein the electrons have a density distribution determined by at least one of the patterns of excited atoms and the ionization laser, and accelerating the electrons out of the cavity using a non-static acceleration profile, wherein the acceleration profile controls the density distribution of the electrons as they exit the cavity.

公开(公告)号：EP3699688A1

公开(公告)日：2020-08-26

申请号：EP19158015.8

申请日：2019-02-19

申请人： ASML Netherlands B.V.

发明人： SMORENBURG, Petrus Wilhelmus ,  MOSSAVAT, Seyed Iman ,  COENEN, Teis Johan

IPC分类号： G03F7/20 ,  G01N23/20008 ,  G01N21/956

摘要： Methods and apparatus for directing onto a substrate a radiation beam emitted as a result of high harmonic generation (HHG). Exemplary apparatus comprising: a drive radiation source; an interaction region configured to receive a medium and positioned such that a drive radiation beam from the drive radiation source interacts with the medium during use to generate the emitted radiation beam by HHG, wherein the emitted radiation beam comprises a plurality of wavelengths and wherein an emission divergence angle of the emitted radiation is wavelength dependent; an optical system downstream of the interaction region and configured to focus the emitted radiation beam, wherein the plurality of wavelengths of the emitted radiation beam are focussed at a plurality of focal planes in dependence on the associated emission divergence angle; and a substrate support for holding the substrate at one of a plurality of axial positions relative to the plurality of focal planes, wherein one or more of the drive radiation source, the interaction region, the optical system and the substrate support is configurable to control a relative position of at least one of the focal planes with respect to the substrate.

公开(公告)号：EP3528048A1

公开(公告)日：2019-08-21

申请号：EP18156870.0

申请日：2018-02-15

申请人： ASML Netherlands B.V.

发明人： BRUSSAARD, Gerrit Jacobus Hendrik ,  SMORENBURG, Petrus Wilhelmus ,  COENEN, Teis, Johan ,  GEYPEN, Niels ,  VAN VOORST, Peter Danny ,  ROOBOL, Sander Bas

IPC分类号： G03F7/20 ,  G01N21/47 ,  G01J3/02 ,  G01J3/36 ,  G01N21/95 ,  G01N21/956 ,  G03F9/00 ,  G01J3/28

摘要： A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.